Proximity and ranging sensor
US-2016284920-A1 · Sep 29, 2016 · US
US9684074B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9684074-B2 |
| Application number | US-201415101893-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 3, 2014 |
| Priority date | Dec 5, 2013 |
| Publication date | Jun 20, 2017 |
| Grant date | Jun 20, 2017 |
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An optical sensor arrangement, in particular an optical proximity sensor arrangement comprises a three-dimensional integrated circuit further comprising a first layer comprising a light-emitting device, a second layer comprising a light-detector and a driver circuit. The driver circuit is electrically connected to the light-emitting device and to the light-detector to control the operation of the light-emitting device and the light-detector. A mold layer comprising a first light-barrier between the light-emitting device and the light-detector configured to block light from being transmitted directly from the light-emitting device to the light-detector.
Opening claim text (preview).
The invention claimed is: 1. An optical proximity sensor arrangement, comprising a three-dimensional integrated circuit further comprising: a first layer comprising a light-emitting device, a second layer comprising a light-detector and a driver circuit electrically connected to the light-emitting device and to the light-detector and configured to control the operation of the light-emitting device and the light-detector and wherein the second layer comprises a second light barrier further comprising through silicon vias designed into a substrate, and a mold layer comprising a first light-barrier between the light-emitting device and the light-detector configured to block light from being transmitted directly from the light-emitting device to the light-detector. 2. The optical sensor arrangement according to claim 1 , wherein the mold layer comprises an optically opaque mold material. 3. The optical sensor arrangement according to claim 1 , wherein the mold layer comprises a wafer-level mold structure. 4. The optical sensor arrangement according to claim 1 , wherein the mold layer is at least partially connected to a main surface of the second layer and comprises a first aperture to which the first layer is attached such that light from the light-emitting device can be emitted through the first aperture. 5. The optical sensor arrangement according to claim 4 , wherein the mold layer comprises a second aperture to which the light-detector is attached such that light can reach the light-detector to be detected. 6. The optical sensor arrangement according to claim 1 , wherein the second layer comprises the substrate into which the light-detector and the driver circuit are integrated. 7. The optical sensor arrangement according to claim 6 , wherein the substrate comprises an active interposer, in particular connected to a redistribution layer or an embedded wafer level ball grid array. 8. The optical sensor arrangement according to claim 1 , wherein the light-emitting device is electrically connected to the second layer by means of a metallization structured topology, a bond wire or a redistribution layer. 9. The optical sensor arrangement according to claim 1 , wherein the first layer is stacked onto the main surface of the second layer or the first layer is embedded into a recess formed in the second layer or the first layer is stacked onto a further main surface of the second layer opposite to the main surface and wherein the first aperture extends through the second layer. 10. The optical sensor arrangement according to claim 1 , wherein the light-detector and/or light-emitting device are covered by an optical element and wherein the optical element is a lens and/or zone plate, in particular a nano-imprinted lens. 11. A method of producing an optical proximity sensor arrangement, comprising the steps of: integrating a light-emitting device into a first layer, integrating a light-detector and a driver circuit into a second layer wherein the second layer comprises a second light barrier further comprising through silicon vias designed into a substrate, electrically connecting the light-emitting device to the driver circuit and to the light-detector, molding a mold layer comprising a first light-barrier between the light-emitting device and the light-detector configured to block light from being transmitted directly from the light-emitting device to the light-detector and integrating the first layer, the second layer and the mold layer into a three dimensional integrated circuit. 12. The method according to claim 11 , wherein the molding involves molding at a waver-level, in particular using an optically opaque material. 13. The method according to claim 11 , wherein the first layer is stacked onto the second layer, in particular stacked by means of die-to-wafer stacking and the first layer is electrically connected to the second layer by means of a metallization structured topology, a bond wire or a redistribution layer, in particular by means of a metallization structured topology with through-silicon-vias, or the first layer is embedded into a recess formed in the second layer. 14. The method according to claim 11 , further comprising the steps of connecting the mold layer at least partially to a main surface of the second layer and providing a first aperture in the mold layer to which the first layer is attached such that light from the light-emitting device can be emitted through the first aperture and/or provide a second aperture to which the light-detector is attached such that light can reach the light-detector to be detected.
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