Thick film circuits with conductive components formed using different conductive elements and related methods

US9681559B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9681559-B2
Application numberUS-201314135018-A
CountryUS
Kind codeB2
Filing dateDec 19, 2013
Priority dateDec 19, 2013
Publication dateJun 13, 2017
Grant dateJun 13, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Disclosed herein are a variety of embodiments of thick film circuits with conductive components formed using different conductive elements and related methods for forming such circuits. One embodiment consistent with the present disclosure includes a multi-level thick film circuit formed on a substrate and having a first layer disposed on the substrate. The first layer may include a first conductive component formed using a first conductive element. The first conductive element may be a precious metal. The circuit may further include a second layer having a second conductive component. The second conductive component may be formed using a second conductive element. In one embodiment, the second conductive element may be a base metal. At least a portion of the first conductive element may directly contact at least a portion of the second conductive element such that the first layer is in electrical communication with the second layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of forming a multi-level thick film circuit, comprising: forming a first layer disposed on a substrate, the first layer comprising a first conductive component formed of a first conductive element, the first conductive element comprising a precious metal; firing the substrate and the first layer in a first atmosphere during a first firing process, the first atmosphere comprising oxygen; forming a second layer comprising a second conductive component formed of a second conductive element, the second layer conductive element comprising a base metal; and firing the substrate, the first layer, and the second layer in a second atmosphere during a second firing process, the second atmosphere comprising an inert atmosphere; wherein the second layer is at least partially disposed directly on top of the first layer and the first layer is in electrical communication with the second layer. 2. The method of claim 1 , wherein the first conductive element comprises silver. 3. The method of claim 1 , wherein, wherein the second conductive element comprises copper. 4. The method of claim 1 , further comprising: forming a dielectric layer to electrically separate a third conductive component from one of the first conductive component and the second conductive component. 5. The method of claim 1 , wherein the first firing process is performed at approximately 850° C.±20° C. 6. The method of claim 1 , wherein the second firing process is performed between approximately 600° C. and 700° C.±10° C. 7. The method of claim 1 , further comprising: forming a plurality of additional layers; and forming a plurality of dielectric layers configured to electrically separate at least a portion of the plurality of additional layers; wherein each layer disposed below an uppermost dielectric layer is formed using the first conductive element and each layer disposed above the uppermost dielectric material is formed using the second conductive element. 8. The method of claim 1 , further comprising: forming a plurality of additional layers comprising a plurality of conductive components; and forming a plurality of dielectric layers configured to electrically separate at least one of the plurality of conductive components from at least one other of the plurality of conductive components; wherein each conductive component disposed directly in contact with any of the plurality of dielectric layers is formed using the first conductive element. 9. The method of claim 1 , wherein forming the second layer comprises: applying a thick film ink to the multi-level thick film circuit, the thick film ink comprising: an organic portion; and an inorganic portion dispersed in the organic portion defining a paste, wherein the inorganic portion comprises metallic copper powder, cupric oxide, and elemental boron. 10. A method of forming a multi-level thick film circuit, comprising: forming a first layer disposed on a substrate, the first layer comprising a first conductive component formed of a first conductive element, the first conductive element comprising a precious metal; firing the substrate and the first layer in a first atmosphere at a first temperature during a first firing process; forming a second layer comprising a second conductive component formed of a second conductive element, the second layer conductive element comprising a base metal; and firing the substrate, the first layer, and the second layer in a second atmosphere at a second temperature during a second firing process, the first temperature being greater than the second temperature; wherein the second layer is at least partially disposed directly on top of the first layer and the first layer is in electrical communication with the second layer. 11. The method of claim 10 , wherein the first atmosphere comprises oxygen. 12. The method of claim 10 , wherein the second atmosphere comprises an inert atmosphere. 13. The method of claim 10 , wherein the first firing process is performed at approximately 850° C.±20° C. 14. The method of claim 10 , wherein the second firing process is performed between approximately 600° C. and 700° C.±10° C.

Assignees

Inventors

Classifications

  • Non-printed resistor · CPC title

  • Same or similar kind of process performed in phases, e.g. coarse patterning followed by fine patterning · CPC title

  • Use of materials for the {conductive, e.g. } metallic pattern · CPC title

  • Firing, i.e. heating a powder or paste above the melting temperature of at least one of its constituents · CPC title

  • Reinforcing conductive patterns made by printing techniques or by other techniques for applying conductive pastes, inks or powders; Reinforcing other conductive patterns by such techniques · CPC title

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What does patent US9681559B2 cover?
Disclosed herein are a variety of embodiments of thick film circuits with conductive components formed using different conductive elements and related methods for forming such circuits. One embodiment consistent with the present disclosure includes a multi-level thick film circuit formed on a substrate and having a first layer disposed on the substrate. The first layer may include a first condu…
Who is the assignee on this patent?
Gm Global Tech Operations Llc
What technology area does this patent fall under?
Primary CPC classification H05K1/092. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 13 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).