Apparatus for analyzing elements in liquid with controlled amount of gas supply for plasma generation

Patent metadata

Field	Value
Publication number	US-9677940-B2
Application number	US-201414184233-A
Country	US
Kind code	B2
Filing date	Feb 19, 2014
Priority date	Jun 28, 2012
Publication date	Jun 13, 2017
Grant date	Jun 13, 2017

Abstract

An elemental analysis apparatus 101 includes a treatment vessel 108 of which at least a part is optically transparent, a first electrode 104 covered by insulator 103 , a second electrode 102 , a bubble-generating part which generates a bubble 106 , a gas-supplying apparatus 105 which supplies gas to the bubble-generating part in an amount necessary for generating the bubble 106 , a power supply 101 which applies voltage between the first electrode 104 and the second electrode 102 , and an optical detection device 110 which determines an emission spectrum of plasma that is generated by application of the voltage, and the apparatus conducts qualitatively or quantitatively analysis of a component contained in the liquid 109 based on the emission spectrum determined by the optical detection device 110.

First claim

What is claimed is:

1. An elemental analysis apparatus for analyzing a liquid, comprising:
first and second electrodes adapted to at least partially be placed in the liquid, respectively;
a flow path through which a gas passes for generating a bubble in the liquid;
an insulator covering the first electrode and the flow path, the insulator having an opening from which the first electrode and the flow path are exposed;
a gas supply which supplies the gas to the flow path, an amount of the gas to be supplied being so determined to generate the bubble which is able to cover the first electrode exposed through the opening for generation of plasma in the bubble;
a power supply which supplies voltage between the first electrode and the second electrode to generate the plasma in the bubble, and
a first optical detector which detects an emission spectrum of the plasma.

2. The elemental analysis apparatus according to claim 1 , wherein
the first electrode has the opening of the flow path, and
the flow path, connected between the opening and the gas supply, runs inside the first electrode.

3. The elemental analysis apparatus according to claim 1 , wherein
the first electrode has a cylindrical shape having the opening of the flow path,
the flow path, connected between the opening and the gas supply, runs inside the first electrode, and
the insulator is in direct contact with an outer surface of the first electrode.

4. The elemental analysis apparatus according to claim 1 , further comprising a treatment vessel to be filled with the liquid, a part of the treatment vessel being optically transparent.

5. The elemental analysis apparatus according to claim 1 , wherein the gas supply includes gas sources respectively containing gases to be selectively supplied to the flow path, types of the gases being different from each other.

6. The elemental analysis apparatus according to claim 1 , wherein the first optical detector is disposed on a side opposite to a side to which the bubble grows.

7. The elemental analysis apparatus according to claim 1 , wherein the insulator is optically transparent.

8. The elemental analysis apparatus according to claim 7 , wherein the insulator comprises quartz.

9. The elemental analysis apparatus according to claim 1 , further comprising a second optical detector that monitors the bubble, wherein
the first optical detector is activated to detect the emission spectrum of the plasma, in response to a result of monitoring the bubble by the second optical detector.

10. The elemental analysis apparatus according to claim 1 , further comprising:
a second optical detector which detects an emission spectrum of the plasma, and
a third optical detector that monitors the bubble, wherein
at least one of the first and second optical detectors is activated to detect the emission spectrum of the plasma, in accordance with a result of monitoring the bubble by the third optical detector.

11. The elemental analysis apparatus according to claim 1 , wherein the power supply supplies the voltage between the first electrode and the second electrode when the bubble covers the first electrode exposed through the opening.

12. The elemental analysis apparatus according to claim 1 , wherein
the first electrode projects from the opening, and
the amount of the gas to be supplied to the flow path is so determined to generate the bubble which is able to cover the first electrode projecting from the opening.

13. The elemental analysis apparatus according to claim 1 , wherein
no portion of the first electrode projects from the opening, and
the amount of the gas to be supplied to the flow path is so determined to generate the bubble which is able to occupy the opening.

Assignees

• Panasonic Corp
• Panasonic Ip Man Co Ltd

Inventors

• Kumagai Hironori
• Imai Shin-Ichi

Classifications

• G01J3/443 Primary

  Emission spectrometry · CPC title

• G01N21/69

  specially adapted for fluids {, e.g. molten metal} · CPC title

• G01N21/67 Primary

  using electric arcs or discharges · CPC title