Plasma generating apparatus and plasma generating method

Patent metadata

Field	Value
Publication number	US-9540262-B2
Application number	US-201314032477-A
Country	US
Kind code	B2
Filing date	Sep 20, 2013
Priority date	May 17, 2011
Publication date	Jan 10, 2017
Grant date	Jan 10, 2017

Abstract

The plasma-generating apparatus includes a treatment vessel 509 containing to-be-treated water 510 , a first electrode 504 and a second electrode 502 within the treatment vessel, a bubble-generating part which generate a bubble 506 such that a surface where conductor of the first electrode 504 is exposed to the to-be-treated water is positioned within the bubble 506 , a gas-supplying apparatus 505 which supplies gas to the bubble-generating part, a pulsed power supply 501 connected to the first and the second electrodes 502 and 504 , a control apparatus 520 which controls one or both of the gas-supplying apparatus and the power supply such that the voltage is applied between the first and the second electrodes 502 and 504 when at least surface where the conductor of the first electrode 504 is exposed is positioned within the bubble.

First claim

What is claimed is:

1. A plasma-generating apparatus comprising:
a first electrode of which at least a part is placed in a treatment vessel that is to contain liquid;
a second electrode of which at least a part is placed in the treatment vessel;
a bubble-generating part configured to generate a bubble in the liquid when the liquid is contained in the treatment vessel such that at least an exposed surface where conductor is exposed, of a surface of the first electrode which surface is positioned in the treatment vessel, is positioned within the bubble;
a gas-supplying apparatus configured to supply gas in an amount necessary for the bubble-generating part to generate the bubble from the outside of the treatment vessel to the bubble-generating part;
a power supply configured to apply voltage between the first electrode and the second electrode; and
a control apparatus configured to:
control the gas-supplying apparatus such that the gas is supplied to the bubble-generating part, thereby generating the bubble in the liquid, without applying the voltage between the first electrode and the second electrode, and
control the power supply to start applying the voltage between the first electrode and the second electrode after a state where the exposed surface of the first electrode is positioned within the bubble is achieved.

2. The plasma-generating apparatus according to claim 1 , further comprising a bubble detection device configured to detect that the exposed surface of the first electrode is positioned within the bubble,
wherein the control apparatus is configured to control the power supply to start applying the voltage between the first electrode and the second electrode after the bubble detection device detects that the exposed surface of the first electrode is positioned within the bubble.

3. The plasma-generating apparatus according to claim 1 , wherein the control apparatus is configured to control the gas-supplying apparatus such that the gas is supplied to the bubble-generating part and control the power supply to start applying the voltage between the first electrode and the second electrode after lapse of a predetermined time required for achievement of a state where the exposed surface where the conductor is exposed, of the first electrode is positioned within the bubble.

4. The plasma-generating apparatus according to claim 2 , wherein the bubble detection device is configured to detect that the exposed surface of the first electrode is positioned within the bubble, based on one or more of the following changes which are involved by the generation of the bubble:
change in images of vicinity of the exposed surface of the first electrode,
change in resistance between the first electrode and another electrode which is insulated electrically from the first electrode,
change in capacitance between the first electrode and another electrode which is insulated electrically from the first electrode,
change in resistance between a third electrode and a fourth electrode which are insulated electrically from the first electrode,
change in capacitance between a third electrode and a fourth electrode which are insulated electrically from the first electrode,
change in an optical path or a light quantity of light which passes through the liquid,
change in an acoustic wave which passes through the liquid, and
change in pressure in the liquid.

5. The plasma-generating apparatus according to claim 1 , wherein a maximum value of output capacity of the power supply is more than 0 W and less than 1000 W.

6. The plasma-generating apparatus according to claim 1 , wherein:
the first electrode is of a hollow shape having an opening portion,
insulator is positioned in contact with an outer peripheral surface of the first electrode,
the bubble-generating part is configured to generate the bubble from the opening portion of the first electrode,
the bubble-generating part is configured to generate the bubble such that a surface where the insulator is not positioned and the conductor is exposed, of the surface of the first electrode which surface is positioned in the treatment vessel, is positioned within the bubble.

7. The plasma-generating apparatus according to claim 6 , wherein a direction in which the opening portion of the first electrode is opened is from 0° to 60° when 0° is defined as a direction in which gravity is given and 180° is defined as a direction opposite to the direction in which the gravity is given.

8. The plasma-generating apparatus according to claim 6 , wherein a direction in which the opening portion is opened is from 80° to 100° when 0° is defined as a direction in which gravity is given and 180° is defined as a direction opposite to the direction in which the gravity is given.

9. The plasma-generating apparatus according to claim 6 , wherein an inner diameter of the first electrode is from 0.3 mm to 2 mm and an outer diameter of the first electrode is from 1 mm to 3 mm.

10. The plasma-generating apparatus according to claim 6 , wherein an end face of the opening portion of the first electrode is positioned inwardly from an end face of the insulator.

11. The plasma-generating apparatus according to claim 10 , wherein an outer diameter of the first electrode is from 1 mm to 3 mm.

12. The plasma-generating apparatus according to claim 6 , wherein:
the insulator is of a hollow shape having an opening portion, and
the first electrode is movable relatively to the insulator.

13. The plasma-generating apparatus according to claim 12 , wherein an end face of the opening portion of the first electrode is moved inwardly from an end face of the insulator after the power supply applies the voltage between the first electrode and the second electrode.

14. The plasma-generating apparatus according to claim 1 , further comprising an optical detection device configured to measure an emission spectrum of the plasma,
wherein one or more components in the liquid to be contained in the treatment vessel are qualitatively or quantitatively analyzed from the emission spectrum measured by the optical detection device.

15. The plasma-generating apparatus according to claim 1 , further comprising an apparatus configured to adjust an internal pressure of the bubble generated from the bubble-generating part.

16. The plasma-generating apparatus according to claim 15 , further comprising a device configured to determine a size of the bubble,
wherein the apparatus is configured to adjust the internal pressure of the bubble based on the size of the bubble which is determined by the device.

17. The plasma-generating apparatus according to claim 1 , further comprising a first device configured to change a position where the bubble is generated from the bubble-generating part in a depth direction of the liquid.

18. The plasma-generating apparatus according to claim 17 , further comprising a second device configured to determine a size of the bubble,
wherein the first device is configured to change the position where the bubble is generated, based on the size of the bubble which is determined by the second device.

19. The plasma-generating apparatus according to claim 1 , wherein the power supply is configured to apply a pulsed voltage.

20. The plasma-generating apparatus according to claim 1 , wherein the power supply is configured to apply an alternating voltage.

21. The plasma-generating apparatus according to claim 19 , wherein a voltage and a frequency of the power supply and a distance

Assignees

• Panasonic Corp
• Panasonic Ip Man Co Ltd

Inventors

• Kumagai Hironori
• Imai Shin-Ichi

Classifications

• C02F2209/38

  Gas flow rate · CPC title

• C02F2305/023

  Reactive oxygen species, singlet oxygen, OH radical · CPC title

• C02F2201/46175

  Electrical pulses · CPC title

• C02F2201/4619

  Supplying gas to the electrolyte · CPC title

• C02F1/4608 Primary

  using electrical discharges · CPC title