Optical selective film
US-9970684-B2 · May 15, 2018 · US
US9671137B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9671137-B2 |
| Application number | US-201414776147-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 13, 2014 |
| Priority date | Mar 15, 2013 |
| Publication date | Jun 6, 2017 |
| Grant date | Jun 6, 2017 |
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The invention concerns a multilayer material comprising at least: a support having a reflectance R higher than 80% for radiations of wavelengths higher than 5 μm, a selective layer comprising a combination of Vanadium oxides VO 2 and VO 2 O 2n+/−1 , with n>1, said selective layer having an absorbance higher than 75% for radiations of wavelengths comprised between 0.4 and 2.5 μm, regardless of the temperature T, and having, for radiations of wavelengths comprised between 6 and 10 μm, a transmittance Tr such that: Tr>85% for T<Tc, a critical temperature, 20%≦Tr≦50% for T>Tc. Application to the production of thermal solar panels having a low stagnation temperature and high performance.
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The invention claimed is: 1. A multilayer material comprising at least: a support having a reflectivity R higher than 80% for radiations of wavelengths higher than 5 μm, a selective layer having a thickness comprised between 100 and 500 nm, said selective layer comprising a combination of vanadium oxides VO 2 and V n O 2n+/−1 , with n>1, said selective layer having an absorbance higher than 75% for radiations of wavelengths comprised between 0.4 and 2.5 μm, regardless of the temperature T, and having, for radiations of wavelengths comprised between 6 and 10 μm, a transmittance Tr such that: Tr>85% for T<Tc, a critical temperature, 20%≦Tr≦50% for T>Tc, wherein, for radiations of wavelengths comprised between 6 and 10 μm, the support has an optical index n1 and the selective layer has an optical index n2 such that: n2<n1 regardless of the temperature T, and n2<6 T>Tc. 2. Material according to claim 1 , wherein the selective layer has an extinction coefficient k lower than 4 for radiations of wavelengths comprised between 6 and 10 μm. 3. Material according to claim 1 , wherein, for radiations of wavelengths between 6 and 10 μm, the optical index n2 is comprised between 0.8*(n1) 1/2 and 1.2*(n1) 1/2 for T>Tc. 4. Material according to claim 1 , wherein the selective layer has a thickness comprised between 100 and 200 nm. 5. Material according to claim 1 , wherein the selective layer is doped with at least one metal M different from Vanadium. 6. Material according to claim 5 , wherein the selective layer is doped with aluminum and has a critical temperature comprised between 80° C. and 120° C. 7. Material according to claim 5 , wherein the selective layer has a concentration in the dopant M sufficient to form at least one oxide of the form M 1-x O x , with 0<x<1, x being the atomic fraction of oxygen in the oxide, so that the selective layer comprises a combination of oxides of the type VO 2 , V n O 2n+/−1 , and M 1-x O x . 8. Material according to claim 7 , wherein the oxide or oxides in the form M 1-x O x have a transmittance higher than 85% for infrared radiations whose wavelengths are comprised between 6 and 10 μm. 9. Material according to claim 8 , wherein the oxide of the form M 1-x O x is an aluminum oxide. 10. Material according to claim 1 , wherein the selective layer is covered with an antireflection layer having, for radiations whose wavelengths are comprised between 0.4 and 2.5 μm, an optical index n3<n2, n2 being the optical index of the selective layer. 11. Material according to claim 10 , wherein the antireflective layer has a thickness comprised between 10 and 150 nm. 12. Material according to claim 1 , further comprising, between the selective layer and the support, an adhesive layer, for example, a metal layer, an oxide layer, a layer of transition metal nitrides, or a layer of a mixture of these materials, having a thickness comprised between 5 and 100 nm. 13. Material according to claim 1 , wherein the selective layer comprises: a combination of VO 2 and V 4 O 9 Vanadium oxides, or a combination of VO 2 and V 6 O 13 Vanadium oxides, or a combination of VO 2 and V 4 O 9 Vanadium oxides and Al 2 O 3 oxide. 14. Solar panel comprising a multilayer material according to claim 1 . 15. Material according to claim 2 , wherein, for radiations of wavelengths between 6 and 10 μm, the optical index n2 is comprised between 0.8*(n1) 1/2 and 1.2*(n1) 1/2 for T>Tc. 16. Material according to claim 5 , wherein the at least one metal M is aluminum, chromium, or titanium. 17. Material according to claim 8 , wherein the oxide of the form M 1-x O x is Al 2 O 3 . 18. Material according to claim 8 , wherein the oxide of the form M 1-x O x is an under-stoichiometric aluminum oxide. 19. A multilayer material comprising at least: a support having a reflectivity R higher than 80% for radiations of wavelengths higher than 5 μm, a selective layer having a thickness comprised between 100 and 500 nm, said selective layer comprising a combination of vanadium oxides VO 2 and V n O 2n+/−1 , with n>1, said selective layer having an absorbance higher than 75% for radiations of wavelengths comprised between 0.4 and 2.5 μm, regardless of the temperature T, and having, for radiations of wavelengths comprised between 6 and 10 μm, a transmittance Tr such that: Tr>85% for T<Tc, a critical temperature, 20%≦Tr≦50% for T>Tc, wherein the selective layer is covered with an antireflection layer having, for radiations whose wavelengths are comprised between 0.4 and 2.5 μm, an optical index n3<n2, n2 being the optical index of the selective layer. 20. Material according to claim 19 , wherein the antireflective layer has a thickness comprised between 10 and 150 nm.
of refractory metals or yttrium · CPC title
Nitrides (C23C14/0617 takes precedence) · CPC title
for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation · CPC title
Auxiliary coatings, e.g. anti-reflective coatings · CPC title
Solar thermal energy, e.g. solar towers · CPC title
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