Composition and method for forming conductive pattern, and resin structure having conductive pattern thereon

US9668342B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9668342-B2
Application numberUS-201414895143-A
CountryUS
Kind codeB2
Filing dateSep 22, 2014
Priority dateSep 27, 2013
Publication dateMay 30, 2017
Grant dateMay 30, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention relates to a composition for forming a conductive pattern which is capable of forming a fine conductive pattern reducing deterioration of mechanical-physical properties and having excellent adhesion strength onto a variety of polymeric resin products or resin layers, a method for forming the conductive pattern using the same, and a resin structure having the conductive pattern. The composition for forming a conductive pattern includes a polymer resin; and non-conductive metal compound particles including a first metal element and a second metal element, having a R 3 m or P6 3 /mmc space group in crystal structure, and having a particle size of 0.1 to 20 μm, wherein a metal nuclei including the first metal or the second metal element or an ion thereof is formed from the non-conductive metal compound particles by electromagnetic irradiation.

First claim

Opening claim text (preview).

The invention claimed is: 1. A composition for forming a conductive pattern by electromagnetic irradiation, comprising: a polymer resin; and non-conductive metal compound particles including a first metal element and a second metal element, having a R 3 m or P6 3 /mmc space group in crystal structure, and having a particle size of 0.1 to 20 μm, wherein a metal nuclei including the first metal, the second metal element or an ion thereof is formed from the non-conductive metal compound particles by electromagnetic irradiation. 2. The composition of claim 1 , wherein the non-conductive metal compound particles include one or more compounds selected from the group consisting of CuCrO 2 , NiCrO 2 , AgCrO 2 , CuMoO 2 , NiMoO 2 , AgMoO 2 , NiMnO 2 , AgMnO 2 , NiFeO 2 , AgFeO 2 , CuWO 2 , AgWO 2 , NiWO 2 , AgSnO 2 , NiSnO 2 and CuSnO 2 . 3. The composition of claim 1 , wherein it exhibits reflectivity of 25% or less with respect to a laser electromagnetic wave having a wavelength of 1000 nm to 1200 nm. 4. The composition of claim 1 , wherein the metal nuclei is formed by irradiating a laser electromagnetic wave having a wavelength of 1000 nm to 1200 nm at an average power of 5 to 20 W. 5. The composition of claim 1 , wherein the polymer resin includes a thermosetting resin or a thermoplastic resin. 6. The composition of claim 5 , wherein the polymer resin includes one or more selected from the group consisting of an ABS resin, a polyalkylene terephthalate resin, a polycarbonate resin, a polypropylene resin, and a polyphthalamide resin. 7. The composition of claim 1 , wherein the non-conductive metal compound particles are included in an amount of 0.5 to 7 wt %, with respect to the total composition. 8. The composition of claim 1 , further comprising one or more additives selected from the group consisting of a heat stabilizer, a UV stabilizer, a flame retardant, a lubricant, an antioxidant, an inorganic filler, a colorant, an impact modifier, and a functional modifier. 9. A method for forming a conductive pattern by direct electromagnetic irradiation comprising: molding the composition for forming a conductive pattern of claim 1 to a resin product or applying the composition to another product so as to form a resin layer; irradiating an electromagnetic wave to a predetermined region of the resin product or the resin layer so as to generate a metal nuclei including a first, a second metal or an ion thereof from non-conductive metal compound particles; and chemically reducing or plating the region in which the metal nuclei is generated so as to form a conductive metal layer. 10. The method of claim 9 , wherein in the generating of the metal nuclei, a laser electromagnetic wave having a wavelength of 1000 nm to 1200 nm is irradiated at an average power of 5 to 20 W. 11. The method of claim 9 , wherein in the generating of the metal nuclei, a part of the non-conductive metal compound particles is exposed on a surface of the predetermined region of the resin product or the resin layer to generate the metal nuclei therefrom, and an adhesion-activated surface activated so as to have higher adhesion is formed. 12. The method of claim 11 , wherein the conductive metal layer is formed on the adhesion-activated surface by electroless plating. 13. A resin structure having a conductive pattern, comprising a polymeric resin substrate; non-conductive metal compound particles including a first metal element and a second metal element, having a R 3 m or P6 3 /mmc space group in crystal structure, having a particle size of 0.1 to 20 μm, and dispersed in the polymeric resin substrate; an adhesion-activated surface including a metal nuclei including a first or a second metal or an ion thereof exposed on a surface of a predetermined region of the polymeric resin substrate; and a conductive metal layer formed on the adhesion-activated surface. 14. The resin structure of claim 13 , wherein the predetermined region on which the adhesion-activated surface and the conductive metal layer are formed corresponds to a region of the polymeric resin substrate to which an electromagnetic wave is irradiated. 15. The resin structure of claim 13 , wherein the conductive metal layer is formed on the polymeric resin substrate by adhesion at which a delamination area of a target metal layer under test is 0% (ISO Class 0), or more than 0% to 5% or less (ISO Class 1), of an area of the metal layer under the test according to standard ISO 2409. 16. The resin structure of claim 13 , wherein an impact strength measured by ASTM D256 is approximately 4.0 J/cm or more.

Assignees

Inventors

Classifications

  • H01B1/22Primary

    the conductive material comprising metals or alloys · CPC title

  • Using laser light · CPC title

  • from plating step, e.g. inkjet · CPC title

  • from pretreatment step, i.e. selective pre-treatment · CPC title

  • Organic substrates, e.g. resin, plastic · CPC title

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What does patent US9668342B2 cover?
The present invention relates to a composition for forming a conductive pattern which is capable of forming a fine conductive pattern reducing deterioration of mechanical-physical properties and having excellent adhesion strength onto a variety of polymeric resin products or resin layers, a method for forming the conductive pattern using the same, and a resin structure having the conductive pat…
Who is the assignee on this patent?
Lg Chemical Ltd
What technology area does this patent fall under?
Primary CPC classification H01B1/22. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 30 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).