Curable composition for imprints and method of storing the same

Patent metadata

Field	Value
Publication number	US-9663671-B2
Application number	US-201414255490-A
Country	US
Kind code	B2
Filing date	Apr 17, 2014
Priority date	Oct 18, 2011
Publication date	May 30, 2017
Grant date	May 30, 2017

Abstract

Provide is a curable composition for imprints, capable of effectively suppressing chipping of the cured pattern. A curable composition for imprints comprising (A) curable compound and (B) photo-polymerization initiator, having a moisture content ratio, relative to the total weight of all components excluding solvent, of less than 0.8% by weight.

First claim

The invention claimed is:

1. A curable composition for imprints comprising (A) a curable compound, (B) a photo-polymerization initiator and (C) a polar group-containing non-polymerizable compound, having a moisture content ratio, relative to the total weight of all components excluding solvent, of less than 0.8% by weight,
wherein the polar group-containing non-polymerizable compound (C) is a hydroxy group-containing polymer.

2. The curable composition for imprints of claim 1 , curable by a radical polymerization reaction.

3. The curable composition for imprints of claim 1 , containing substantially no solvent.

4. The curable composition for imprints of claim 1 , having a viscosity of 5 to 30 mPa·s.

5. A method of manufacturing the curable composition for imprints described in claim 1 , comprising mixing the curable compound (A), the photo-polymerization initiator (B) and the polar group-containing non-polymerizable compound (C) under an environment at a temperature of 23° C. and a humidity of 30% or lower.

6. A method of storing a curable composition for imprints, the method comprising enclosing the curable composition for imprints described in claim 1 into a storage container, wherein the ratio of filling of the curable composition in the storage container is 30% by volume or more.

7. The method of storing of claim 6 , further comprising using the curable composition enclosed in the storage container for pattern-forming and then, after the pattern-forming, storing any remaining unused curable composition in the storage container at a ratio of filling of 30% by volume or more.

8. The method of storing of claim 6 , wherein the curable composition for imprints is stored at 10° C. or lower.

9. The method of storing of claim 8 , further comprising bringing the curable composition enclosed in the storage container back to room temperature and using it for pattern-forming and then, after the pattern-forming, storing any remaining unused curable composition in the storage container at a ratio of filling of 30% by volume or more.

10. A pattern-forming method comprising:
applying the curable composition for imprints described in claim 1 onto a base;
pressurizing a mold onto the curable composition for imprints; and
irradiating the light onto the curable composition for imprints.

11. The pattern-forming method of claim 10 , wherein the curable composition for imprints is applied onto a base by an ink jet process.

12. A pattern formed by the pattern-forming method described in claim 10 .

13. An electronic device comprising the pattern described in claim 12 .

14. A method of manufacturing an electronic device, the method comprising a pattern-forming method which includes the steps of:
applying the curable composition for imprints described in claim 1 onto a semiconductor manufacturing substrate composed of silicon, silicon nitride, polysilicon, silicon oxide or amorphous silicon;
pressurizing a mold onto the curable composition for imprints; and
irradiating the light onto the curable composition for imprints.

Assignees

• Fujifilm Corp

Inventors

• Enomoto Yuichiro
• Kodama Kunihiko
• Tarutani Shinji

Classifications

• C08F2/50 Primary

  with sensitising agents · CPC title

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• Y10T428/24802

  Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] · CPC title

• C09D11/30 Primary

  Inkjet printing inks · CPC title

• G03F7/0002

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title