Focused radiation beam induced thin film deposition

Patent metadata

Field	Value
Publication number	US-9659768-B2
Application number	US-201414580463-A
Country	US
Kind code	B2
Filing date	Dec 23, 2014
Priority date	Dec 23, 2014
Publication date	May 23, 2017
Grant date	May 23, 2017

Abstract

A method of depositing a material on a surface is disclosed. The method includes focusing a radiation beam on the surface and introducing a precursor gas near the surface wherein the precursor gas forms the material on the surface upon radiation by the radiation beam. The method further includes introducing an assistant gas near the surface wherein the assistant gas produces nitric oxide radicals upon radiation by the radiation beam. The nitric oxide radicals facilitate the dissociation process of the precursor gas and reduce contaminants in the deposited material.

First claim

What is claimed is:

1. A method comprising:
focusing a radiation beam on a surface;
introducing a precursor gas near the surface wherein the precursor gas forms a first material on the surface upon radiation by the radiation beam;
introducing an assistant gas near the surface wherein the assistant gas produces nitric oxide radicals upon radiation by the radiation beam; and
introducing another precursor gas near the surface wherein the second precursor gas forms a second material over the first material upon radiation by the radiation beam.

2. The method of claim 1 , wherein the assistant gas produces oxygen radicals upon radiation by the radiation beam.

3. The method of claim 1 , wherein the assistant gas is selected from the group consisting of: nitrogen dioxide (NO 2 ), nitrous oxide (N 2 O), nitrosylazide (N 4 O), nitrate radical (NO 3 ), dinitrogen trioxide (N 2 O 3 ), dinitrogen tetroxide (N 2 O 4 ), dinitrogen pentoxide (N 2 O 5 ), and trinitramide (N(NO 2 ) 3 ).

4. The method of claim 1 , wherein the assistant gas is a polarized gas.

5. The method of claim 1 , wherein the precursor gas is selected from the group consisting of: Al(CH 3 ) 3 , Cl 4 H 10 , Co 2 (CO) 8 , Cr(C 6 H 6 ) 2 , Cr(CO) 6 , Fe(CO) 5 , Mo(CO) 6 , Ni(CO) 4 , Os 3 (CO) 12 , Pd(OOCCH 3 ) 2 , Ru 3 (CO) 12 , Re 2 (CO) 10 , TEOS, Ti(—OC 3 H 7 ) 4 , and W(CO) 6 .

6. The method of claim 1 , wherein the radiation beam is an electron beam.

7. The method of claim 1 , wherein the radiation beam is an ion beam.

8. A method comprising:
providing a substrate;
focusing a radiation beam on a surface of the substrate;
introducing an assistant gas near the surface wherein the assistant gas is a nitrogen oxide;
introducing a first precursor gas near the surface for a first duration wherein the first precursor gas, upon radiation by the radiation beam, forms a first film on the surface; and
introducing a second precursor gas near the surface for a second duration wherein the second precursor gas, upon radiation by the radiation beam, forms a second film over the first film.

9. The method of claim 8 , wherein the assistant gas is selected from the group consisting of: nitrogen dioxide (NO 2 ), nitrous oxide (N 2 O), nitrosylazide (N 4 O), nitrate radical (NO 3 ), dinitrogen trioxide (N 2 O 3 ), dinitrogen tetroxide (N 2 O 4 ), dinitrogen pentoxide (N 2 O 5 ), and trinitramide (N(NO 2 ) 3 ).

10. The method of claim 8 , wherein the assistant gas is a polarized gas.

11. The method of claim 8 , further comprising:
repeating the steps of introducing the first precursor gas and introducing the second precursor gas until a plurality of first and second films are formed in an alternating manner.

12. The method of claim 8 , wherein:
the first and second precursor gases are each selected from the group consisting of: Al(CH 3 ) 3 , Cl 4 H 10 , Co 2 (CO) 8 , Cr(C 6 H 6 ) 2 , Cr(CO) 6 , Fe(CO) 5 , Mo(CO) 6 , Ni(CO) 4 , Os 3 (CO) 12 , Pd(OOCCH 3 ) 2 , Ru 3 (CO) 12 , Re 2 (CO) 10 , TEOS, Ti(—OC 3 H 7 ) 4 , and W(CO) 6 ; and
the first and second precursor gases are different.

13. The method of claim 8 , wherein the radiation beam is an electron beam.

14. A method of forming a device, comprising:
focusing a radiation beam on a surface of a substrate held in a chamber;
injecting an assistant gas into the chamber wherein the assistant gas produces nitric oxide radicals upon radiation by the radiation beam;
injecting a first precursor gas into the chamber wherein the first precursor gas, upon radiation by the radiation beam, forms a first film on the surface;
stopping the injection of the assistant gas and the first precursor gas after the first film reaches a first thickness;
injecting a second precursor gas into the chamber wherein the second precursor gas, upon radiation by the radiation beam, forms a second film over the first film; and
stopping the injection of the second precursor gas after the second film reaches a second thickness.

15. The method of claim 14 , further comprising:
pumping gases out of the chamber after the stopping of the injection of the assistant gas and the first precursor gas.

16. The method of claim 14 , further comprising:
injecting the assistant gas into the chamber during the injection of the second precursor gas.

17. The method of claim 14 , further comprising:
forming a plurality of films in an alternating manner by repeating the steps of injecting the assistant gas, injecting the first precursor gas, stopping the injection of the assistant gas and the first precursor gas, injecting the second precursor gas, and stopping the injection of the second precursor gas.

18. The method of claim 14 , wherein the substrate is an extreme ultraviolet (EUV) mask.

19. The method of claim 14 , wherein the first precursor gas is different than the second precursor gas.

20. The method of claim 1 , further comprising identifying a defect in a material layer positioned under the surface, and wherein the first material on the surface is positioned directly over the defect.

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Yu Chia-Hao
• Chu Yuan-Chih

Classifications

• H10P14/3402

  characterised by the chemical composition · CPC title

• H10P14/24

  using chemical vapour deposition [CVD] · CPC title

• H10P14/6338 Primary

  the reactions being activated by other means than plasma or thermal, e.g. photo-CVD · CPC title

• C23C16/047

  using irradiation by energy or particles · CPC title

• H01L21/02277 Primary

  Electricity · mapped topic