Metal nanowires film

US9656912B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9656912-B2
Application numberUS-201514967348-A
CountryUS
Kind codeB2
Filing dateDec 13, 2015
Priority dateMay 21, 2015
Publication dateMay 23, 2017
Grant dateMay 23, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The disclosure relates to a metal nanowire film. The metal nanowire film includes a substrate and a number of first metal nanowire bundles located on the substrate. The number of first metal nanowire bundles are parallel with and spaced from each other. Each of the number of first metal nanowire bundles includes a number of first metal nanowires parallel with each other. The first distance between adjacent two of the number of first metal nanowires is less than the second distance between adjacent two of the number of first metal nanowire bundles.

First claim

Opening claim text (preview).

What is claimed is: 1. A metal nanowire film, comprising: a substrate having a surface; a plurality of first metal nanowire bundles located on and in direct contact the surface of the substrate; the plurality of first metal nanowire bundles are parallel with and spaced from each other; each of the plurality of first metal nanowire bundles comprises a plurality of first metal nanowires parallel to each other and parallel with the surface of the substrate; wherein a first distance between adjacent first metal nanowires is less than a second distance between adjacent first metal nanowire bundles; and a plurality of second metal nanowire bundles located on the substrate and crossed with the plurality of first metal nanowire bundles; the plurality of second metal nanowire bundles are parallel with and spaced from each other; each of the plurality of second metal nanowire bundles comprises a plurality of second metal nanowires parallel with each other; a third distance between adjacent second metal nanowires is less than a fourth distance between adjacent second metal nanowire bundles. 2. The metal nanowire film of claim 1 , wherein the first distance is in a range from about 0 nanometers to about 50 nanometers; and the second distance is in a range from about 10 micrometers to about 100 micrometers. 3. The metal nanowire film of claim 1 , wherein a first width of each of the plurality of first metal nanowire bundles is in a range from about 50 micrometers to about 500 micrometers; and a second width of each of the plurality of first metal nanowires is in a range from about 0.5 nanometers to about 50 nanometers. 4. The metal nanowire film of claim 1 , wherein intersections of the plurality of second metal nanowire bundles and the plurality of first metal nanowire bundles are integral. 5. The metal nanowire film of claim 1 , wherein the plurality of second metal nanowire bundles and the plurality of first metal nanowire bundles are perpendicular with each other. 6. The metal nanowire film of claim 1 , wherein a material of the plurality of first metal nanowires is selected from the group consisting of gold, silver, copper, iron, aluminum, nickel and chromium. 7. The metal nanowire film of claim 1 , wherein the substrate comprises rigid materials selected from the group consisting of silicon, ceramic, glass, quartz, diamond, metal oxide and plastic. 8. The metal nanowire film of claim 1 , wherein the substrate comprises flexible materials selected from the group consisting of polycarbonate, polymethyl methacrylate acrylic, polyethylene terephthalate, polyether polysulfones, polyvinyl polychloride, benzocyclobutenes, polyesters, polyimide, polyethylene, acrylonitrile-butadiene-styrene copolymer, polyamide, polybutylene terephthalate, and acrylic resins. 9. The metal nanowire film of claim 4 , wherein the plurality of second metal nanowires bundles and the plurality of first metal nanowires bundles are made by following steps: applying a metal layer on the surface of the substrate, wherein the metal layer has a metal layer surface spaced from the surface; providing a carbon nanotube composite structure, wherein the carbon nanotube composite structure defines a plurality of openings and comprises a carbon nanotube structure and a protective layer, coated on the carbon nanotube structure; the carbon nanotube structure comprises a first carbon nanotube film and a second carbon nanotube film stacked with each other; the first carbon nanotube film comprises a plurality of first carbon nanotubes that are joined end-to-end by van der Waals attractive force therebetween and substantially arranged along the same first direction and scanned by laser along the same first direction; and the second carbon nanotube film comprises a plurality of second carbon nanotubes that are joined end-to-end by van der Waals attractive force therebetween and substantially arranged along the same second direction and scanned by laser along the same second direction; and the second direction is different from the first direction; placing the carbon nanotube composite structure on the metal layer surface, wherein parts of the metal layer are exposed by the plurality of openings; dry etching the metal layer using the carbon nanotube composite structure as a mask; and removing the carbon nanotube composite structure.

Assignees

Inventors

Classifications

  • Mesh conductors, e.g. as a ground plane · CPC title

  • Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00 · CPC title

  • Alloys based on copper · CPC title

  • Au · CPC title

  • Conductor shape · CPC title

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Frequently asked questions

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What does patent US9656912B2 cover?
The disclosure relates to a metal nanowire film. The metal nanowire film includes a substrate and a number of first metal nanowire bundles located on the substrate. The number of first metal nanowire bundles are parallel with and spaced from each other. Each of the number of first metal nanowire bundles includes a number of first metal nanowires parallel with each other. The first distance betw…
Who is the assignee on this patent?
Univ Tsinghua, Hon Hai Prec Ind Co Ltd
What technology area does this patent fall under?
Primary CPC classification C03C17/09. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 23 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).