Integrated circuit layout design system and method

Patent metadata

Field	Value
Publication number	US-9652580-B2
Application number	US-201514709885-A
Country	US
Kind code	B2
Filing date	May 12, 2015
Priority date	Jul 23, 2014
Publication date	May 16, 2017
Grant date	May 16, 2017

Abstract

A method of generating a photo mask for use during fabrication of a semiconductor device includes; generating an initial layout design including critical circuit paths and non-critical circuit paths by shielding all gate line patterns used to implement transistors in the critical circuits and non-critical circuits, and thereafter generating a layout design from the initial layout design by selectively un-shielding a non-critical gate line pattern among the gate line patterns used to implement a gate of a non-critical transistor in a non-critical circuit, while retaining the shielding of all critical gate line patterns among the gate line patterns.

First claim

What is claimed is:

1. A method generating a layout design for a semiconductor device, the method comprising:
generating an initial layout design from a schematic circuit design including a first circuit having a first transistor with a first gate configured from a first gate line pattern and a second circuit having a second transistor with a second gate configured from a second gate line pattern, wherein each of the first and second gate line patterns are designated with a mark in the initial layout design to indicate that the respective widths of the first and second gate line patterns cannot be modified within the initial layout design;
optimizing the first circuit in view of a performance characteristic for the first transistor and removing the designation mark for the first gate line pattern during generation of a final layout design;
generating the final layout design from the initial layout design, wherein the final layout design includes: (a) the designation mark for the second gate line pattern indicating that the width of the second gate line pattern cannot be modified within the final layout design and (b) the absence of the designation mark for the first gate line pattern, indicating that the width of the first gate line pattern can be modified within the final layout design; and
manufacturing the semiconductor device using the final layout design.

2. The method of claim 1 , wherein the first circuit affects the maximum throughput of data signals within the semiconductor device and the second circuit does not affect the maximum throughput of the data signals within the semiconductor device.

3. The method of claim 1 , wherein:
the schematic circuit design further includes a third circuit having a third transistor with a third gate configured from a third gate line pattern,
the third gate line pattern is designated with another mark in the initial layout design to indicate that the width of the third gate line pattern cannot be modified within the initial layout design, and
the method further comprises optimizing the third circuit in view of a performance characteristic for the third transistor and removing the other mark from the third gate line pattern during generation of the final layout design.

4. The method of claim 3 , further comprising either increasing respective widths of the first and third gate line patterns, or decreasing the respective widths of the first and third gate line patterns.

5. The method of claim 4 , wherein at least one of the first transistor, second transistor and third transistor is a fin-shaped field effect transistor.

6. A method generating a photo mask for use during fabrication of a semiconductor device, the method comprising:
generating an initial layout design, wherein the initial layout design includes information indicating that all gate line patterns used to implement transistors in critical circuits and non-critical circuits cannot be modified within the initial layout design; and thereafter,
generating a final layout design from the initial layout design, wherein the final layout design includes information indicating that all gate line patterns used to implement the transistors of the critical circuits cannot be modified within the final layout design and information indicating that a gate line pattern used to implement a gate of a transistor of one of the non-critical circuits can be modified within the final layout design; and
manufacturing the semiconductor device using the final layout design, wherein:
the critical circuits affect the maximum throughput of data signals within the semiconductor device, and
the non-critical circuits do not affect the maximum throughput of the data signals within the semiconductor device.

7. The method of claim 6 , further comprising changing a width of the gate line pattern used to implement the gate of the transistor of the one non-critical circuit, while retaining respective widths of all gate line patterns used to implement transistors in the critical circuits.

8. The method of claim 7 , wherein the changing of the width of the gate line pattern used to implement the gate of the transistor of the one non-critical circuit is performed during optical proximity correction of the final layout design.

9. The method of claim 7 , wherein the changing of the width of the gate line pattern used to implement the gate of the transistor of the one non-critical circuit enables leakage current optimization within the final layout design.

10. The method of claim 6 , further comprising:
modifying a width of the gate line pattern used to implement the gate of the transistor of the one non-critical circuit in the final layout design; and thereafter
checking a design rule for the width of the gate line pattern used to implement the gate of the transistor of the one non-critical circuit in the final layout design.

11. The method of claim 10 , further comprising generating the photo mask from the final layout design.

12. The method of claim 11 , wherein the modifying of the width of the gate line pattern used to implement the gate of the transistor of the one non-critical circuit in the final layout design and the checking of the design rule for the width of the gate line pattern used to implement the gate of the transistor of the one non-critical circuit in the final layout design are performed with an optical proximity correction of the final layout design.

13. The method of claim 6 , wherein the initial layout design defines respective geometries for gate line patterns indicated on the photo mask.

14. A method optimizing the performance of a circuit provided in a semiconductor device and including semiconductor transistors, the method comprising:
optimizing a first performance characteristic of the circuit during generation of an initial layout design for the semiconductor device, wherein the initial layout design includes design information defining respective widths of gate line patterns used to implement the semiconductor transistors, and non-modification information that prevents modification of the respective widths of the gate line patterns;
identifying a circuit path in the circuit including a first transistor among the semiconductor transistors and having a gate implemented using a first gate line pattern among the gate line patterns;
optimizing a second performance characteristic of the circuit path to generate optimization information;
using the initial layout design and the optimization information to generate a final layout design for the semiconductor device, wherein the non-modification information is modified to permit modification of the width of the first gate line pattern; and
manufacturing the semiconductor device using the final layout design.

15. The method of claim 14 , wherein the first performance characteristic of the circuit is one of physical size, operating speed and fabrication cost, and the second performance characteristic of the circuit path is leakage current.

16. The method of claim 14 , wherein the circuit path does not affect the maximum throughput of data signals within the semiconductor device.

17. The method of claim 14 , wherein generating the initial layout design comprises performing a design rule check for the initial layout design, and generating the final layout design comprises performing a design rule check for the final layout design.

18. The method of claim 17 , where the design rule for the initial layout design and the design rule for the final layout design are the same.

19. The method of claim 14 , f

Assignees

• Song Taejoong
• Park Jae-Ho
• Baek Sanghoon
• Yang Giyoung
• Oh Sang-Kyu
• Won Hyosig
• Samsung Electronics Co Ltd

Inventors

• Song Taejoong
• Park Jae-Ho
• Baek Sanghoon
• Yang Giyoung
• Oh Sang-Kyu
• Won Hyosig

Classifications

• G06F30/398 Primary

  Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM] (optical proximity correction [OPC] design processes G03F1/36) · CPC title

• G06F30/392

  Floor-planning or layout, e.g. partitioning or placement · CPC title

• G06F2119/12

  Timing analysis or timing optimisation · CPC title

• G06F17/5072

  Physics · mapped topic

• G06F17/5081 Primary

  Physics · mapped topic