Manufacturing method for enhancing ordered structure of block copolymers

US9650495B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9650495-B2
Application numberUS-201414167326-A
CountryUS
Kind codeB2
Filing dateJan 29, 2014
Priority dateOct 9, 2013
Publication dateMay 16, 2017
Grant dateMay 16, 2017

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  1. Title

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  5. First independent claim

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Abstract

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The invention is related to a manufacturing method for enhancing an ordered structure of block copolymers, and more particularly to a thermal annealing process for block copolymers having conducting polymers and rod segments. The manufacturing method includes the following steps: (A) providing a block copolymer and a small molecule additive, wherein the block copolymer is formed of first monomers containing at least one aromatic ring and second monomers optionally containing at least one aromatic ring; and the small molecule additive is a aliphatic molecule, an aromatic molecule or a combination thereof; (B) blending the block copolymer and the small molecule additive to form a mixture; and (C) treating the mixture with a thermal annealing process to manufacture and facilitate the ordered structure of the block copolymers.

First claim

Opening claim text (preview).

What is claimed is: 1. A manufacturing method for enhancing an ordered structure of block copolymers, sequentially comprising the following steps: (A) providing a block copolymer and a molecule additive, wherein the block copolymer is formed of a first monomer containing at least one aromatic ring, and a second monomer optionally containing at least one aromatic ring, the first monomer and the second monomer are different; the molecule additive is a aliphatic molecule, an aromatic molecule or a combination thereof; and the aromatic rings of the first monomer, the second monomer, and the molecule additive are each independently selected from the group consisting of: a substituted or unsubstituted heterocyclic aromatic ring, a substituted or unsubstituted homocyclic aromatic ring, and a substituted or unsubstituted polycyclic aromatic ring (B) blending the block copolymer and the molecule additive to form a mixture; and (C) treating the mixture with a thermal annealing process to manufacture and facilitate the ordered structure of the block copolymers. 2. The manufacturing method of claim 1 , wherein the aromatic rings of the first monomer, the second monomer and the molecule additive are similar to, the same as, or different from each other. 3. The manufacturing method of claim 1 , wherein the aromatic rings of the first monomer, the second monomer, and the molecule additive are each independently selected from the group consisting of: a substituted or unsubstituted thiophene, a substituted or unsubstituted furan, a substituted or unsubstituted pyrrole, a substituted or unsubstituted imidazole, a substituted or unsubstituted oxazole, a substituted or unsubstituted thiazole, a substituted or unsubstituted benzene, a substituted or unsubstituted pyridine, a substituted or unsubstituted pyrimidine, and a substituted or unsubstituted pyrazine. 4. The manufacturing method of claim 1 , wherein the substituents are each independently selected from the group consisting of: a C 1-30 alkyl group, a C 3-30 cycloalkyl group, a C 3-30 heterocycloalkyl group, a C 6-30 aryl group, a C 5-30 heteroaryl group, —R 1 COOR 1 ′, —R 2 COR 2 ′, and —R 3 —O—R 3 ′, wherein R 1 , R 2 and R 3 are each independently a bond or a C 1-30 alkyl group, and R 1 ′, R 2 ′ and R 3 ′ are each independently hydrogen or a C 1-30 alkyl group. 5. The manufacturing method of claim 3 , wherein the substituents are each independently selected from the group consisting of: a C 1-30 alkyl group, a C 3-30 cycloalkyl group, a C 3-30 heterocycloalkyl group, a C 6-30 aryl group, a C 5-30 heteroaryl group, —R 1 COOR 1 ′, —R 2 COR 2 ′, and —R 3 —O—R 3 ′, wherein R 1 , R 2 and R 3 are each independently a bond or a C 1-30 alkyl group, and R 1 ′, R 2 ′ and R 3 ′ are each independently hydrogen or a C 1-30 alkyl group. 6. The manufacturing method of claim 1 , wherein the block copolymer is formed of the first monomer and the second monomer, and a first monomer segment formed of the first monomer is selected from the group consisting of: polythiophene, C1-30 alkyl-containing poly(3-alkylthiophene), polyfluorene, and poly(phenylvinylene); and a second monomer segment formed of the second monomer is selected from the group consisting of: poly(methyl methacrylate) (PMMA), polycarbonate (PC), polypropylene (PP), polyimide (PA), polydimethylsiloxane (PDMS), polyethylene terephthalate (PET), polyethylene (PE), polystyrene (PS) and polyethylene glycol (PEG). 7. The manufacturing method of claim 1 , wherein the molecule additive is selected from the group consisting of: polythiophene, C 1-30 alkyl-containing 3-alkylthiophene, dialkylphthalate, butyl benzyl phthalate (BBzP), and di(2-ethylhexyl) phthalate (DEHP). 8. The manufacturing method of claim 1 , wherein the molecule additive has a boiling point of 45° C. or more. 9. The manufacturing method of claim 1 , wherein the thermal annealing process is performed at a temperature of 25-400° C. 10. The manufacturing method of claim 1 , wherein the thermal annealing process is performed for 1-30 hours. 11. The manufacturing method of claim 1 , wherein the block copolymer and the molecule additive are blended in a weight ratio of 1 to 40.

Assignees

Inventors

Classifications

  • Introducing sulfur atoms or sulfur-containing groups · CPC title

  • C08K5/45Primary

    Heterocyclic compounds having sulfur in the ring · CPC title

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What does patent US9650495B2 cover?
The invention is related to a manufacturing method for enhancing an ordered structure of block copolymers, and more particularly to a thermal annealing process for block copolymers having conducting polymers and rod segments. The manufacturing method includes the following steps: (A) providing a block copolymer and a small molecule additive, wherein the block copolymer is formed of first monome…
Who is the assignee on this patent?
Univ Nat Taiwan
What technology area does this patent fall under?
Primary CPC classification C08K5/45. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 16 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).