Reagent and composition of resist
US-2016070165-A1 · Mar 10, 2016 · US
US9650357B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9650357-B2 |
| Application number | US-201414392352-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 23, 2014 |
| Priority date | Jun 24, 2013 |
| Publication date | May 16, 2017 |
| Grant date | May 16, 2017 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is disclosed.
Opening claim text (preview).
The invention claimed is: 1. A composition, comprising: a reagent; a first compound able to react with a chemical species to cause a deprotection reaction of the first compound; and a precursor, wherein the reagent is selected from the group consisting of a first reagent, a second reagent, and a third reagent, the first reagent being represented by one of formula (I), wherein R 1 is a hydrogen atom; R 2 is a phenyl group, an alkyl carbonyl group, an aryl carbonyl group, an alkyl group, an alkenyl group, an aralkyl group, an alkynyl group, an alkyl group containing a cyclic or poly cyclic moiety, or a substituent containing at least one atom other than carbon atom and hydrogen atom; and R 3 is a hydrogen atom, a phenyl group, an alkyl carbonyl group, an aryl carbonyl group, an alkyl group, an alkenyl group, an aralkyl group, an alkynyl group, an alkyl group containing a cyclic or poly cyclic moiety, or a substituent containing at least one atom other than carbon atom and hydrogen atom, the second reagent being represented by one of formula (II), wherein R 1 is a hydrogen atom; R 2 is a phenyl group, an alkyl carbonyl group, an aryl carbonyl group, an alkyl group, an alkenyl group, an aralkyl group, an alkynyl group, an alkyl group containing a cyclic or poly cyclic moiety, or a substituent containing at least one atom other than carbon atom and hydrogen atom; R 3 is a hydrogen atom, a phenyl group, an alkyl carbonyl group, an aryl carbonyl group, an alkyl group, an alkenyl group, an aralkyl group, an alkynyl group, an alkyl group containing a cyclic or poly cyclic moiety, or a substituent containing at least one atom other than carbon atom and hydrogen atom; and R 4 is a protective group for a hydroxyl group or a group containing a carbon atom; and the third reagent includes a hydroxyl group and a first cyclic moiety that contains a carbon atom bonded to the hydroxyl group and a hydrogen atom; wherein: an intermediate is generated from the reagent by a feed energy; the intermediate enhances a generation of the chemical species from a precursor; a product resulting from the intermediate has a conjugation length longer than a conjugation length of the reagent; wherein the feed energy is carried out by a first irradiation of the reagent or an acceptor receiving the energy with at least one of a light, the wavelength of which is shorter than or equal to 15 nm and an electron beam; and wherein the generation of the chemical species from the precursor is improved by a second irradiation with a light, the wavelength of which is longer than or equal to 300 nm. 2. The composition according to claim 1 , wherein a reaction of the chemical species with a first compound or the precursor regenerates the chemical species. 3. The composition according to claim 1 , wherein the intermediate has a reducing character. 4. The composition according to claim 1 , wherein the intermediate is a radical. 5. The composition according to claim 1 , wherein the intermediate discharges at least one of a hydrogen atom and hydrogen ion that have reducing characters. 6. The composition according to claim 1 , wherein the intermediate is a ketyl radical. 7. The composition according to claim 1 , wherein the chemical species is acid. 8. The composition according to claim 1 , wherein R 2 is connected to R 3 through at least one bond. 9. The composition according to claim 1 , wherein at least one of R 2 and R 3 is an aromatic group. 10. The composition according to claim 1 , wherein the product is formed by oxidation of the intermediate. 11. The composition according to claim 1 , wherein: the reagent further includes a second cyclic moiety; and the first cyclic moiety contains at least two atoms which are also contained in the second cyclic moiety. 12. The composition according to claim 1 , wherein R 4 is one of an ester group, alkyl group and tetrahydropyranyl group. 13. A method for manufacturing a device, the method comprising: applying a solution of the composition according to claim 1 to a substrate such that a coating film including the composition is formed on the substrate; a first irradiating the coating film with at least one of a first electromagnetic ray and a first particle ray such that a first portion of the coating film is irradiated with the at least one of the electromagnetic ray and the particle ray while a second portion of the coating film is not irradiated with the at least one of the electromagnetic ray and the particle ray; a second irradiating the coating film with at least one of a second electromagnetic ray and a second particle ray; removing the first portion; and etching the substrate such that a third portion of the substrate on which the first portion has been present is etched.
of masks comprising organic materials · CPC title
characterised by their composition, e.g. multilayer masks or materials · CPC title
Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma · CPC title
Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source (G03F7/70 takes precedence) · CPC title
Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to base for photographic purposes G03C1/74) · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.