Transparent display substrates, transparent display devices and methods of manufacturing transparent display devices

Patent metadata

Field	Value
Publication number	US-9647045-B2
Application number	US-201514817632-A
Country	US
Kind code	B2
Filing date	Aug 4, 2015
Priority date	Oct 30, 2014
Publication date	May 9, 2017
Grant date	May 9, 2017

Abstract

A transparent display substrate, a transparent display device, and a method of manufacturing a transparent display device, the substrate including a base substrate including a pixel area and a transmission area; a pixel circuit on the pixel area of the base substrate; an insulation layer covering the pixel circuit on the base substrate; a pixel electrode selectively disposed on the pixel area of the base substrate, the pixel electrode being electrically connected to the pixel circuit at least partially through the insulation layer; and a transmitting layer structure selectively disposed on the transmission area of the base substrate, the transmitting layer structure including at least an inorganic material, the inorganic material consisting essentially of silicon oxynitride.

First claim

What is claimed is:

1. A transparent display substrate, comprising:
a base substrate including a pixel area and a transmission area;
a buffer layer on the base substrate, the buffer layer including silicon oxynitride;
a pixel circuit on the pixel area of the base substrate;
an insulation layer covering the pixel circuit on the base substrate, the insulation layer including a gate insulation layer and an insulating interlayer, the gate insulation layer including silicon oxynitride;
a pixel electrode disposed only in the pixel area of the base substrate, the pixel electrode being electrically connected to the pixel circuit at least partially through the insulation layer; and
a transmitting layer structure selectively disposed on the transmission area of the base substrate, the transmitting layer structure consisting essentially of silicon oxynitride,
wherein at least one of the buffer layer and the gate insulation layer include a relative vertical concentration gradient of oxygen and nitrogen such that:
the buffer layer is richer in oxygen at an interface with the gate insulation layer than at an opposite side of the buffer layer, or
the gate insulation layer is richer in oxygen at an interface with the buffer layer and is richer in nitrogen at an interface with the insulating interlayer.

2. The transparent display substrate as claimed in claim 1 , further comprising a barrier layer between the base substrate and the pixel circuit.

3. The transparent display substrate of claim 1 , wherein the buffer layer is between the base substrate and the pixel circuit, the buffer layer consisting essentially of silicon oxynitride,
wherein the transmitting layer structure includes a portion of the buffer layer formed on the transmission area.

4. The transparent display substrate as claimed in claim 2 , wherein the buffer layer is between the barrier layer and the pixel circuit.

5. The transparent display substrate as claimed in claim 4 , wherein the barrier layer and the buffer layer consist essentially of silicon oxynitride.

6. The transparent display substrate as claimed in claim 5 , wherein the transmitting layer structure includes portions of the barrier layer and the buffer layer that are formed on the transmission area.

7. The transparent display substrate as claimed in claim 6 , wherein the portions of the barrier layer and the buffer layer included in the transmitting layer structure are merged with each other such that the transmitting layer structure has a single-layered structure.

8. The transparent display substrate as claimed in claim 6 , wherein the insulation layer is disposed selectively on the pixel area, and does not extend on the transmission area.

9. The transparent display substrate as claimed in claim 2 , wherein:
the pixel circuit includes an active pattern, a gate electrode, a source electrode and a drain electrode stacked on the barrier layer,
the insulation layer includes:
the gate insulation layer covering the active pattern on the barrier layer;
the insulating interlayer covering the gate electrode on the gate insulation layer; and
a via insulation layer covering the source electrode and the drain electrode on the insulating interlayer,

the source electrode and the drain electrode extend through the insulating interlayer and the gate insulation layer to be in contact with the active pattern, and
the pixel electrode is on the via insulation layer and extend through the via insulation layer to be in contact with the drain electrode.

10. The transparent display substrate as claimed in claim 9 , wherein the via insulation layer includes an organic material, and is selectively disposed on the pixel area.

11. The transparent display substrate as claimed in claim 9 , wherein the gate insulation layer and the insulating interlayer consist essentially of silicon oxynitride.

12. The transparent display substrate as claimed in claim 11 , wherein the gate insulation layer and the insulating interlayer extend commonly and continuously on the pixel area and the transmission area,
wherein the transmitting layer structure includes portions of the barrier layer, the gate insulation layer, and the insulating interlayer that are formed on the transmission area.

13. The transparent display substrate as claimed in claim 12 , wherein the layers included in the transmitting layer structure are merged with each other to have a single-layered structure.

14. The transparent display substrate as claimed in claim 9 , wherein the buffer layer is between the barrier layer and the gate insulation layer, wherein the barrier layer and the buffer layer consist essentially of silicon oxynitride.

15. The transparent display substrate of clam 14 , wherein the buffer layer is richer in nitrogen at an interface with the barrier layer.

16. A transparent display device, comprising:
a base substrate including a pixel area and a transmission area;
a pixel circuit on the pixel area of the base substrate;
a pixel electrode selectively disposed on the pixel area of the base substrate, the pixel electrode being electrically connected to the pixel circuit;
a display layer on the pixel electrode;
an opposing electrode facing the pixel electrode on the display layer, the opposing electrode being commonly disposed on the pixel area and the transmission area and a thickness of a portion of the opposing electrode on the transmission area being smaller than a thickness of a portion of the opposing electrode on the pixel area;
a transmitting layer structure selectively disposed on the transmission area of the base substrate, the transmitting layer structure including at least an inorganic material, the inorganic material consisting essentially of silicon oxynitride; and
a transmitting window defined on the transmission area of the base substrate, a top surface of the transmitting layer structure being exposed through the transmitting window.

17. The transparent display device as claimed in claim 16 , further comprising:
a barrier layer between the base substrate and the pixel circuit;
a gate insulation layer and an insulating interlayer sequentially formed on the barrier layer and partially covering the pixel circuit;
a via insulation layer selectively disposed on a portion of the insulating interlayer of the pixel area and covering the pixel circuit; and
a pixel defining layer partially covering the pixel electrode on the via insulation layer.

18. The transparent display device as claimed in claim 17 , wherein:
the barrier layer, the gate insulation layer and the insulating interlayer are commonly provided on the pixel area and the transmission area, and
the transmitting layer structure includes portions of the barrier layer, the gate insulation layer and the insulating interlayer formed on the transmission area.

19. The transparent display device as claimed in claim 18 , wherein the transmitting window is defined by sidewalls of the pixel defining layer and the via insulation layer, and a top surface of the insulating interlayer.

20. The transparent display device as claimed in claim 17 , wherein:
the opposing electrode is formed along surfaces of the pixel defining layer and the display layer, and a bottom and a sidewall of the transmitting window, and
a thickness of a portion of the opposing electrode on the bottom and the sidewall of the transmitting window is smaller than a thickness of a portion of the opposing electrode on the surfaces of the pixel defining layer and the display layer.

Assignees

• Samsung Display Co Ltd

Inventors

• Jung Seung-Ho
• Choi Chaun-Gi
• Yoon Young-Sik
• Jeon Joo-Hee
• Jo Jung-Yun

Classifications

• G02F1/136286 Primary

  Wiring, e.g. gate line, drain line · CPC title

• H10K59/8791

  Arrangements for improving contrast, e.g. preventing reflection of ambient light · CPC title

• H01L51/5281

  Electricity · mapped topic

• H01L27/3258 Primary

  Electricity · mapped topic

• H01L27/3244

  Electricity · mapped topic