Metal-oxide semiconductor field effect transistor, method of fabricating the same, and semiconductor apparatus including the same

Patent metadata

Field	Value
Publication number	US-9646891-B2
Application number	US-201514605017-A
Country	US
Kind code	B2
Filing date	Jan 26, 2015
Priority date	Feb 13, 2014
Publication date	May 9, 2017
Grant date	May 9, 2017

Abstract

Example embodiments relate to a metal-oxide semiconductor field effect transistor (MOSFET) of a high performance operating with a necessary threshold voltage while including a channel region formed based on a group III-V compound, and a method of manufacturing the MOSFET. The MOSFET includes a substrate, a semiconductor layer including a group III-V compound on the substrate, and a gate structure disposed on the semiconductor layer, and including a gate electrode formed based on metal and undergone an ion implantation process.

First claim

What is claimed is:

1. A metal-oxide semiconductor field effect transistor (MOSFET) comprising:
a substrate;
a semiconductor layer including a group III-V compound on the substrate; and
a gate structure on the semiconductor layer, the gate structure including a gate electrode and a dielectric layer between the gate electrode and the semiconductor layer, the gate electrode including an ion-implanted first metal layer on the dielectric layer and a second metal layer on the first metal layer,
wherein the first metal layer includes titanium nitride (TiN)/titanium aluminum carbide (TiAlC)/TiN layers.

2. The MOSFET of claim 1 , wherein the second metal layer comprises at least a tungsten (W) layer.

3. The MOSFET of claim 1 , wherein the first metal layer includes at least one TiN layer, the TiN layer being nitrogen (N) ions-implanted.

4. The MOSFET of claim 1 , further comprising a buffer layer on the substrate.

5. The MOSFET of claim 4 , wherein the substrate comprises silicon (Si), the semiconductor layer includes a channel region including indium gallium arsenide (InGaAs) or indium arsenide (InAs), and the buffer layer includes one or more gallium arsenide (GaAs)/indium phosphate (InP)/indium aluminum arsenide (InAlAs) layers.

6. The MOSFET of claim 1 , wherein the gate electrode comprises a metal having a work function of substantially 4.5 eV or greater.

7. The MOSFET of claim 1 , wherein the gate electrode comprises at least one of rhenium (Re), iridium (Ir), platinum (Pt) and palladium (Pd).

8. The MOSFET of claim 1 , wherein the semiconductor layer comprises a channel region, a source region, and a drain region,
wherein the channel region is under the gate structure, the source region and the drain region are at opposite side surfaces of the channel region, and the MOSFET is a planar type in which the channel region is flat or a fm type in which the channel region protrudes from the substrate.

9. The MOSFET of claim 8 , wherein the semiconductor layer comprises InGaAs, the source region and the drain region include at least one of Si ions and tin (Sn) ions.

10. The MOSFET of claim 8 , wherein the semiconductor layer includes InAs, the source region and the drain region include at least one of carbon (C) ions, Si ions, and Sn ions.

11. The MOSFET of claim 1 , wherein the first metal layer surrounds a lower surface and lateral surfaces of the second metal layer.

12. The MOSFET of claim 1 , further comprising a buffer layer between the substrate and the semiconductor layer,
wherein the substrate is a Si substrate, the semiconductor layer includes a channel region including InGaAs or InAs, the buffer layer includes GaAs/InP/InAlAs layers.

13. The MOSFET of claim 1 , wherein the MOSFET is one of an N-channel MOS (NMOS), a P-channel MOS (PMOS), and a complementary MOS (CMOS).

14. A semiconductor apparatus comprising:
a substrate;
a buffer layer on the substrate;
a semiconductor layer including a group III-V compound on the buffer layer; and
at least two gate structures on the semiconductor layer, each gate structure including a gate electrode, the gate electrode being metal-based and ion-implanted,
wherein the at least two gate structures form at least two transistors with corresponding parts of the semiconductor layer, the at least two transistors have different threshold voltages from each other, and the gate electrodes in the at least two transistors have different doping concentrations or different ions from each other,
wherein the gate electrodes include an ion-implanted first metal layer and a second metal layer on the first metal layer, and
wherein the first metal layer includes titanium nitride (TiN)/titanium aluminum carbide (TiAlC)/TiN layers.

15. The semiconductor apparatus of claim 14 , wherein the substrate comprises silicon (Si), the semiconductor layer includes a channel region including indium gallium arsenide (InGaAs) or indium arsenide (InAs), the buffer layer includes one or more gallium arsenide (GaAs)/indium phosphate (InP)/indium aluminum arsenide (InAlAs) layers, and the gate electrodes in the at least two transistors have nitrogen (N) ions at different doping concentrations.

16. The semiconductor apparatus of claim 14 , wherein the at least two transistors form a logic device.

17. A metal-oxide semiconductor field effect transistor (MOSFET) comprising:
a substrate;
a semiconductor layer including a group II-V compound on the substrate; and
a gate electrode on the semiconductor layer, the gate electrode being ion-implanted;
wherein a work function of the gate electrode is increased based on at least one of a type and concentration of the implanted one or more ions, and the gate electrode comprises at least a first metal layer and a second metal layer, the first metal layer being implanted with the one or more ions, and
wherein the first metal layer includes titanium nitride (TiN)/titanium aluminum carbide (TiAlC)/TiN layers.

18. The MOSFET of claim 17 , wherein the implanted one or more ions comprise at least one of nitrogen ion, oxygen ions, chlorine ions and bromine ions.

19. The MOSFET of claim 17 , wherein a dielectric layer is disposed between the gate electrode and the semiconductor layer, and the first metal layer is between the second metal layer and the dielectric layer.

20. The MOSFET of claim 17 , wherein
the second metal layer includes at least one tungsten (W) layer; and
the semiconductor layer includes a channel region including InGaAs or InAs.

21. The MOSFET of claim 17 , further comprising a buffer layer between the semiconductor layer and the substrate, the buffer layer including one or more GaAs/InP/InAlAs layers.

Assignees

• Yang Jung-Gil
• Kwon Tae-Yong
• Zhang Xingui
• Kim Sang-Su
• Samsung Electronics Co Ltd

Inventors

• Yang Jung-Gil
• Kwon Tae-Yong
• Zhang Xingui
• Kim Sang-Su

Classifications

• H10D64/01358

  the insulator being formed after the semiconductor body, the semiconductor being a Group III-V material · CPC title

• H01L27/0922

  Electricity · mapped topic

• H01L29/66522

  Electricity · mapped topic

• H01L27/0605

  Electricity · mapped topic

• H01L27/092

  Electricity · mapped topic