Salt, acid generator, photoresist composition, and method for producing photoresist pattern

Patent metadata

Field	Value
Publication number	US-9645490-B2
Application number	US-201514964842-A
Country	US
Kind code	B2
Filing date	Dec 10, 2015
Priority date	Dec 15, 2014
Publication date	May 9, 2017
Grant date	May 9, 2017

Abstract

A salt represented by the formula (I):

wherein Q 1 and Q 2 each independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group;
R 1 represents a C 1 to C 12 alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group;

A 1 represents a C 2 to C 8 alkanediyl group; and
R 2 represents a C 5 to C 18 alicyclic hydrocarbon group in which a hydrogen atom may be replaced by a hydroxy group, and in which a methylene group may be replaced by an oxygen atom or a carbonyl group, and which alicyclic hydrocarbon group may have a cyclic ketal structure optionally having a fluorine atom; and
“m” represents an integer of 0, 1, 2 or 3.

First claim

What is claimed is:

1. A salt represented by the formula (I):

wherein Q 1 and Q 2 each independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group;
R 1 represents a C 1 to C 12 alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group;

A 1 represents a C 2 to C 8 unsubstituted alkanediyl group; and
R 2 represents a C 5 to C 18 alicyclic hydrocarbon group in which a hydrogen atom may be replaced by a hydroxy group, and in which a methylene group may be replaced by an oxygen atom or a carbonyl group, and which alicyclic hydrocarbon group may have a cyclic ketal structure optionally having a fluorine atom; and
“m” represents an integer of 0, 1, 2 or 3.

2. The salt according to claim 1 wherein
the alicyclic hydrocarbon group for R 2 is an adamantyl group.

3. The salt according to claim 1 wherein
R 1 represents a C 1 to C 6 alkyl group.

4. An acid generator which comprises the salt according to claim 1 .

5. A photoresist composition which comprises the salt according to claim 1 and a resin having an acid-labile group.

6. The photoresist composition according to claim 5 , which further comprises a salt which generates an acid weaker in acidity than an acid generated from the salt according to claim 1 .

7. A process for producing a photoresist pattern comprising the following steps (1) to (5):
(1) a step of applying the photoresist composition according claim 5 on a substrate,
(2) a step of forming a composition film by conducting drying,
(3) a step of exposing the composition film to radiation,
(4) a step of baking the exposed composition film, and
(5) a step of developing the baked composition film.

Assignees

• Sumitomo Chemical Co

Inventors

• Anryu Yukako
• Ichikawa Koji

Classifications

• C07C309/17

  containing carboxyl groups bound to the carbon skeleton · CPC title

• G03F7/325

  Non-aqueous compositions · CPC title

• G03F7/2041

  in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title

• C07D321/12

  Eight-membered rings · CPC title

• G03F7/0045 Primary

  with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title