MEMS device and method for manufacturing the MEMS device

US9641949B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9641949-B2
Application numberUS-201414320466-A
CountryUS
Kind codeB2
Filing dateJun 30, 2014
Priority dateJun 30, 2014
Publication dateMay 2, 2017
Grant dateMay 2, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A MEMS device and a method for manufacturing a MEMS device are disclosed. In an embodiment the MEMS device comprises a support having a cavity therethrough and a membrane extended over the cavity of the support, wherein the membrane is at least partially reinforced by graphene.

First claim

Opening claim text (preview).

What is claimed is: 1. A MEMS device comprising: a support having a cavity therethrough; and a membrane arranged on the support such that the membrane extends over the cavity of the support, wherein the membrane is at least partially reinforced by graphene, wherein the membrane is arranged between the support and the graphene, and wherein the membrane is displaceable over the cavity. 2. The MEMS device according to claim 1 , wherein the membrane comprises a material different from graphene. 3. The MEMS device according to claim 1 , wherein the membrane comprises poly silicon or consists of poly silicon. 4. The MEMS device according to claim 1 , wherein a suspension area of the membrane is reinforced by graphene. 5. The MEMS device according to claim 1 , wherein the membrane is reinforced by a graphene layer, and wherein the graphene layer covers the membrane at least partially. 6. The MEMS device according to claim 5 , wherein the graphene layer is a single layer graphene or a multilayer graphene. 7. The MEMS device according to claim 1 , wherein the support is a dielectric spacer. 8. The MEMS device according to claim 1 , further comprising a conductive back plate unit, wherein the support is arranged on the back plate unit. 9. The MEMS device according to claim 8 , further comprising a first electrode arranged in contact with the conductive back plate unit and a second electrode arranged in contact with the membrane. 10. The MEMS device according to claim 8 , further comprising a substrate, wherein the conductive back plate unit is arranged to extend over the substrate. 11. The MEMS device according to claim 8 , wherein the conductive back plate unit comprises a plurality of conductive perforated back plate portions, wherein the support is arranged on the back plate unit between adjacent conductive perforated back plate portions. 12. The MEMS device according to claim 11 , further comprising a substrate having a cavity therethrough, wherein the conductive back plate unit is arranged such that the plurality of conductive perforated back plate portions extend over the cavity of the substrate. 13. The MEMS device according to claim 12 , wherein the membrane is arranged between the substrate and the conductive back plate unit. 14. The MEMS device according to claim 13 , wherein the conductive back plate unit is arranged between the substrate and the membrane. 15. The MEMS device according to claim 11 , further comprising a further conductive back plate unit including a plurality of perforated back plate portions and arranged such that the membrane is sandwiched between the conductive back plate unit and the further conductive back plate unit. 16. A method for manufacturing a MEMS device, the method comprising: providing a support having a cavity therethrough; providing a membrane on the support such that the membrane extends over the cavity of the support, wherein the membrane is displaceable over the cavity; and reinforcing the membrane at least partially by graphene. 17. The method according to claim 16 , wherein reinforcing the membrane at least partially by graphene comprises depositing a graphene layer on the membrane such that the membrane is at least partially covered with the graphene layer. 18. The method according to claim 16 , wherein reinforcing the membrane at least partially by graphene comprises reinforcing at least a suspension area of the membrane.

Assignees

Inventors

Classifications

  • Pressure sensors · CPC title

  • H04R31/003Primary

    for diaphragms or their outer suspension · CPC title

  • Diaphragms, i.e. structures separating two media that can control the passage from one medium to another; Membranes, i.e. diaphragms with filtering function · CPC title

  • using semiconductor materials · CPC title

  • Diaphragms comprising ceramic-like materials, e.g. pure ceramic, glass, boride, nitride, carbide, mica and carbon materials · CPC title

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Frequently asked questions

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What does patent US9641949B2 cover?
A MEMS device and a method for manufacturing a MEMS device are disclosed. In an embodiment the MEMS device comprises a support having a cavity therethrough and a membrane extended over the cavity of the support, wherein the membrane is at least partially reinforced by graphene.
Who is the assignee on this patent?
Infineon Technologies Ag
What technology area does this patent fall under?
Primary CPC classification H04R31/003. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 02 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).