Apparatus and method for enhancing the cool down of radiatively heated substrates

Patent metadata

Field	Value
Publication number	US-9640412-B2
Application number	US-62273609-A
Country	US
Kind code	B2
Filing date	Nov 20, 2009
Priority date	Nov 20, 2009
Publication date	May 2, 2017
Grant date	May 2, 2017

Abstract

The present invention generally relates to methods and apparatus for processing substrates. Embodiments of the invention include apparatuses for processing a substrate comprising a dynamic heat sink that is substantially transparent to light from a radiant heat source, the dynamic heat sink being positioned near the substrate so the two are coupled. Additional embodiments of the invention are directed to methods of processing a substrate using the apparatuses described.

First claim

What is claimed is:

1. An apparatus for processing a substrate having a front side and a back side, the apparatus comprising:
a process area within a chamber defined on one side by a window adjacent a radiant heat source located outside the process area;
a dynamic heat sink positioned in the process area and substantially transparent to light from the radiant heat source; and
a substrate support in the process area to hold the substrate adjacent the dynamic heat sink during thermal processing in a position such that at least one of the front side and back side of the substrate faces the radiant heat source and so that the dynamic heat sink couples to the substrate to absorb heat from the substrate.

2. The apparatus of claim 1 , wherein during thermal processing of a substrate there is a gap between the dynamic heat sink and the substrate.

3. The apparatus of claim 1 , wherein during thermal processing the dynamic heat sink is positioned adjacent the substrate on the side opposite the radiant heat source.

4. The apparatus of claim 1 , wherein during thermal processing the dynamic heat sink is positioned adjacent the substrate on the same side as the radiant heat source between the radiant heat source and the substrate.

5. The apparatus of claim 1 , wherein the dynamic heat sink is supported by the substrate support.

6. The apparatus of claim 1 , wherein the dynamic heat sink is supported by an independent heat sink support and the independent heat sink support and substrate support are separately moveable.

7. The apparatus of claim 6 , wherein during thermal processing of a substrate, the independent heat sink support is operable to move the dynamic heat sink so that there is a gap that can be varied between the dynamic heat sink and the substrate.

8. The apparatus of claim 2 , wherein the gap is up to about 1 mm wide.

9. The apparatus of claim 2 , further comprising a conductive fluid source in fluid communication with the gap such that the gap can be filled with a conductive fluid or displace/mix with an existing fluid and be held substantially static.

10. The apparatus of claim 9 , wherein the fluid is selected from the group consisting of nitrogen gas, oxygen gas, helium gas, argon gas, hydrogen gas and combinations thereof.

11. The apparatus of claim 1 , further comprising a reflector plate to reflect light from the radiant heat source, the reflector plate being positioned so that one of the front side and the back side face the radiant heat source and the other of the front side and the back side face the reflector plate.

12. The apparatus of claim 1 , wherein the dynamic heat sink is selected from the group consisting of quartz, sapphire and transparent YAG.

Assignees

• Aderhold Wolfgang
• Ranish Joseph M
• Koelmel Blake R
• Applied Materials Inc

Inventors

• Aderhold Wolfgang
• Ranish Joseph M
• Koelmel Blake R

Classifications

• H10P72/0436 Primary

  mainly by radiation · CPC title

• H10P72/0434

  mainly by convection · CPC title

• H10P95/90 Primary

  Thermal treatments, e.g. annealing or sintering · CPC title

• H01L21/324 Primary

  Electricity · mapped topic

• H01L21/67115

  Electricity · mapped topic