Liquid treatment apparatus and liquid treatment method

US9640383B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9640383-B2
Application numberUS-201213985679-A
CountryUS
Kind codeB2
Filing dateJul 11, 2012
Priority dateAug 26, 2011
Publication dateMay 2, 2017
Grant dateMay 2, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A liquid treatment apparatus includes a substrate holding member that holds a substrate horizontally, a rotation mechanism that rotates the substrate holding member; a chemical liquid nozzle that supplies a chemical liquid to the substrate held by the substrate holding member; a top plate that covers the substrate held by the substrate holding member from above the substrate; and at least one LED lamp that heats the substrate during a chemical liquid treatment by irradiating the substrate with light of a predetermined wavelength through the top plate from above the top plate.

First claim

Opening claim text (preview).

The invention claimed is: 1. A liquid treatment apparatus comprising: a substrate holding member that holds a substrate horizontally; a rotation mechanism that rotates the substrate holding member; a chemical liquid nozzle that supplies a chemical liquid to the substrate held by the substrate holding member; a top plate that covers the substrate held by the substrate holding member from above the substrate; a rotation driving mechanism that rotates the top plate about a vertical axis; a moving arm that moves the top plate; at least one LED lamp that heats the substrate during a chemical liquid treatment by irradiating the substrate with light of a predetermined wavelength transmitted through the top plate from above the top plate; and a lamp support supporting the LED lamp, wherein the LED lamp and the lamp support are non-rotatably fixed to the moving arm such that the LED lamp and the lamp support are separated from the top plate by a vertical gap therebetween, and wherein the LED lamp is movable so as to face different radial regions of the substrate held by the substrate holding member. 2. The liquid treatment apparatus according to claim 1 , wherein a chemical liquid supply pipe is disposed outside the moving arm. 3. The liquid treatment apparatus according to claim 1 , wherein a plurality of the LED lamps are provided, and the LED lamps are disposed so as to oppose different radial areas of the substrate held by the substrate holding member, and power supplied to the LED lamps can be controlled independently. 4. The liquid treatment apparatus according to claim 1 , wherein the LED lamp irradiates light of a wavelength suitable for heating the substrate. 5. The liquid treatment apparatus according to claim 4 , wherein the top plate is made of a material transmissive to the light of the wavelength irradiated by the LED lamp. 6. The liquid treatment apparatus according to claim 5 , wherein the top plate is made of quartz or polytetrafluoroethylene. 7. The liquid treatment apparatus according to claim 1 , wherein the chemical liquid is SPM (a mixture of sulfuric acid and hydrogen peroxide solution). 8. The liquid treatment apparatus according to claim 1 , wherein the substrate holding member is provided on a holding plate, which is arranged such that the substrate is located between the top plate and the holding plate, and wherein the rotation mechanism is connected to the holding plate. 9. The liquid treatment apparatus according to claim 1 , wherein the substrate holding member is provided on the top plate, and wherein the rotation mechanism is connected to the top plate. 10. The liquid treatment apparatus according to claim 1 , further comprising a treatment cup that surrounds the substrate, wherein the top plate and the treatment cup forms a treatment space, and wherein the LED lamp is disposed outside the treatment space.

Assignees

Inventors

Classifications

  • mainly by radiation · CPC title

  • using mainly spraying means, e.g. nozzles · CPC title

  • using mainly spraying means, e.g. nozzles · CPC title

  • H10P70/20Primary

    Cleaning during device manufacture · CPC title

  • Electricity · mapped topic

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Frequently asked questions

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What does patent US9640383B2 cover?
A liquid treatment apparatus includes a substrate holding member that holds a substrate horizontally, a rotation mechanism that rotates the substrate holding member; a chemical liquid nozzle that supplies a chemical liquid to the substrate held by the substrate holding member; a top plate that covers the substrate held by the substrate holding member from above the substrate; and at least one L…
Who is the assignee on this patent?
Aiura Kazuhiro, Ito Norihiro, Nagai Takashi, and 1 more
What technology area does this patent fall under?
Primary CPC classification H10P72/0414. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 02 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).