Imaging catoptric EUV projection optical unit

Patent metadata

Field	Value
Publication number	US-9639005-B2
Application number	US-201414179692-A
Country	US
Kind code	B2
Filing date	Feb 13, 2014
Priority date	Sep 30, 2011
Publication date	May 2, 2017
Grant date	May 2, 2017

Abstract

An imaging catoptric optical unit has at least four mirror, which image an object field in an object plane into an image field in an image plane. A first chief ray plane of the optical unit is prescribed by propagation of a chief ray of a central object field point during the reflection at one of the mirrors. A second chief ray plane of the optical unit is prescribed by propagation of the chief ray of the central object field point during the reflection at one of the other mirrors. The two chief ray planes include an angle that differs from 0. In an alternative or additional aspect, the imaging optical unit, considered via the image field, has a maximum diattenuation of 10% or a diattenuation that prefers a tangential polarization of the imaging light for a respectively considered illumination angle. The result of both aspects is an imaging optical unit in which bothersome polarization influences are reduced during the reflection of imaging light at the mirrors of the imaging optical unit.

First claim

The invention claimed is:

1. An imaging optical unit, comprising:
a plurality of mirrors configured so that, during use of the imaging optical unit, the plurality of mirrors images an object field in an object plane into an image field in an image plane,
wherein:
the plurality of mirrors comprises first, second, third and fourth mirrors;
a first chief ray plane is defined by propagation of a chief ray of a central object field point during reflection at the first mirror;
a second chief ray plane is defined by propagation of the chief ray of the central object field point during the reflection at the second mirror;
the first and second chief ray planes define an angle that differs from 0; and
the imaging optical unit is an imaging catoptric EUV projection optical unit.

2. The imaging optical unit of claim 1 , wherein the first chief ray plane is perpendicular to the second chief ray plane.

3. The imaging optical unit of claim 2 , wherein the imaging optical unit has precisely two chief ray planes.

4. The imaging optical unit of claim 3 , wherein the imaging optical unit has an intermediate image in an imaging beam path between the object field and the image field.

5. The imaging optical unit of claim 1 , wherein the imaging optical unit has precisely two chief ray planes.

6. The imaging optical unit of claim 5 , wherein the imaging optical unit has an intermediate image in an imaging beam path between the object field and the image field.

7. The imaging optical unit of claim 1 , wherein the imaging optical unit has an intermediate image in an imaging beam path between the object field and the image field.

8. The imaging optical unit of claim 7 , wherein the first chief ray plane is perpendicular to the second chief ray plane.

9. An illumination system, comprising:
an illumination optical unit; and
an imaging optical unit according to claim 1 ,
wherein the illumination optical unit is configured to illuminate the object field.

10. An apparatus, comprising:
a light source; and
an illumination system which comprises:
an illumination optical unit; and
an imaging optical unit according to claim 1 ,

wherein the illumination optical unit is configured to illuminate the object field with light generated by the light source, and the apparatus is a projection exposure apparatus.

11. A method of using a microlithographic projection exposure apparatus comprising an illumination optical unit and an imaging optical unit, the method comprising:
using the illumination optical unit to illuminate a reticle comprising structures; and
using the imaging optical unit to project a portion of the reticle onto a light-sensitive material,
wherein the imaging optical unit comprises an imaging optical unit according to claim 1 .

12. The imaging optical unit of claim 1 , wherein:
the imaging optical unit has an image-side numerical aperture of at least 0.4;
considered via the image field, the imaging optical unit has a diattenuation for a specific illumination angle; and
the diattenuation attenuating imaging light polarized tangentially to the center of a pupil of the optical imaging unit to a lesser extent than imaging light polarized perpendicularly thereto.

13. An illumination system, comprising:
an illumination optical unit; and
an imaging optical unit according to claim 12 ,
wherein the illumination optical unit is configured to illuminate the object field.

14. An apparatus, comprising:
a light source; and
an illumination system which comprises:
an illumination optical unit; and
an imaging optical unit according to claim 12 ,

wherein the illumination optical unit is configured to illuminate the object field with light generated by the light source, and the apparatus is a projection exposure apparatus.

15. A method of using a microlithographic projection exposure apparatus comprising an illumination optical unit and an imaging optical unit, the method comprising:
using the illumination optical unit to illuminate a reticle comprising structures; and
using the imaging optical unit to project a portion of the reticle onto a light-sensitive material,
wherein the imaging optical unit comprises an imaging optical unit according to claim 12 .

16. An imaging optical unit, comprising:
at least four mirrors configured so that, during use of the imaging optical unit, the at least four mirrors image an object field in an object plane into an image field in an image plane,
wherein:
the imaging optical unit has an image-side numerical aperture of at least 0.4;
considered via the image field, the imaging optical unit has a maximum diattenuation of 10% for a specific, respectively considered illumination angle; and
the imaging optical unit is an imaging catoptric optical unit.

17. The imaging optical unit of claim 16 , wherein, considered over the image field, the imaging optical unit has a maximum diattenuation of 20% for all pupil coordinates.

18. An illumination system, comprising:
an illumination optical unit; and
an imaging optical unit according to claim 16 ,
wherein the illumination optical unit is configured to illuminate the object field.

19. An apparatus, comprising:
a light source; and
an illumination system which comprises:
an illumination optical unit; and
an imaging optical unit according to claim 16 ,

wherein the illumination optical unit is configured to illuminate the object field with light generated by the light source, and the apparatus is a projection exposure apparatus.

20. A method of using a microlithographic projection exposure apparatus comprising an illumination optical unit and an imaging optical unit, the method comprising:
using the illumination optical unit to illuminate a reticle comprising structures; and
using the imaging optical unit to project a portion of the reticle onto a light-sensitive material,
wherein the imaging optical unit comprises an imaging optical unit according to claim 16 .

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Ruoff Johannes
• Schicketanz Thomas

Classifications

• G02B17/06

  using mirrors only {, i.e. having only one curved mirror (used in non-imaging applications G02B19/00)} · CPC title

• G03F7/70566

  Polarisation control · CPC title

• G03F7/70233 Primary

  Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems · CPC title

• G03F7/7015

  Details of optical elements · CPC title

• G02B17/0663

  off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements · CPC title