Method for producing a nanoporous layer on a substrate

US9638693B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9638693-B2
Application numberUS-201314436301-A
CountryUS
Kind codeB2
Filing dateOct 4, 2013
Priority dateOct 27, 2012
Publication dateMay 2, 2017
Grant dateMay 2, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The invention relates to a method for producing a nanoporous layer on a substrate.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for producing a nanoporous layer on a substrate, comprising the following steps in order: a) selecting two types of particles, particles A and particles B, having different melting points; b) suspending both particles A and particles B in a solvent, thereby forming a suspension containing particles A and particles B; c) applying the suspension containing particles A and particles B to the substrate; d) melting, in a controlled manner, particles B having a lower melting point S mB , without reaching a melting point S mA of particles A which is higher than S mB , thereby forming a nanoporous layer on the substrate; and e) checking a surface of the nanoporous layer formed on the substrate. 2. The method according to claim 1 , comprising selecting particles A and B such that difference in the melting points S mA and S mB is caused by a different chemical composition of particles A and B. 3. The method according to claim 1 , comprising selecting particles A and B such that difference in the melting points S mA and S mB is caused by a different size of particles A and B. 4. The method according to claim 1 , comprising selecting particles o A and B such that difference in the melting points S mA and S mB is caused by a different shape of particles A and B. 5. The method according to claim 1 , wherein particles A and B are established at a weight ratio, with respect to each other, of A:B of 5:1 to 1000000:1 wt/wt. 6. The method according to claim 1 , wherein particles A and B are selected such that the melting points S mA and S mB differ by at least 1 K. 7. The method according to claim 1 , wherein steps a) to e) are carried out again after step e). 8. The method according to claim 1 , wherein during or after production of the nanoporous layer, functionalization of the nanoporous layer is carried out using immunologically active antibodies or antigens. 9. The method according to claim 8 , wherein the nanoporous layer after having been functionalized is contacted with a conductor, so as to conduct and detect electrical signals after immunologically active antigens or antibodies have bound to an analyte. 10. The method according to claim 1 , wherein average diameters of particles A and B are each 1 nm to 10 μm. 11. The method according to claim 1 , wherein particles A and B each comprise materials which conduct electricity. 12. The method according to claim 1 , wherein particles A and B each comprise semiconductor materials. 13. The method according to claim 1 , wherein particles A and B each comprise materials selected from the group consisting of gold, silver, platinum, aluminum oxide, silicon, copper, chromium, carbon, silver chloride, titanium, titanium oxide, iron oxide, magnesium oxide, zinc oxide, silicon oxide, silicon nitride and polyaniline.

Assignees

Inventors

Classifications

  • Nanosized particles · CPC title

  • with ligand physically entrapped within the solid phase (liposomes G01N33/5432; immunological test elements G01N33/54386) · CPC title

  • comprising at least one non-porous part · CPC title

  • by application of heat or pressure and heat (C23C24/04 takes precedence) · CPC title

  • After-treatment · CPC title

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Frequently asked questions

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What does patent US9638693B2 cover?
The invention relates to a method for producing a nanoporous layer on a substrate.
Who is the assignee on this patent?
Forschungszentrum Juelich Gmbh
What technology area does this patent fall under?
Primary CPC classification G01N33/5436. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue May 02 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).