Compensation for a disturbance in an optical source

Patent metadata

Field	Value
Publication number	US-9634460-B2
Application number	US-201615014149-A
Country	US
Kind code	B2
Filing date	Feb 3, 2016
Priority date	Dec 9, 2014
Publication date	Apr 25, 2017
Grant date	Apr 25, 2017

Abstract

A pulsed light beam emitted from an optical source is received, the pulsed light beam being associated with a temporal repetition rate; a frequency of a disturbance in the optical source is determined, the frequency being an aliased frequency that varies with the temporal repetition rate of the pulsed light beam; a correction waveform is generated based on the aliased frequency; and the disturbance in the optical source is compensated by modifying a characteristic of the pulsed light beam based on the generated correction waveform.

First claim

What is claimed is:

1. A method comprising:
determining first wavelength errors of a pulsed light beam, the first wavelength errors being based on a center wavelength associated with the pulsed light beam and actual wavelengths of a first plurality of pulses of the pulsed light beam;
determining a frequency associated with a disturbance in the optical source, the determined frequency being an aliased frequency;
applying a correction to the pulsed light beam, the correction being based on the aliased frequency; and
determining second wavelength errors of the pulsed light beam, the second wavelength errors being based on the center wavelength and actual wavelengths of a second plurality of pulses of the pulsed light beam, the second plurality of pulses occurring after the correction is applied to the pulsed light beam, wherein
a variation of the second wavelength errors is less than a variation of the first wavelength errors or at least one of the second wavelength errors is less than all of the first wavelength errors.

2. The method of claim 1 , wherein the variation of the second wavelength errors is less than a variation of the first wavelength errors and at least one of the second wavelength errors is less than all of the first wavelength errors.

3. The method of claim 1 , wherein applying a correction to the pulsed light beam comprises determining a correction waveform based on the aliased frequency.

4. The method of claim 3 , wherein applying a correction to the pulsed light beam comprises applying the determined correction waveform to an optical assembly, the optical assembly comprising an optical element positioned to interact with light that propagates in the optical source, the application of the correction waveform to the optical assembly being sufficient to move the optical element.

5. The method of claim 3 , wherein the correction waveform comprises an amplitude that is substantially the same as an amplitude of the disturbance and a phase that is shifted relative to a phase of the disturbance.

6. The method of claim 5 , wherein the phase of the correction waveform is shifted by one hundred and eighty degrees relative to the phase of the disturbance.

7. The method of claim 1 , wherein the disturbance comprises a plurality of separate and distinct frequencies.

8. The method of claim 7 , wherein the plurality of frequencies comprises a fundamental frequency and one or more harmonics of the fundamental frequency.

9. The method of claim 1 , wherein the pulsed light beam is associated with a repetition rate, and the aliased frequency varies with the repetition rate.

10. The method of claim 1 , wherein the first plurality of pulses and the second plurality of pulses comprise the same number of pulses.

11. The method of claim 1 , wherein
the center wavelength is a nominal wavelength of the pulses in the pulsed light beam,
the first wavelength errors comprise a difference between the center wavelength and the actual wavelength for each of the pulses in the first plurality of pulses, and
the second wavelength errors comprise a difference between the center wavelength and the actual wavelength for each of the pulses in the second plurality of pulses.

12. The method of claim 11 , wherein the variation of the first wavelength errors comprises a standard deviation of the first wavelength errors, and the variation of the second wavelength errors comprises a standard deviation of the second wavelength errors.

13. The method of claim 11 , further comprising:
determining the actual wavelength of each pulse in the first plurality of pulses based on measured data; and
determining the actual wavelength of each pulse in the second plurality of pulses based on measured data.

14. A system comprising:
an optical source configured to produce a pulsed light beam, the pulsed light beam being associated with a center wavelength, the optical source comprising:
a chamber,
a gaseous gain medium in the chamber,
an optical assembly comprising at least one optical element, and
a fan configured to circulate the gaseous gain medium in the chamber; and

a control system configured to communicate with the optical source, the control system operable to:
determine first wavelength errors of a pulsed light beam, the first wavelength errors being based on the center wavelength and actual wavelengths of a first plurality of pulses of the pulsed light beam;
determine a frequency associated with a disturbance in the optical source, the determined frequency being an aliased frequency;
apply a correction to the pulsed light beam, the correction being based on the aliased frequency; and
determine second wavelength errors of the pulsed light beam, the second wavelength errors being based on the center wavelength and actual wavelengths of a second plurality of pulses of the pulsed light beam, the second plurality of pulses occurring after the correction is applied to the pulsed light beam, wherein
a variation of the second wavelength errors is less than a variation of the first wavelength errors or at least one of the second wavelength errors is less than all of the first wavelength errors.

15. The system of claim 14 , further comprising a line center analysis module, the line center analysis module being configured to measure the wavelength of pulses in the pulsed light beam.

16. The system of claim 15 , wherein the control system is operable to determine the actual wavelengths of the first plurality of pulses based on an indication of a wavelength of the pulses in the first plurality of pulses from the line center analysis module, and the control system is operable to determine the second actual wavelengths of the second plurality of pulses based on an indication of a wavelength of the pulsed light beam at the second time from the line center analysis module.

17. The system of claim 14 , wherein the control system being operable to apply a correction to the pulsed light beam comprises the control system being operable to apply a correction waveform to the optical assembly of the optical source, the correction waveform being sufficient to move the at least one optical element of the optical assembly.

18. The system of claim 17 , wherein the at least one optical element comprises a prism.

19. The system of claim 14 , further comprising a lithography exposure apparatus configured to communicate with the control system.

20. The system of claim 14 , wherein the fan is configured to rotate at an angular frequency, and the disturbance in the optical source is associated with the rotation of the fan.

21. The system of claim 14 , wherein the disturbance comprises a plurality of separate and distinct frequencies.

22. A control system for an optical source, the control system comprising:
one or more electronic processors; and
a non-transitory computer-readable storage medium, the medium comprising instructions that, when executed, cause the one or more processors to:
determine first wavelength errors of a pulsed light beam, the first wavelength errors being based on a center wavelength of the pulsed light beam and actual wavelengths of a first plurality of pulses of the pulsed light beam;
determine a frequency associated with a disturbance in the optical source, the determined frequency being an aliased frequency;
apply a correction to the pulsed light beam, the correction being based on the aliased frequency; and
determine second wavelength errors of the pulsed light beam, the second wavelength e

Assignees

• Cymer LLC

Inventors

• Ahlawat Rahul

Classifications

• H01S3/1055

  one of the reflectors being constituted by a diffraction grating · CPC title

• H01S3/134

  in gas lasers · CPC title

• H01S3/09705

  with particular means for stabilising the discharge · CPC title

• H01S3/22

  Gases · CPC title

• H01S3/2308

  Amplifier arrangements, e.g. MOPA · CPC title