Plasma resistant ceramic coated conductive article

Patent metadata

Field	Value
Publication number	US-9394615-B2
Application number	US-201213687512-A
Country	US
Kind code	B2
Filing date	Nov 28, 2012
Priority date	Apr 27, 2012
Publication date	Jul 19, 2016
Grant date	Jul 19, 2016

Abstract

To manufacture a ceramic coated article, at least one surface of a conductive article is roughened to a roughness of approximately 100 micro-inches (μin) to approximately 300 μin. The conductive article may then be heated and coated with a ceramic coating comprising a yttrium containing oxide to a thickness of approximately 10-40 mil.

First claim

What is claimed is:

1. A component of a plasma etch reactor comprising:
a metal portion of the component having a roughened surface with a roughness of approximately 100 micro-inches (μin) to approximately 300 μin, wherein the metal portion of the component comprises a first region and a second region thermally isolated from the first region by a thermal break; and
a ceramic coating on the roughened surface of the metal portion of the component, wherein the ceramic coating comprises a yttrium containing oxide, the ceramic coating having a thickness of approximately 10-40 mil, wherein the ceramic coating has a thermal shock resistance sufficient for use at a temperature of up to approximately 150 degrees Celsius.

2. The component of claim 1 , wherein the component is a gas distribution plate.

3. The component of claim 2 , further comprising:
a plurality of approximately linear gas channels in the metal portion of the component, each of the plurality of approximately linear gas channels having a first end that receives a gas and a second end that delivers the gas, wherein the first end has a larger diameter than the second end.

4. The component of claim 1 , wherein the metal portion of the component comprises at least one of aluminum, copper or magnesium.

5. The component of claim 1 , wherein the ceramic coating is selected from a list consisting of Y 2 O 3 , Y 3 A 1 5 O 12 (YAG) and Y 2 O 3 stabilized ZrO 2 .

6. The component of claim 1 , wherein the ceramic coating is a composite comprising Y 4 Al 2 O 9 (YAM) and a solid solution of Y 2 -xZr x O 3 .

7. The component of claim 2 , further comprising:
a plurality of approximately linear gas channels in the metal portion, each of the plurality of approximately linear gas channels having a first end that receives a gas and a second end that delivers the gas, wherein the first end has smaller diameter than the second end.

8. The component of claim 1 , wherein the ceramic coating is under a compressive stress at room temperature.

9. The component of claim 1 , wherein the ceramic coating is a plasma sprayed ceramic coating having a porosity of less than approximately 5%.

10. The component of claim 2 , wherein the gas distribution plate comprises a first plurality of conduits having a first length and a first orientation angle and a second plurality of conduits having a second length and a second orientation angle that are different from the first length and the first orientation angle.

11. The component of claim 10 , wherein the first plurality of conduits are substantially perpendicular to the roughened surface of the metal portion and are to have a first flow rate, wherein the second plurality of conduits are oriented at an angle that is not perpendicular to the roughened surface, and wherein the second plurality of gas conduits have a length, an angle and a diameter that facilitates a second flow rate that is substantially equivalent to the first flow rate.

12. The component of claim 3 , wherein the first end has a diameter of about 40-80 mil and the second end has a diameter of about 10-40 mil.

13. A component of a plasma etch reactor comprising:
a metal portion of the component having a roughened surface with a roughness of approximately 100 micro-inches (μin) to approximately 300 μin; and
a ceramic coating on the roughened surface of the metal portion of the component, wherein the ceramic coating is a composite comprising Y 4 Al 2 O 9 (YAM) and a solid solution of Y 2 -xZr x O 3 , the ceramic coating having a thickness of approximately 10-40 mil, wherein the ceramic coating has a thermal shock resistance sufficient for use at a temperature of up to approximately 150 degrees Celsius.

14. The component of claim 13 , wherein the component is a gas distribution plate that comprises at least one of aluminum, copper or magnesium.

15. The component of claim 13 , further comprising:
a plurality of approximately linear gas channels in the metal portion of the component, each of the plurality of approximately linear gas channels having a first end that receives a gas and a second end that delivers the gas, wherein the first end has a larger diameter than the second end.

16. The component of claim 13 , wherein the ceramic coating is under a compressive stress at room temperature, and wherein the ceramic coating is a plasma sprayed ceramic coating having a porosity of less than approximately 5%.

17. A component of a plasma etch reactor comprising:
a metal portion of the component having a roughened surface with a roughness of approximately 100 micro-inches (μin) to approximately 300 μin; and
a ceramic coating on the roughened surface of the metal portion of the component, wherein the ceramic coating is selected from a list consisting of Y 3 A 1 5 O 12 (YAG) and Y 2 O 3 stabilized ZrO 2 , the ceramic coating having a thickness of approximately 10-40 mil, wherein the ceramic coating has a thermal shock resistance sufficient for use at a temperature of up to approximately 150 degrees Celsius.

18. The component of claim 17 , wherein the component is a gas distribution plate that comprises at least one of aluminum, copper or magnesium.

19. The component of claim 17 , further comprising:
a plurality of approximately linear gas channels in the metal portion of the component, each of the plurality of approximately linear gas channels having a first end that receives a gas and a second end that delivers the gas, wherein the first end has a larger diameter than the second end.

20. The component of claim 17 , wherein the ceramic coating is under a compressive stress at room temperature, and wherein the ceramic coating is a plasma sprayed ceramic coating having a porosity of less than approximately 5%.

Assignees

• Applied Materials Inc

Inventors

• Sun Jennifer Y
• Kanungo Biraja P
• Duan Ren-Guan
• Noorbakhsh Hamid
• Yuh Junhan
• Lubomirsky Dmitry

Classifications

• H05K1/053

  the metal substrate being covered by an inorganic insulating layer · CPC title

• H01J37/32495

  Means for protecting the vessel against plasma · CPC title

• C04B35/44

  based on aluminates · CPC title

• B23K10/00

  Welding or cutting by means of a plasma · CPC title

• C04B28/06

  Aluminous cements (monolithic refractories or refractory mortars C04B35/66) · CPC title