Electron beam microscope with improved imaging gas and method of use

US9633816B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9633816-B2
Application numberUS-201514715432-A
CountryUS
Kind codeB2
Filing dateMay 18, 2015
Priority dateMay 18, 2015
Publication dateApr 25, 2017
Grant dateApr 25, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle beam source for directing a charged particle beam to work piece, a focusing lens for focusing the charged particles onto the work piece, and an electrode for accelerating secondary electrons generated from the work piece irradiation by the charged practice beam, or another gas cascade detection scheme. The gas imaging is performed in a high pressure scanning electron microscope (HPSEM) chamber for enclosing the improved imaging gas including CH 3 CH 2 OH (ethanol) vapor. The electrode accelerates the secondary electrons though the CH 3 CH 2 OH to ionize the CH 3 CH 2 OH through ionization cascade to amplify the number of secondary electrons for detection. An optimal configuration is provided for use of the improved imaging gas, and techniques are provided to conduct imaging studies of organic liquids and solvents, and other CH 3 CH 2 OH-based processes.

First claim

Opening claim text (preview).

We claim as follows: 1. A method of forming a charged particle beam image of a work piece, comprising: scanning a charged particle beam over a work piece surface, the charged particle beam causing the emission of secondary electrons to produce secondary electron signals at points along the scan; amplifying the secondary electron signals by accelerating the secondary electrons through a region including CH 3 CH 2 OH, the secondary electrons initiating an ionization cascade of the CH 3 CH 2 OH; detecting the amplified imaging signals; and forming an image of the work piece from the amplified imaging signals. 2. The method of claim 1 in which accelerating the secondary electrons through a region including CH 3 CH 2 OH includes accelerating the secondary electrons through a region including CH 3 CH 2 OH having a pressure of at least 0.01 torr (0.013 mbar). 3. The method of claim 1 in which accelerating the secondary electrons through a region including CH 3 CH 2 OH includes accelerating the secondary electrons through a region including CH 3 CH 2 OH having a pressure of between 1.0 torr (1.5 mbar) and 50 torr (67 mbar). 4. The method of claim 1 in which accelerating the secondary electrons through a region including CH 3 CH 2 OH includes accelerating the secondary electrons through an electrical potential sufficiently great to amplify the secondary electron signal by at least 500 times and insufficiently great to cause breakdown of the CH 3 CH 2 OH. 5. The method of claim 1 in which accelerating the secondary electrons through a region including CH 3 CH 2 OH includes accelerating the secondary electrons through an electrical potential of between 50 V and 1000 V. 6. The method of claim 1 in which accelerating the secondary electrons through a region including CH 3 CH 2 OH includes accelerating the secondary electrons through a distance of between about 1 mm and about 200 mm. 7. A method for generating, amplifying and detecting secondary electrons from a surface of a workpiece, the method comprising: (a) providing an imaging gas comprising CH 3 CH 2 OH in a chamber; (b) in the presence of the imaging gas, scanning the surface of the workpiece under a suitable gaseous pressure with a charged particle beam having sufficient energy so as to cause secondary electrons to be emitted from the surface of the workpiece; (c) accelerating the secondary electrons with an electric field of sufficient strength so as to cause them to collide with CH 3 CH 2 OH gas molecules and produce negative charge carriers which can subsequently produce additional negative charge carriers through multiple collisions with other CH 3 CH 2 OH gas molecules resulting in a number of negative charge carriers greater than and proportional to the number of original secondary electrons, the strength of the electric field being sufficiently low so as to avoid catastrophic electrical discharging or arcing in the CH 3 CH 2 OH; and (d) detecting electrical current resulting from electrons and ionized gas molecules, thereby detecting a signal proportional to the number of secondary electrons emitted from the surface of the workpiece. 8. The method of claim 7 , in which the workpiece includes organic liquids or solvents and further comprising generating an image based on the detected electrical currents. 9. The method of claim 8 , in which the image shows wetting behavior of the organic liquids or solvents along the workpiece. 10. The method of claim 7 , further comprising conducting a CH 3 CH 2 OH-based chemical vapor deposition step on the workpiece in the chamber before scanning the surface of the workpiece. 11. The method of claim 7 , further comprising conducting a CH 3 CH 2 OH-based chemical vapor deposition step on the workpiece in the chamber whilst scanning the surface of the workpiece. 12. The method of claim 7 , further comprising conducting a CH 3 CH 2 OH-based catalysis step on the workpiece in the chamber before scanning the surface of the workpiece. 13. The method of claim 7 , further comprising conducting a CH 3 CH 2 OH-based catalysis step on the workpiece in the chamber whilst scanning the surface of the workpiece. 14. The method of claim 7 , wherein the charged particle beam is an electron beam having an energy within the range from about 1 kiloelectron volt to about 50 kiloelectron volts. 15. The method of claim 7 , wherein the gaseous pressure is within the range from about 0.01 torr to about 10 torr. 16. The method of claim 7 , wherein the electric field comprises an electrical potential difference of at least 50 volts and less than about 1000 volts. 17. The method of claim 7 , wherein providing CH 3 CH 2 OH an imaging gas comprising further includes providing a mixture of CH 3 CH 2 OH and NH 3 .

Assignees

Inventors

Classifications

  • H01J37/244Primary

    Detectors; Associated components or circuits therefor · CPC title

  • Optical {, image processing} or photographic arrangements associated with the tube · CPC title

  • with environmental specimen chamber · CPC title

  • H01J37/18Primary

    Vacuum locks {; Means for obtaining or maintaining the desired pressure within the vessel} · CPC title

  • operating at elevated pressures, e.g. atmosphere · CPC title

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What does patent US9633816B2 cover?
Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle beam source for directing a charged particle beam to work piece, a focusing lens for focusing the charged particles onto the work piece, and an electrode for accelerating secondary electrons generated from the work piece irradiation by t…
Who is the assignee on this patent?
Fei Co
What technology area does this patent fall under?
Primary CPC classification H01J37/244. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 25 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).