Toroidal plasma abatement apparatus and method

Patent metadata

Field	Value
Publication number	US-9630142-B2
Application number	US-201414212398-A
Country	US
Kind code	B2
Filing date	Mar 14, 2014
Priority date	Mar 14, 2013
Publication date	Apr 25, 2017
Grant date	Apr 25, 2017

Abstract

An apparatus for abatement of gases is provided. The apparatus includes a toroidal plasma chamber having a plurality of inlets and an outlet, and at least one chamber wall. One or more magnetic cores are disposed relative to the toroidal plasma chamber. The plasma chamber confines a toroidal plasma. A second gas inlet is positioned on the toroidal plasma chamber between a first gas inlet and the gas outlet at a distance d from the gas outlet, such that a toroidal plasma channel volume between the first gas inlet and the second gas inlet in the is substantially filled by the inert gas, the distance d based on a desired residence time of the gas to be abated.

First claim

What is claimed is:

1. An apparatus for abatement of gases, the apparatus comprising:
a toroidal plasma chamber having a first gas inlet receiving an inert gas for ignition into a plasma, a second gas inlet receiving a gas to be abated, a gas outlet, and at least one chamber wall for containing the gases;
one or more magnetic cores disposed relative to the toroidal plasma chamber such that the toroidal plasma chamber passes through each of the one or more magnetic cores; and
a primary winding coupled to the one or more magnetic cores; and
an RF power supply coupled to the primary winding for delivering power to a toroidal plasma,
the toroidal plasma chamber confining the toroidal plasma along a plane extending through the toroidal plasma chamber,
wherein the second gas inlet is positioned between the first gas inlet and the gas outlet at a distance d from the gas outlet along the plane such that a first toroidal plasma channel volume between the first gas inlet and the second gas inlet in the toroidal plasma chamber is substantially filled by the inert gas and a second toroidal plasma channel volume between the second gas inlet and the gas outlet is substantially filled with the gas to be abated, the distance d based on a desired residence time of the gas to be abated, wherein the RF power supply is configured to deliver a constant plasma current through the first plasma channel volume and the second plasma channel volume, wherein the second gas inlet is oriented at an acute angle to the plane, and wherein the distance d is approximately 2 to 5 inches.

2. The apparatus of claim 1 , wherein the second gas inlet is a series of selectable gas inlet ports positioned along the toroidal plasma chamber.

3. The apparatus of claim 1 , wherein the gas to be abated is mixed with one or more reactant gases prior to entering the toroidal plasma chamber.

4. The apparatus of claim 3 , wherein the one or more reactant gases mixed with the gas to be abated is a water vapor.

5. The apparatus of claim 1 , further comprising a sensor positioned relative to the gas outlet and configured to monitor an emission from the toroidal plasma chamber.

6. The apparatus of claim 5 , wherein the sensor comprises an optical and/or an infrared sensor.

7. The apparatus of claim 1 , wherein the gas to be abated received by the second gas inlet is a chlorine compound.

8. The apparatus of claim 1 , wherein the gas to be abated received by the second gas inlet is a perfluorocarbon compound.

9. The apparatus of claim 8 , wherein the perfluorocarbon compound received by the second gas inlet includes carbon tetrafluoride.

Assignees

• Mks Instr Inc

Inventors

• Chen Xing
• Pokidov Ilya
• Tian Feng
• Tran Ken
• Lam David
• Wenzel Kevin W

Classifications

• H01J37/32669

  Particular magnets or magnet arrangements for controlling the discharge · CPC title

• H01J37/32458

  Vessel · CPC title

• H01J37/32844

  Treating effluent gases · CPC title

• H05H1/46

  using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence) · CPC title

• B01D2257/2064

  Chlorine · CPC title