Electronic substrates having embedded inductors
US-2024331921-A1 · Oct 3, 2024 · US
US9624600B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9624600-B2 |
| Application number | US-201214362619-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 6, 2012 |
| Priority date | Dec 6, 2011 |
| Publication date | Apr 18, 2017 |
| Grant date | Apr 18, 2017 |
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Direct growth of graphene on Co 3 O 4 (111) at 1000 K was achieved by molecular beam epitaxy from a graphite source. Auger spectroscopy shows a characteristic sp 2 carbon lineshape, at average carbon coverages from 0.4-3 monolayers. Low energy electron diffraction (LEED) indicates (111) ordering of the sp 2 carbon film with a lattice constant of 2.5 (±0.1) Å characteristic of graphene. Six-fold symmetry of the graphene diffraction spots is observed at 0.4, 1 and 3 monolayers. The LEED data also indicate an average domain size of ˜1800 Å, and show an incommensurate interface with the Co 3 O 4 (111) substrate, where the latter exhibits a lattice constant of 2.8 (±0.1) Å. Core level photoemission shows a characteristically asymmetric C(1s) feature, with the expected lr to lr* satellite feature, but with a binding energy for the three monolayer film of 284.9 (±0.1) eV, indicative of substantial graphene-to-oxide charge transfer.
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What is claimed is: 1. A method of forming a composition of matter comprising macroscopically continuous layers of graphene on a metal oxide surface, wherein said method comprises steps of: forming a layer of a metal consisting of cobalt and having a first major surface; annealing said first major surface in oxygen to form an oxide of said metal on said first major surface; and forming more than one layer of macroscopically continuous graphene on said metal oxide layer by carbon molecular beam epitaxy (MBE) thereby creating an oxide/graphene interface between said metal oxide layer and a first layer of graphene, wherein said oxide/graphene interface is incommensurate, without reconstruction of the metal oxide surface, thus yielding C 6V symmetry in said first layer of graphene, wherein said step of annealing and said step of forming more than one layer of macroscopically continuous graphene are both conducted at temperatures of not more than one thousand degrees Kelvin. 2. A composition of matter comprising a macroscopically continuous multilayer film of graphene on a magnetically polarizable metal oxide creating a graphene/oxide interface between a surface of said metal oxide and a first layer of graphene, wherein said metal oxide consists of cobalt oxide and is in turn on a room temperature ferromagnet, wherein the graphene/oxide interface is incommensurate, without reconstruction of said metal oxide surface, thus yielding C 6V symmetry in said first layer of graphene. 3. The composition of matter of claim 2 , wherein said composition of matter comprises a graphene field effect transistor, a coherent spin field effect transistor, a magnetic tunnel junction or switch.
Carbon, e.g. diamond-like carbon · CPC title
being insulating materials · CPC title
Arsenides · CPC title
Silicon, silicon germanium or germanium · CPC title
characterised by treatments done before the formation of the materials · CPC title
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