Substrate processing apparatus and substrate conveying apparatus for use in the same

US9624046B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9624046-B2
Application numberUS-201414482656-A
CountryUS
Kind codeB2
Filing dateSep 10, 2014
Priority dateSep 12, 2008
Publication dateApr 18, 2017
Grant dateApr 18, 2017

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A substrate processing apparatus includes a substrate processing section that processes a plurality of substrates assuming a vertical posture in a batch manner; a first traversing mechanism that laterally moves a first traverse holding portion along a first traversing path between a substrate transfer position and a substrate delivery position; a second traversing mechanism that laterally moves a second traverse holding portion along a second traversing path disposed below the first traversing path between the substrate transfer position and the substrate delivery position; an elevation mechanism that raises and lowers an elevation holding portion in the substrate transfer position; and a main transfer mechanism that conveys a plurality of substrates assuming a vertical posture in a batch manner between the substrate delivery position and the substrate processing section, the first and second traverse holding portions, and the elevation holding portion each holds a plurality of substrates assuming a vertical posture in a batch manner.

First claim

Opening claim text (preview).

What is claimed is: 1. A substrate conveying apparatus, comprising: a substrate processing section which defines a horizontal direction; a batch hand that holds a plurality of substrates assuming a horizontal posture piled together in a batch manner; a batch-hand advancing-retreating mechanism that horizontally advances and retreats the batch hand; a one-by-one hand that holds a single substrate assuming a horizontal posture; a one-by-one-hand advancing-retreating mechanism that horizontally advances and retreats the one-by-one hand, independently of movement of the batch hand; a holding base that holds the batch-hand advancing-retreating mechanism and the one-by-one-hand advancing-retreating mechanism; wherein the batch-hand advancing-retreating mechanism includes a pair of batch-hand linear guides supported on the holding base and extending in parallel with each other, and a batch-hand advancing-retreating bracket coupled to the pair of batch-hand linear guides and configured to advance and retreat while holding the batch hand; and wherein the one-by-one-hand advancing-retreating mechanism includes a single one-by-one-hand linear guide supported on the holding base between the pair of batch-hand linear guides and extending in parallel with the pair of batch-hand linear guides, and a one-by-one-hand advancing-retreating bracket coupled to the single one-by-one-hand linear guide and configured to advance and retreat while holding the one-by-one-hand; an elevation mechanism that moves the holding base upwardly and downwardly; and a rotation mechanism that rotates the holding base around a rotation axis line extending in a vertical direction while at least one of said batch hand and said one-by-one hand is holding a corresponding plurality of substrates or a single substrate, said substrates or substrate assuming a horizontal posture. 2. The substrate conveying apparatus according to claim 1 , wherein, when the batch hand and the one-by-one hand are in retreat positions, respectively, the batch hand and the one-by-one hand are disposed one above the other in the vertical direction. 3. The substrate conveying apparatus according to claim 1 , wherein the one-by-one hand includes two hand elements disposed apart in the horizontal direction, each of the two hand elements having a first substrate supporting portion and a second substrate supporting portion that differ in height from each other, the substrate conveying apparatus further comprising a hand opening-closing mechanism that opens and closes the two hand elements by driving the two hand elements in the horizontal direction, wherein the one-by-one hand holds a substrate at a first height by means of the first substrate supporting portion of the two hand elements in a state in which the two hand elements are opened, and holds a substrate at a second height by means of the second substrate supporting portion of the two hand elements in a state in which the two hand elements are closed. 4. The substrate conveying apparatus according to claim 1 , wherein when the batch-hand and the one-by-one hand are in respective retreated positions, the one-by-one hand bracket is surrounded by the batch-hand bracket, and the batch hand and the one-by-one hand are positioned as stacked in the vertical direction. 5. The substrate conveying apparatus according to claim 1 , wherein the batch-hand advancing-retreating mechanism further includes a batch-hand advancing-retreating bracket driving mechanism configured to apply a driving force to the batch-hand advancing-retreating bracket; the one-by-one-hand advancing-retreating mechanism further includes a one-by-one-hand advancing-retreating bracket driving mechanism configured to apply a driving force to the one-by-one-hand advancing-retreating bracket, and the batch-hand advancing-retreating mechanism and the one-by-one-hand advancing-retreating mechanism are disposed between one of the pair of batch-hand linear guides and the one-by-one-hand linear guide when viewed in plan. 6. The substrate conveying apparatus according to claim 5 , wherein the batch-hand advancing-retreating bracket driving mechanism includes a first motor, and the one-by-one-hand advancing-retreating bracket driving mechanism includes a second motor separate from the first motor, whereby the batch-hand advancing-retreating mechanism and the one-by-one-hand advancing-retreating mechanism respectively advance and retreat the batch hand and the one-by-one hand independently of each other. 7. The substrate conveying apparatus according to claim 1 , wherein the batch-hand advancing-retreating mechanism is configured to advance and retreat the batch hand along a hand advancing-retreating direction so as to move the batch hand away from the rotation axis line and to move the batch hand toward the rotation axis line. 8. The substrate conveying apparatus according to claim 1 , wherein the one-by-one hand advancing-retreating mechanism is configured to advance and retreat the one-by-one hand along a hand advancing-retreating direction so as to move the one-by-one hand away from the rotation axis line and to move the one-by-one hand toward the rotation axis line. 9. The substrate conveying apparatus according to claim 1 , wherein the batch-hand advancing-retreating mechanism is configured to advance and retreat the batch hand along a hand advancing-retreating direction so as to move the batch hand away from the rotation axis line and to move the batch hand toward the rotation axis line, and the one-by-one hand advancing-retreating mechanism is configured to advance and retreat the one-by-one hand along the hand advancing-retreating direction so as to move the one-by-one hand away from the rotation axis line and to move the one-by-one hand toward the rotation axis line. 10. A substrate processing apparatus, comprising: a substrate processing section which defines a horizontal direction; a pod holding portion that holds a pod containing a plurality of substrates piled together; a substrate holding portion that holds a plurality of substrates; and a substrate conveying apparatus that conveys substrates between the pod held by the pod holding portion and the substrate holding portion; the substrate conveying apparatus including: a batch hand that holds a plurality of substrates assuming a horizontal posture piled together in a batch manner; a batch-hand advancing-retreating mechanism that horizontally advances and retreats the batch hand; a one-by-one hand that holds a single substrate assuming a horizontal posture; a one-by-one-hand advancing-retreating mechanism that horizontally advances and retreats the one-by-one hand, independently of movement of the batch hand; a holding base that holds the batch-hand advancing-retreating mechanism and the one-by-one-hand advancing-retreating mechanism; wherein the batch-hand advancing-retreating mechanism includes a pair of batch-hand linear guides supported on the holding base and extending in parallel with each other, and a batch-hand advancing-retreating bracket coupled to the pair of batch-hand linear guides and configured to advance and retreat while holding the batch hand; and wherein the one-by-one-hand advancing-retreating mechanism includes a single one-by-one-hand linear guide supported on the holding base between the pair of batch-hand linear guides and extending in parallel with the pair of batch-hand linear guides, and a one-by-one-hand advancing-retreating bracket coupled to the single one-by-one-hand linear guide and configured to advance and retreat while holding the one-by-one-hand; an elevation mechanism that moves the holding base upwardly and downwardly; and a rotation mechanism that rotat

Assignees

Inventors

Classifications

  • the wafers being placed on a robot blade or gripped by a gripper for conveyance · CPC title

  • Batch transfer of wafers · CPC title

  • Mechanical parts of transfer devices · CPC title

  • Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements · CPC title

  • Sheet handling, means, e.g. manipulators, devices for turning or tilting sheet glass (suction cups B65G49/061; combined with vertical conveyors C03B33/00 - C03B33/10; stacking and destacking B65G49/068) · CPC title

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What does patent US9624046B2 cover?
A substrate processing apparatus includes a substrate processing section that processes a plurality of substrates assuming a vertical posture in a batch manner; a first traversing mechanism that laterally moves a first traverse holding portion along a first traversing path between a substrate transfer position and a substrate delivery position; a second traversing mechanism that laterally moves…
Who is the assignee on this patent?
Dainippon Screen Mfg, Screen Holdings Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/3402. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 18 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).