Lithographic apparatus and a device manufacturing method involving thermal conditioning of a table

Patent metadata

Field	Value
Publication number	US-9618858-B2
Application number	US-201113010002-A
Country	US
Kind code	B2
Filing date	Jan 20, 2011
Priority date	Jan 22, 2010
Publication date	Apr 11, 2017
Grant date	Apr 11, 2017

Abstract

An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.

First claim

The invention claimed is:

1. An immersion lithographic apparatus, comprising:
a substrate table including a recess having a central support section configured to support a substrate, the central support section having a support surface to support a bottom surface of the substrate, having a lateral surface at a non-zero angle to the support surface, and having a bottom surface at a non-zero angle to the lateral surface and facing away from the support surface, the lateral surface extending to the bottom surface of the central support section;
a drain in the substrate table, the drain configured to receive an immersion fluid which leaks, in use, into a gap between an edge of the substrate on the substrate table and an edge of the recess, the drain having an orifice above the bottom surface of the central support section;
a peripheral section of the substrate table that surrounds the central support section, the drain located in the peripheral section and wherein at least a majority of the height of the lateral surface of the central support section is spaced by an open gap from at least a majority of the height of a lateral surface of the peripheral section, the lateral surface of the peripheral section faces the lateral surface of the central support section, and the open gap extends around the central support section and is outward, in a horizontal direction, of an outer periphery of the bottom surface of the substrate, wherein an uppermost surface of the peripheral section adjacent the substrate is generally coplanar with an upper surface of the substrate, and an edge of the peripheral section defines the edge of the recess; and
a thermal conditioning system configured to thermally condition at least the central support section.

2. The immersion lithographic apparatus of claim 1 , wherein the peripheral section of the substrate table comprises a heater arranged to heat directly the peripheral section of the substrate table.

3. The immersion lithographic apparatus of claim 1 , wherein the open gap extends along the entire height of the lateral surfaces of the central support section and, the peripheral section such that the central support section and the peripheral section are separated.

4. The immersion lithographic apparatus of claim 1 , further comprising a solid member spanning the open gap to directly connect the central support section and the peripheral section.

5. The immersion lithographic apparatus of claim 4 , wherein the open gap extends below the member.

6. The immersion lithographic apparatus of claim 4 , wherein the member is configured to reduce transfer of vibrations between the peripheral section and the central support section.

7. The immersion lithographic apparatus of claim 4 , comprising a further member spanning the open gap to directly connect the central support section and the peripheral section, the open gap extending above the further member.

8. The immersion lithographic apparatus of claim 4 , wherein the member is a separate body from the central support section and the peripheral section.

9. The immersion lithographic apparatus of claim 4 , wherein the member comprises a different material than the material of the central support section.

10. The immersion lithographic apparatus of claim 1 , wherein the orifice of the drain is in the lateral surface of the peripheral section.

11. The immersion lithographic apparatus of claim 10 , wherein the orifice is located at or above a top surface of the central support section.

12. The immersion lithographic apparatus of claim 1 , wherein the thermal conditioning system comprises an aperture configured to direct a jet of fluid onto a surface of the central support section below the substrate at an angle at least non-parallel to the surface and comprising an aperture plate, in which the aperture is provided, the aperture plate provided adjacent the surface such that the jet of fluid provided by the aperture is directed onto the surface.

13. A device manufacturing method comprising:
providing a substrate to a recess in a substrate table, the recess having a central support section configured to support the substrate, the central support section having a support surface that supports a bottom surface of the substrate, having a lateral surface at a non-zero angle to the support surface, and having a bottom surface at a non-zero angle to the lateral surface and facing away from the support surface, the lateral surface extending to the bottom surface of the central support section;
providing a peripheral section of the substrate table that surrounds the central support section, wherein at least a majority of the height of the lateral surface of the central support section is spaced by an open gap from at least a majority of the height of a lateral surface of the peripheral section, the lateral surface of the peripheral section faces the lateral surface of the central support section, and the open gap extends around the central support section and is outward, in a horizontal direction, of an outer periphery of the bottom surface of the substrate;
providing immersion fluid to an upper surface of the substrate and/or the substrate table, wherein an uppermost surface of the peripheral section adjacent the substrate is generally coplanar with the upper surface of the substrate;
draining the immersion fluid that leaks into a gap between an edge of the substrate and an edge of the recess through a drain located in the peripheral section, wherein an edge of the peripheral section defines the edge of the recess and the drain has an orifice above the bottom surface of the central support section; and
thermally conditioning at least the central support section.

14. A lithographic apparatus, comprising:
a substrate table including a recess having a central support section configured to support a substrate, the central support section having a support surface to support a bottom surface of the substrate and having a lateral surface at a non-zero angle to the support surface;
a peripheral section surrounding the central support section, wherein at least part of the lateral surface of the central support section is spaced by an open gap from at least part of a lateral surface of the peripheral section, the open gap is outward, in a horizontal direction, of an outer periphery of the bottom surface of the substrate, and the open gap extends around the central support section, wherein an uppermost surface of the peripheral section adjacent the substrate is generally coplanar with an upper surface of the substrate;
a solid member spanning the open gap to directly connect the central support section and the peripheral section, the open gap extending below the member;
a drain in the peripheral section, the drain configured to receive an immersion fluid which leaks, in use, into a gap between an edge of the substrate on the substrate table and an edge of the recess and the drain having an orifice above the member, wherein an edge of the peripheral section defines the edge of the recess; and
a thermal conditioning system configured to thermally condition at least the central support section.

15. The immersion lithographic apparatus of claim 14 , wherein the member is configured to reduce transfer of vibrations between the peripheral section and the central support section.

16. The immersion lithographic apparatus of claim 14 , comprising a further member spanning the open gap to directly connect the central support section and the peripheral section, the open gap extending above the further member.

17. The immersion lithographic appara

Assignees

• Patel Hrishikesh
• Jacobs Johannes Henricus Wilhelmus
• Kusters Gerardus Adrianus Antonius Maria
• Laurent Thibault Simon Mathieu
• Miranda Marcio Alexandre Cano
• Bloks Ruud Hendrikus Martinus Johannes
• Feng Peng
• Kunnen Johan Gertrudis Cornelis
• Asml Netherlands Bv

Inventors

• Patel Hrishikesh
• Jacobs Johannes Henricus Wilhelmus
• Kusters Gerardus Adrianus Antonius Maria
• Laurent Thibault Simon Mathieu
• Miranda Marcio Alexandre Cano
• Bloks Ruud Hendrikus Martinus Johannes
• Feng Peng
• Kunnen Johan Gertrudis Cornelis

Classifications

• H10P76/2041

  Photolithographic processes · CPC title

• H10P72/0431

  Apparatus for thermal treatment · CPC title

• Y10T29/49

  Method of mechanical manufacture · CPC title

• G03F7/70875 Primary

  Temperature, e.g. temperature control of masks or workpieces via control of stage temperature · CPC title

• G03F7/70825

  Mounting of individual elements, e.g. mounts, holders or supports (workpiece or mask holders G03F7/707) · CPC title