Titania-doped quartz glass and making method
US-9346700-B2 · May 24, 2016 · US
Titania-doped quartz glass and making method
US9612525B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9612525-B2 |
| Application number | US-201615137954-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 25, 2016 |
| Priority date | Aug 18, 2011 |
| Publication date | Apr 4, 2017 |
| Grant date | Apr 4, 2017 |
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Abstract
Official abstract text for this publication.
Titania-doped quartz glass is manufactured by mixing a silicon-providing reactant gas and a titanium-providing reactant gas, preheating the reactant gas mixture at 200-400° C., and subjecting the mixture to oxidation or flame hydrolysis. A substrate of the glass is free of concave defects having a volume of at least 30,000 nm 3 in an effective region of the EUV light-reflecting surface and is suited for use in the EUV lithography.
First claim
Opening claim text (preview).
The invention claimed is: 1. A titania-doped quartz glass having a surface where EUV light is reflected, the glass being free of concave defects having a volume of at least 30,000 nm 3 and an aspect ratio of up to 10 in an effective region of the EUV light-reflecting surface. 2. The titania-doped quartz glass of claim 1 which is free of inclusions. 3. An EUV lithographic member comprising the titania-doped quartz glass of claim 1 . 4. The EUV lithographic member of claim 3 which is an EUV lithographic photomask substrate.
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Classifications
Specific substances in specified ports, e.g. all gas flows specified · CPC title
doped with titanium · CPC title
Manufacture or treatment of nanostructures · CPC title
- G03F1/24Primary
Reflection masks; Preparation thereof · CPC title
Constructional details of the feed line, e.g. heating, insulation, material, manifolds, filters · CPC title
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- What does patent US9612525B2 cover?
- Titania-doped quartz glass is manufactured by mixing a silicon-providing reactant gas and a titanium-providing reactant gas, preheating the reactant gas mixture at 200-400° C., and subjecting the mixture to oxidation or flame hydrolysis. A substrate of the glass is free of concave defects having a volume of at least 30,000 nm 3 in an effective region of the EUV light-reflecting surface and is …
- Who is the assignee on this patent?
- Shinetsu Chemical Co
- What technology area does this patent fall under?
- Primary CPC classification G03F1/24. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Apr 04 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).