Titania-doped quartz glass and making method

Patent metadata

Field	Value
Publication number	US-9346700-B2
Application number	US-201213569429-A
Country	US
Kind code	B2
Filing date	Aug 8, 2012
Priority date	Aug 18, 2011
Publication date	May 24, 2016
Grant date	May 24, 2016

Abstract

Titania-doped quartz glass is manufactured by mixing a silicon-providing reactant gas and a titanium-providing reactant gas, preheating the reactant gas mixture at 200-400° C., and subjecting the mixture to oxidation or flame hydrolysis. A substrate of the glass is free of concave defects having a volume of at least 30,000 nm 3 in an effective region of the EUV light-reflecting surface and is suited for use in the EUV lithography.

First claim

The invention claimed is:

1. A method for manufacturing a titania-doped quartz glass, comprising the steps of:
mixing a silicon-providing reactant gas and a titanium-providing reactant gas,
heating the reactant gas mixture at 200 to 400° C.,
subjecting the mixture to oxidation or flame hydrolysis with the aid of a combustible gas and a combustion-supporting gas,
depositing a titania doped quartz glass, and
forming an EUV lithography member having a surface for reflecting EUV light, the surface being free of concave defects having a volume of at least 30,000 nm 3 and an aspect ratio of up to 10 in an effective region.

2. The method of claim 1 , wherein the step of subjecting the mixture to oxidation or flame hydrolysis is performed by a burner for injecting the reactant gas mixture, the combustible gas, and the combustion-supporting gas, the burner including a central tube for injecting the reactant gas mixture, a glass or glass-lined conduit being connected at its downstream end to the central tube for feeding the reactant gas mixture through the glass or glass-lined conduit to the central tube, and
the step of heating the reactant gas mixture is performed in the glass or glass-lined conduit.

3. The method of claim 2 , wherein a metal conduit is connected to the glass or glass-lined conduit at its upstream end, and
an upstream end portion of the glass or glass-lined conduit connected to the metal conduit is held at 100 to 130° C.

4. The method of claim 1 , wherein the burner comprises a central multi-fold tube section and a multi-nozzle section, the central multi-fold tube section including the central tube and a second tube enclosing the central tube, and
the reactant gas mixture is injected through the central tube, and the combustion-supporting gas is injected through the second tube while being heated at 200 to 400° C.

5. The method of claim 1 , wherein the silicon-providing reactant gas is selected from the group consisting of silicon tetrachloride, dimethyldichlorosilane, methyltrichlorosilane, tetramethoxysilane, tetraethoxysilane, and methyltrimethoxysilane, and the titanium-providing reactant gas is selected from the group consisting of titanium tetrachloride, titanium tetrabromide, tetraethoxytitanium, tetraisopropoxytitanium, tetra-n-propoxytitanium, tetra-n-butoxytitanium, tetra-sec-butoxytitanium, and tetra-t-butoxytitanium.

6. A method for manufacturing a titania-doped quartz glass, comprising the steps of:
mixing a silicon-providing reactant gas and a titanium-providing reactant gas,
heating the reactant gas mixture at 300 to 400° C.,
subjecting the mixture to oxidation or flame hydrolysis with the aid of a combustible gas and a combustion-supporting gas,
depositing a titania doped quartz glass, and
forming an EUV lithography member having a surface for reflecting EUV light, the surface being free of concave defects having a volume of at least 15,000 nm 3 and an aspect ratio of up to 10 in an effective region,
wherein the step of subjecting the mixture to oxidation or flame hydrolysis is performed by a burner for injecting the reactant gas mixture, the combustible gas, and the combustion-supporting gas, the burner including a central tube for injecting the reactant gas mixture, a glass or glass-lined conduit being connected at its downstream end to the central tube for feeding the reactant gas mixture through the glass or glass-lined conduit to the central tube, the step of heating the reactant gas mixture being performed in the glass or glass-lined conduit at 300 to 400° C., and a metal conduit is connected to the glass or glass-lined conduit at its upstream, the upstream end portion of the glass or glass-lined conduit connected to the metal conduit being held at 100 to 130° C.

Assignees

• Maida Shigeru
• Otsuka Hisatoshi
• Shinetsu Chemical Co

Inventors

• Maida Shigeru
• Otsuka Hisatoshi

Classifications

• C03B2207/81

  Constructional details of the feed line, e.g. heating, insulation, material, manifolds, filters · CPC title

• C03C3/06

  with more than 90% silica by weight, e.g. quartz {(C03C3/045 takes precedence)} · CPC title

• C03C2201/42

  containing titanium · CPC title

• C03B2207/20

  Specific substances in specified ports, e.g. all gas flows specified · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title