Formaldehyde free electroless copper plating compositions and methods

Patent metadata

Field	Value
Publication number	US-9611550-B2
Application number	US-201313769332-A
Country	US
Kind code	B2
Filing date	Feb 17, 2013
Priority date	Dec 26, 2012
Publication date	Apr 4, 2017
Grant date	Apr 4, 2017

Abstract

The copper electroless baths are formaldehyde free and are environmentally friendly. The electroless copper baths include one or more sulfinate compounds as reducing agents to replace formaldehyde. The electroless baths are stable and deposit a bright copper on substrates.

First claim

What is claimed is:

1. An aqueous based composition consisting of one or more sources of copper ions, one or more chelating agents selected from the group consisting of polycarboxylic acids, salts thereof, polyaminocarboxylic acids and salts thereof, water, optionally one or more stabilizers selected from the group consisting of amines, alkanolamines, thioamides, azole compounds and salts thereof, optionally one or more surfactants, and one or more reducing agents having formula:

wherein X y+ is a neutralizing counter cation of formula (I), where y+ is an integer of one or greater and X y+ is selected from the group consisting of H + , ammonium cation, quaternary ammonium cation, sulfonium cation, phosphonium cation, pyridinium cation, monovalent metal cation, multivalent metal cation and divalent organometallic cation;
R and R′ are independently hydrogen, carboxyl, carboxyalkyl, sulfonate, sulfoxide, unsubstituted, linear or branched alkyl, sulfinate; substituted or unsubstituted aryl;
Z is chosen from unsubstituted, linear or branched (C 1 -C 6 ) alkyl, acetyl or substituted or unsubstituted (C 6 -C 10 ) aryl;

m is an integer of 1 to 6; and n is 1; and the composition is free of formaldehyde.

2. The aqueous based composition of claim 1 , wherein the one or more reducing agents range from 0.1 g/L to 100 g/L.

3. The aqueous based composition of claim 1 , wherein the one or more chelating agents range from 50 g/L to 150 g/L.

4. The aqueous based composition of claim 1 , wherein the one or more stabilizers range from 0.1 ppm to 1000 ppm.

Assignees

• Rohm & Haas Elect Mat

Inventors

• Chow Andy Lok-Fung
• Yee Dennis Kwok-Wai
• Li Crystal P L

Classifications

• H01B1/02

  mainly consisting of metals or alloys · CPC title

• C23C18/40 Primary

  using reducing agents · CPC title

• H05K3/187

  means therefor, e.g. baths, apparatus · CPC title

• C09D1/00

  Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances · CPC title

• C23C18/38

  Coating with copper · CPC title