Gas barrier film and electronic device

Patent metadata

Field	Value
Publication number	US-9610753-B2
Application number	US-201414177143-A
Country	US
Kind code	B2
Filing date	Feb 10, 2014
Priority date	Mar 31, 2009
Publication date	Apr 4, 2017
Grant date	Apr 4, 2017

Abstract

Disclosed is a gas barrier film, which demonstrates superior gas barrier properties and surface flatness, demonstrates a high degree of adhesion between layers and is resistant to cracking when bent, and an electronic device provided therewith. A gas barrier film ( 10 ) of the present invention has a base ( 11 ), and a polyorganosiloxane layer ( 12 ) and an inorganic material layer ( 13 ) sequentially provided on at least one side of the base ( 11 ), and the inorganic material layer ( 13 ) is deposited by dynamic ion mixing method.

First claim

The invention claimed is:

1. A method of producing a gas barrier film, comprising:
forming a layer containing a polyorganosiloxane-based compound on a base,
subsequently, forming an inorganic material layer on the layer containing the polyorganosiloxane-based compound by dynamic ion mixing method,
wherein the dynamic ion mixing method is conducted with a negative pulsed high voltage applied to the base at a range of −20 kV to −1 kV; and
the layer containing the polyorganosiloxane-based compound and the inorganic material layer are sequentially laminated on at least one side of the base.

2. The method of producing a gas barrier film according to claim 1 , wherein an inorganic compound that composes the inorganic material layer is selected from at least one type of inorganic compound consisting of an elemental metal, silicon, graphite, inorganic oxide, inorganic nitride and inorganic oxynitride.

3. The method of producing a gas barrier film according to claim 2 , wherein inorganic compound is selected from at least one type of inorganic compound consisting of silicon nitride, silicon oxide, aluminum oxide, aluminum nitride, aluminum oxynitride, indium oxide and tin-doped indium oxide.

4. The method of producing a gas barrier film according to claim 1 , wherein a plasma-forming gas used in the dynamic ion mixing method contains at least one type of gas selected from the group consisting of helium, argon, neon, krypton and xenon.

5. The method of producing a gas barrier film according to claim 4 , wherein the plasma-forming gas used in the dynamic ion mixing method is a mixed gas further containing at least one type of gas selected from the group consisting of hydrogen, oxygen, nitrogen and fluorocarbons.

6. The method of producing a gas barrier film according to claim 1 , wherein the thickness of the layer containing a polyorganosiloxane-based compound is prepared to be in the range of 0.01 μm to 100 μm.

7. The method of producing a gas barrier film according to claim 1 , wherein the polyorganosiloxane-based compound of the layer is polydimethylsiloxane.

8. The method of producing a gas barrier film according to claim 1 , wherein a layer containing a fluorine-containing resin is provided on the base on the side opposite the side where the layer containing a polyorganosiloxane-based compound is formed.

9. The method of producing a gas barrier film according to claim 1 , wherein the content of the polyorganosiloxane-based compound in the layer is 50% by weight or more of the layer.

10. The method of producing a gas barrier film according to claim 1 , wherein the thickness of the inorganic material layer is prepared to be in the range of 10 nm to 1000 nm.

11. An electronic device comprising a gas barrier film produced by the method according to claim 1 .

12. The electronic device according to claim 11 , wherein the electronic device is a solar cell module.

13. The electronic device according to claim 12 , wherein the gas barrier film is used as a back protective sheet.

14. The electronic device according to claim 11 , wherein the electronic device is an image display element.

15. The method of producing a gas barrier film according to claim 1 , wherein the dynamic ion mixing method is conducted by applying a radio frequency electrical power to the base, plasma-forming gas is plasmatized around the base, argon ions in the plasma collide with a target, and particles are scattered from the target, the scattered particles adhered to the surface of the layer containing the polyorganosiloxane-based compound and are deposited thereon resulting in the formation of a deposited film of particles.

16. The method of producing a gas barrier film according to claim 1 , wherein the pressure of the plasma-forming gas is 1.0×10 1 to 1.0×10 −3 Pa.

17. The method of producing a gas barrier film according to claim 1 , wherein the concentration of ions implanted in the film is 1×10 15 ions/cm 2 or more.

18. The method of producing a gas barrier film according to claim 1 , wherein the concentration of ions implanted in the film is 1×10 16 to 1×10 18 ions/cm 2 .

19. The method of producing a gas barrier film according to claim 1 , wherein the thickness of the inorganic material layer is 50 nm to 200 nm.

Assignees

• Hoshi Sinichi
• Okuji Shigeto
• Lintec Corp

Inventors

• Hoshi Sinichi
• Okuji Shigeto

Classifications

• C08J7/0423

  with at least one layer of inorganic material and at least one layer of a composition containing a polymer binder · CPC title

• B32B27/281

  comprising polyimides · CPC title

• C23C14/0652

  Silicon nitride · CPC title

• B32B2307/538

  Roughness · CPC title

• B32B27/34

  comprising polyamides · CPC title