Method for forming a mask pattern using a laser

Patent metadata

Field	Value
Publication number	US-9604314-B2
Application number	US-201414291833-A
Country	US
Kind code	B2
Filing date	May 30, 2014
Priority date	Jul 9, 2013
Publication date	Mar 28, 2017
Grant date	Mar 28, 2017

Abstract

A method of forming a pattern on a mask sheet using a laser beam includes determining a target scan line with respect to the mask sheet, which corresponds to a position of the pattern on a final mask sheet, determining a correction scan line with respect to the mask sheet, along which the laser beam is scanned to form the pattern of the final mask sheet, applying a counter force to the mask sheet, fixing the mask sheet onto a mask frame while the counter force is applied to the mask sheet, scanning the laser beam along the correction scan line, and releasing the counter force which is applied to the mask sheet.

First claim

What is claimed is:

1. A method of forming a pattern on a mask sheet using a laser beam, the method comprising:
determining a target scan line with respect to the mask sheet, which corresponds to a position of the pattern on a final mask sheet;
determining a correction scan line with respect to the mask sheet, along which the laser beam is scanned to form the pattern of the final mask sheet;
applying a counter force to the mask sheet;
fixing the mask sheet onto a mask frame while the counter force is applied to the mask sheet;
scanning the laser beam along the correction scan line; and
releasing the counter force which is applied to the mask sheet;
the determining the correction scan line of the laser beam includes:
applying a counter force to a preparatory mask sheet;
fixing the preparatory mask sheet to a preparatory mask frame while the counter force is applied to the preparatory mask sheet;
scanning the laser beam along the target scan line;
releasing the counter force which is applied to the preparatory mask sheet;
determining an actual scan line of the laser, in a status when the counter force which is applied to the preparatory mask sheet is released;
determining an error between the target scan line and the actual scan line of the laser beam; and
setting the correction scan line of the laser beam using the error.

2. The method of claim 1 , wherein:
in the setting the correction scan line of the laser beam, the correction scan line
is substantially symmetrical to the actual scan line with reference to the target scan line, wherein a distance between the target scan line and the actual scan line, and between the target line and the correction scan line, is substantially the same.

3. The method of claim 1 , wherein:
in the setting the correction scan line of the laser beam,
an angle between the target scan line and the correction scan line is substantially same as an angle between the target scan line and the actual scan line.

4. The method of claim 1 , wherein:
the actual scan line is determined at a right side or a left side of the target scan line.

5. The method of claim 1 , wherein:
the counter forces respectively applied to the mask sheet and the preparatory mask sheet are applied in opposing side directions of the mask sheet and the preparatory mask sheet, respectively.

Assignees

• Samsung Display Co Ltd

Inventors

• Oh Yoon-Chan
• Lee Choong-Ho

Classifications

• B23K37/0408

  for planar work · CPC title

• B23K26/38 Primary

  by boring or cutting · CPC title

• B23K26/10

  using a fixed support {, i.e. involving moving the laser beam} · CPC title

• G03F7/70733

  Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask · CPC title

• G03F7/70783

  Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight · CPC title