Light Emitting Diode Epitaxial Structure and Light Emitting Diode
US-2024297271-A1 · Sep 5, 2024 · US
US9601658B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9601658-B2 |
| Application number | US-201514810092-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 27, 2015 |
| Priority date | Jul 16, 2010 |
| Publication date | Mar 21, 2017 |
| Grant date | Mar 21, 2017 |
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Solid state lighting devices that can produce white light without a phosphor are disclosed herein. In one embodiment, a solid state lighting device includes a first semiconductor material, a second semiconductor material spaced apart from the first semiconductor material, and an active region between the first and second semiconductor materials. The active region includes a first sub-region having a first center wavelength and a second sub-region having a second center wavelength different from the first center wavelength.
Opening claim text (preview).
We claim: 1. A solid state lighting (SSL) device comprising: a substrate material; a first semiconductor material on the substrate material; a second semiconductor material spaced apart from the first semiconductor material; an active region between the first and second semiconductor materials, the active region having a first sub-region and a second sub-region proximate the first sub-region, wherein the first sub-region is configured to produce a first emission and the second sub-region is configured to produce a second emission different then the first emission, and wherein— the first sub-region includes a first plurality of InGaN materials having a first indium concentration, the second sub-region includes a second plurality of InGaN materials having a second indium concentration, and at least one of the first indium concentration and the second indium concentration increases or decreases along a thickness direction of the respective sub-region, wherein at least one of the first sub-region and the second sub-region comprises an InGaN bulk material. 2. The SSL device of claim 1 wherein the InGaN bulk material includes first areas having a generally planar surface and second areas having a plurality of pits extending into the InGaN bulk material from the generally planar surface. 3. The SSL device of claim 2 wherein: the first areas of the InGaN bulk material include a generally planar surface and the second areas include a plurality of pits extending into the InGaN bulk material from the generally planar surface; and the pits individually include a plurality of sidewalls extending from the generally planar surface into the InGaN bulk material. 4. The SSL device of claim 1 wherein the InGaN bulk material is configured to emit light at multiple center wavelengths. 5. The SSL device of claim 1 wherein: the InGaN bulk material is a first InGaN bulk material having a first bulk material thickness; the other of the first or second sub-regions comprises a second InGaN bulk material having a second bulk material thickness different from the first bulk material thickness. 6. The SSL device of claim 1 wherein the other of the first or second sub-regions comprises a multiple quantum well (MQW). 7. The SSL device of claim 1 wherein the other of the first or second sub-regions comprises a single quantum well (SQW) having an SQW active material. 8. A solid state lighting (SSL) device comprising: a substrate material; a first semiconductor material on the substrate material; a second semiconductor material spaced apart from the first semiconductor material; an active region between the first and second semiconductor materials, the active region having a first sub-region and a second sub-region proximate the first sub-region, wherein the first sub-region is configured to produce a first emission and the second sub-region is configured to produce a second emission different then the first emission, and wherein— the first sub-region includes a first plurality of InGaN materials having a first indium concentration, the second sub-region includes a second plurality of InGaN materials having a second indium concentration, and at least one of the first indium concentration and the second indium concentration increases or decreases along a thickness direction of the respective sub-region, wherein one of the first sub-region and the second sub-region comprises an MQW and the other of the first or second sub-regions comprises a single quantum well (SQW). 9. The SSL device of claim 1 wherein: the first sub-region has a first thickness; and the second sub-region has a second thickness different than the first thickness. 10. The SSL device of claim 1 wherein the device does not include a converter material. 11. The SSL device of claim 1 wherein the first sub-region is positioned on the second sub-region, or vice versa. 12. The SSL device of claim 8 wherein: the first sub-region has a first thickness; and the second sub-region has a second thickness different than the first thickness. 13. The SSL device of claim 8 wherein the device does not include a converter material. 14. The SSL device of claim 8 wherein the first and/or second sub-region includes an GaN/InGaN MQWs. 15. The SSL device of claim 8 wherein the first and second plurality of InGaN materials are separated by a plurality of passive materials. 16. The SSL device of claim 8 wherein the device is configured to emit a white light.
Conductivity type · CPC title
Nitrides · CPC title
Materials · CPC title
using chemical vapour deposition [CVD] · CPC title
Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth · CPC title
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