Wafer rotation in a semiconductor chamber

Patent metadata

Field	Value
Publication number	US-9593419-B2
Application number	US-201514632648-A
Country	US
Kind code	B2
Filing date	Feb 26, 2015
Priority date	Mar 12, 2014
Publication date	Mar 14, 2017
Grant date	Mar 14, 2017

Abstract

A method and apparatus for processing a substrate are provided. The apparatus includes a pedestal and rotation member, both of which are moveably disposed within a processing chamber. The rotation member is adapted to rotate a substrate disposed in the chamber. The substrate may be supported by an edge ring during processing. The edge ring may selectively engage either the pedestal or the rotation member. In one embodiment, the edge ring engages the pedestal during a deposition process and the edge ring engages the rotation member during rotation of the substrate. The rotation of the substrate during processing may be discrete or continuous.

First claim

The invention claimed is:

1. An apparatus for processing a substrate, comprising:
a chamber body and a faceplate defining a processing volume;
a pedestal moveably disposed within the processing volume;
a rotation member moveably disposed within the processing volume radially outward from the pedestal;
an edge ring configured to support a substrate, wherein the edge ring is adapted to selectively interface with the pedestal and the rotation member.

2. The apparatus of claim 1 , further comprising a tunable electrode disposed on the chamber body adjacent the faceplate.

3. The apparatus of claim 2 , wherein the tunable electrode further comprises:
a support ledge.

4. The apparatus of claim 1 , further comprising:
a shadow ring adapted to couple to a top surface of the edge ring.

5. The apparatus of claim 3 , further comprising:
a shadow ring adapted to couple to the support ledge of the tunable electrode.

6. The apparatus of claim 1 , further comprising:
a liner assembly coupled to a bottom surface of the chamber body.

7. The apparatus of claim 1 , further comprising:
a plurality of lift pins coupled through the pedestal.

8. The apparatus of claim 4 , wherein the pedestal, the rotation member, the edge ring, and the shadow ring are formed from materials having a similar coefficient of thermal expansion.

9. The apparatus of claim 8 , wherein the pedestal, the rotation member, the edge ring, and the shadow ring are formed from ceramic materials.

10. The apparatus of claim 1 , wherein the pedestal comprises aluminum or aluminum nitride.

11. The apparatus of claim 1 , wherein the rotation member comprises a plurality of discrete extensions.

Assignees

• Applied Materials Inc

Inventors

• Balasubramanian Ganesh
• Rocha-Alvarez Juan Carlos
• Sankarakrishnan Ramprakash
• Kim Robert
• Du Bois Dale R
• Floyd Kirby Hane
• Bansal Amit Kumar
• Nguyen Tuan Anh

Classifications

• H10P72/7626

  characterised by the construction of the shaft · CPC title

• H10P72/7618 Primary

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P72/7611

  characterised by edge profile or support profile · CPC title

• H10P72/0432

  mainly by conduction · CPC title