Pinhole-free dielectric thin film fabrication

Patent metadata

Field	Value
Publication number	US-9593405-B2
Application number	US-201213523790-A
Country	US
Kind code	B2
Filing date	Jun 14, 2012
Priority date	Jun 17, 2011
Publication date	Mar 14, 2017
Grant date	Mar 14, 2017

Abstract

A method of depositing a dielectric thin film may include: depositing a thin layer of dielectric; stopping deposition of the dielectric layer, and modifying the gas in the chamber if desired; inducing and maintaining a plasma in the vicinity of the substrate to provide ion bombardment of the deposited layer of dielectric; and repeating the depositing, stopping and inducing and maintaining steps until a desired thickness of dielectric is deposited. A variation on this method may include, in place of the repeating step: depositing a thick layer of lower quality dielectric; depositing a thin layer of high quality dielectric; stopping deposition of the dielectric layer, and modifying the gas in the chamber if desired; and inducing and maintaining a plasma in the vicinity of the substrate to provide ion bombardment of the deposited layer of dielectric. The thick layer of dielectric may be deposited more rapidly than the thin layers.

First claim

What is claimed is:

1. A method of depositing a dielectric film, comprising:
sputter depositing a first layer of a dielectric material on a substrate;
after said sputter depositing said first layer of said dielectric material, inducing and maintaining a plasma over said substrate to provide ion bombardment of said first layer of said dielectric material for reducing a density of pinholes in said first layer;
sputter depositing a second layer of said dielectric material on the ion bombarded first layer of said dielectric material;
after said sputter depositing said second layer of said dielectric material, and without inducing and maintaining a plasma over said substrate and not providing ion bombardment of said second layer of said dielectric material, sputter depositing a third layer of said dielectric material on said second layer of said dielectric material; and
after said sputter depositing said third layer of said dielectric material, inducing and maintaining a plasma over said substrate to provide ion bombardment of said third layer of said dielectric material for reducing a density of pinholes in said third layer;
wherein said vacuum depositing said first layer is in a first deposition system, said vacuum depositing said second layer is in a second deposition system and said vacuum depositing said third layer is in a third deposition system; and
wherein said dielectric material is chosen from the group consisting of lithium phosphorous oxynitride and lithium cobalt oxide.

2. The method of claim 1 , wherein said dielectric material is lithium phosphorus oxynitride.

3. The method of claim 1 , wherein said second layer is deposited at a higher rate than said first layer and at a higher rate than said third layer.

4. The method of claim 1 , wherein said dielectric material is lithium cobalt oxide.

5. The method of claim 1 , wherein said first system and said second system are a single system.

6. The method of claim 1 , wherein said first system and said third system are a single system and said single system and said second system are configured in a cluster tool.

7. The method of claim 1 , wherein said first deposition system, said second deposition system and said third deposition system are adjacent systems in an in-line process system.

8. The method of claim 1 , wherein said second layer is thicker than said first layer and thicker than said third layer.

9. The method of claim 8 , wherein said second layer has a thickness in the range of 200 nm to 2 microns and said first layer and said third layer both have thicknesses in the range of 2 nm to 200 nm.

10. The method of claim 1 , wherein said dielectric film is a dielectric film of an electrochemical device.

11. The method of claim 10 , wherein said electrochemical device is a thin film battery.

12. The method of claim 1 , wherein said second layer of dielectric material has a thickness of greater than 200 nanometers.

13. The method of claim 2 , wherein said plasma is a nitrogen plasma.

14. The method of claim 2 , wherein said sputter depositing is sputtering a Li 3 PO 4 target in an argon ambient.

15. The method of claim 2 , wherein said sputter depositing is sputtering a Li 3 PO 4 target in a nitrogen ambient.

16. The method of claim 4 , wherein said plasma is formed with an argon-oxygen-nitrogen gas mixture.

Assignees

• Jiang Chong
• Kwak Byung-Sung Leo
• Applied Materials Inc

Inventors

• Jiang Chong
• Kwak Byung-Sung Leo

Classifications

• C23C14/5826

  Treatment with charged particles (C23C14/582 takes precedence) · CPC title

• C23C14/08

  Oxides (C23C14/10 takes precedence) · CPC title

• C23C14/0676 Primary

  Oxynitrides · CPC title

• C23C14/586

  Nitriding · CPC title

• C23C14/5833

  Ion beam bombardment · CPC title