Gas inlet member of a CVD reactor

Patent metadata

Field	Value
Publication number	US-9587312-B2
Application number	US-201214232246-A
Country	US
Kind code	B2
Filing date	Jul 5, 2012
Priority date	Jul 12, 2011
Publication date	Mar 7, 2017
Grant date	Mar 7, 2017

Abstract

A gas inlet member of a CVD reactor includes a gas inlet housing having a gas distribution volume supplied with a process gas by a feed line and a multiplicity of gas lines, each formed as a tube and engaging openings of a gas outlet plate arranged in front of an inlet housing wall, and through which the process gas enters a process chamber. A coolant chamber adjoins the gas inlet housing wall and a coolant cools the gas inlet housing wall and outlet ends of the gas lines that are in heat-conductive contact with the gas inlet housing wall. The gas outlet plate is thereby thermally decoupled from the gas inlet housing wall such that the gas outlet plate, which is acted on by radiation heat coming from the process chamber, heats up more intensely than the outlet ends which extend into the openings of the gas outlet plate.

First claim

What is claimed is:

1. A gas inlet member ( 2 ) of a chemical vapor deposition (CVD) reactor, comprising a gas inlet housing which has at least one first gas distribution volume ( 5 ) that can be supplied with a first process gas by a first feed line ( 21 ) and has a multiplicity of first gas lines ( 8 ) which are each formed as a tube and have extensions ( 15 ) that engage in first openings ( 16 ) of a gas outlet plate ( 14 ) arranged in front of a gas inlet housing wall ( 10 ), and through which the first process gas enters a process chamber located beneath the gas outlet plate ( 14 ), and further comprising a clearance space ( 20 ) provided between the gas inlet housing wall ( 10 ) and the gas outlet plate ( 14 ), and a coolant chamber ( 7 ) that adjoins the gas inlet housing wall ( 10 ) and into which a coolant can be fed so as to cool the gas inlet housing wall ( 10 ), wherein the gas inlet housing has a second gas distribution volume ( 6 ) which can be fed by a second feed line ( 23 ) and which is connected to the gas inlet housing wall ( 10 ) via a multiplicity of second gas lines ( 9 ), wherein the second gas lines ( 9 ) open into the clearance space ( 20 ), characterized in that outlet ( 8 ′) ends of extensions ( 15 ) of the gas lines ( 8 ) are in heat-conductive contact with the cooled gas inlet housing wall ( 10 ), and the gas outlet plate ( 14 ) is thermally decoupled with respect to the gas inlet housing wall ( 10 ) in such a manner that the gas outlet plate ( 14 ), which is acted on by radiation heat from a process chamber ( 22 ), heats up more intensely than the outlet ( 8 ′) ends which extend into the first openings ( 16 ) of the gas outlet plate ( 14 ).

2. The gas inlet member ( 2 ) according to claim 1 , further characterized in that the outlet ( 8 ′) ends of the first gas lines ( 8 ) are substantially flush with a surface of the gas outlet plate ( 14 ) facing the process chamber ( 22 ), or can be brought into a position flush with said surface by vertically displacing the gas outlet plate ( 14 ).

3. The gas inlet member ( 2 ) according to claim 1 , further characterized in that the gas outlet plate ( 14 ) has second openings ( 18 ) through which a second process gas can enter the process chamber ( 22 ).

4. The gas inlet member ( 2 ) according to claim 3 , further characterized in that gas line extensions ( 15 ), with which the first gas lines ( 8 ) protrude into the first openings ( 16 ) associated with the first gas lines, have an outer diameter that is smaller than an opening width of the first openings ( 16 ), so that each of the gas line extensions ( 15 ) is surrounded by an annular gap ( 17 ).

5. The gas inlet member ( 2 ) according to claim 4 , further characterized in that the outlet ( 8 ′) ends of the first gas lines ( 8 ) in the gas outlet plate ( 14 ) are positioned on vertices of equilateral triangles.

6. The gas inlet member ( 2 ) according to claim 5 , further characterized in that the second openings ( 18 ) are positioned on centers of the equilateral triangles.

7. The gas inlet member ( 2 ) according to claim 1 , further characterized in that each of the first gas lines ( 8 ) is surrounded by a purge gas or process gas line ( 26 ), that is fed by a third gas distribution volume ( 25 ).

8. The gas inlet member ( 2 ) according to claim 1 , further characterized in that the gas outlet plate ( 14 ) is temperature-controlled and includes temperature-regulating channels ( 19 ).

9. The gas inlet member ( 2 ) according to claim 1 , further characterized in that a distance (H) between the gas inlet housing wall ( 10 ) and the gas outlet plate ( 14 ) and a distance of the gas outlet plate ( 14 ) from a susceptor ( 3 ) can be varied by means of a displacement device ( 31 ).

10. The gas inlet member ( 2 ) according to claim 1 , further characterized in that, for each of the first openings ( 16 ), the first opening ( 16 ) is an interior of a sleeve ( 30 ) that extends into the clearance space ( 20 ).

11. The gas inlet member ( 2 ) according to claim 1 , further characterized in that the thermal conductivity of the gas outlet plate ( 14 ) is less than the thermal conductivity of the first gas lines ( 8 ).

12. A gas inlet member ( 2 ) of a chemical vapor deposition (CVD) reactor, comprising a gas inlet housing which has at least one first gas distribution volume ( 5 ) that can be supplied with a first process gas by a first feed line ( 21 ) and has a multiplicity of first gas lines ( 8 ) which are each formed as a tube and have extensions ( 15 ) that engage in first openings ( 16 ) of a gas outlet plate ( 14 ) arranged in front of a gas inlet housing wall ( 10 ), and through which the first process gas enters a process chamber located beneath the gas outlet plate ( 14 ), and further comprising a clearance space ( 20 ) provided between the gas inlet housing wall ( 10 ) and the gas outlet plate ( 14 ), wherein the extensions ( 15 ) have an outer diameter that is smaller than an opening width of the first openings ( 16 ), so that each of the extensions ( 15 ) is surrounded by an annular gap ( 17 ), characterized in that the gas outlet plate ( 14 ) is displaceable in a direction parallel to its plane of extent in such a manner that the gas outlet plate ( 14 ) can be brought into heat-conductive contact with the extensions ( 15 ).

13. The gas inlet member ( 2 ) according to claim 12 , further characterized by a profile ( 28 , 29 ) of the first openings ( 16 ) which influences gas flow through the first openings ( 16 ).

Assignees

• Silva Hugo
• Jouault Nico
• Saywell Victor
• Crawley Fred
• Dauelsberg Martin
• Lindner Johannes
• Aixtron Se

Inventors

• Silva Hugo
• Jouault Nico
• Saywell Victor
• Crawley Fred
• Dauelsberg Martin
• Lindner Johannes

Classifications

• C23C16/45572

  Cooled nozzles · CPC title

• C23C16/45576

  Coaxial inlets for each gas · CPC title

• C23C16/301 Primary

  AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi · CPC title

• C23C16/45574

  Nozzles for more than one gas · CPC title

• C30B25/14

  Feed and outlet means for the gases; Modifying the flow of the reactive gases · CPC title