Model-based control of an optical imaging device

Patent metadata

Field	Value
Publication number	US-9581912-B2
Application number	US-201514812008-A
Country	US
Kind code	B2
Filing date	Jul 29, 2015
Priority date	Feb 28, 2013
Publication date	Feb 28, 2017
Grant date	Feb 28, 2017

Abstract

The disclosure provides a method of determining an actual input value of an input variable for a control unit of a microlithography imaging device. The actual input value is assigned to a first location of the microlithography optical imaging device. The method includes: a) detecting, at a second location of the microlithography optical imaging device, an actual detection value of a detection variable of a detection device of the microlithography optical imaging device; b) using a second relation to computationally ascertain an actual computational value of the detection variable at the second location; c) comparing the actual computational value of the detection variable with the actual detection value of the detection variable to provide a result; and d) based on the result in c), using a relationship between a first predefinable relation and the second relation to correct the predefinable first relation.

First claim

The invention claimed is:

1. A method of determining an actual input value of an input variable for a control unit of a microlithography imaging device, the actual input value being assigned to a first location of the microlithography optical imaging device, the method comprising:
a) detecting, at a second location of the microlithography optical imaging device, an actual detection value of a detection variable of a detection device of the microlithography optical imaging device;
b) using a second relation to computationally ascertain an actual computational value of the detection variable at the second location;
c) comparing the actual computational value of the detection variable with the actual detection value of the detection variable to provide a result;
d) based on the result in c), using a relationship between a first predefinable relation and the second relation to correct the predefinable first relation; and

e) after d), using the corrected first predefinable relation to calculate the actual input value of the input variable, further comprising:
i) correcting the second relation based on at least the result in c) to provide a corrected second relation;
ii) using the corrected second relation to repeat b);
iii) after ii), repeating c) to provide a second result; and
iv) repeating i), ii) and iii) when, based on the second result, a predefinable deviation between the actual computational value of the detection variable and the actual detection value of the detection variable is exceeded.

2. A method of determining an actual input value of an input variable for a control unit of a microlithography imaging device, the actual input value being assigned to a first location of the microlithography optical imaging device, the method comprising:
a) detecting, at a second location of the microlithography optical imaging device, an actual detection value of a detection variable of a detection device of the microlithography optical imaging device;
b) using a second relation to computationally ascertain an actual computational value of the detection variable at the second location;
c) comparing the actual computational value of the detection variable with the actual detection value of the detection variable to provide a result;
d) based on the result in c), using a relationship between a first predefinable relation and the second relation to correct the predefinable first relation; and

e) after d), using the corrected first predefinable relation to calculate the actual input value of the input variable, further comprising:
i) correcting the second relation based on at least the result in c) to provide a corrected second relation;
ii) using the corrected second relation to repeat b);
iii) after ii), repeating c) to provide a second result; and

iv) repeating i), ii) and iii) when, based on the second result, a predefinable deviation between the actual computational value of the detection variable and the actual detection value of the detection variable is exceeded, wherein:
i) comprises using an optimization algorithm which uses at least one optimization criterion selected from the group consisting of a historical optimization criterion, a local optimization criterion and a global optimization criterion;
the historical optimization criterion takes into account a result of d);
the local optimization criterion takes into account the result of c) for a further detection device of the detection variable located adjacent to the detection device; and
the global optimization criterion takes into account a result of c) for all detection devices of a group of detection devices which comprises a plurality of detection devices of the detection variable which are assigned to an optical element of the microlithography optical imaging device.

3. A method of determining an actual input value of an input variable for a control unit of a microlithography optical imaging device, the actual input value being assigned to a first location in a region of a component of the microlithography optical imaging device, the method comprising:
a) detecting an actual detection value of a detection variable of a detection device of the microlithography optical imaging device at a second location in a region of the component;
b) using a mathematical model to computationally ascertain an actual computational value of the detection variable at the second location;
c) comparing the actual computational value of the detection variable with the actual detection value of the detection variable to provide a result;
d) based on the result in c), correcting the mathematical model; and

e) using the corrected mathematical model to calculate the actual input value of the input variable, wherein:
a) based on a result of a most recent preceding comparison, for correcting the model, the model parameter is modified, b) is repeated using the modified at least one model parameter, and c) is subsequently repeated; and
b) repeating a) when, the actual computational value of the detection variable and the actual detection value of the detection variable is exceeded; and
the model with the last modified at least one model parameter is used in e) when c) establishes that the predefinable deviation between the actual computational value of the detection variable and the actual detection value of the detection variable is not exceeded.

4. A method of determining an actual input value of an input variable for a control unit of a microlithography imaging device, the actual input value being assigned to a first location of the microlithography optical imaging device, the method comprising:
a) detecting, at a second location of the microlithography optical imaging device, an actual detection value of a detection variable of a detection device of the microlithography optical imaging device;
b) using a second relation to computationally ascertain an actual computational value of the detection variable at the second location;
c) comparing the actual computational value of the detection variable with the actual detection value of the detection variable to provide a result;
d) based on the result in c), using a relationship between a first predefinable relation and the second relation to correct the predefinable first relation; and

e) after d), using the corrected first predefinable relation to calculate the actual input value of the input variable, wherein:
the optical imaging device comprises a plurality of optical elements configured to image an object plane into an image plane;
the plurality of optical elements comprises a first optical element;
the first location is on the first optical element; and
the second location is adjacent the first optical element.

5. The method of claim 4 , wherein the optical imaging device comprises a housing, and the plurality of optical elements are in an interior of the housing.

6. A method of determining an actual input value of an input variable for a control unit of a microlithography optical imaging device, the actual input value being assigned to a first location in a region of a component of the microlithography optical imaging device, the method comprising:
a) detecting an actual detection value of a detection variable of a detection device of the microlithography optical imaging device at a second location in a region of the component;
b) using a mathematical model to computationally ascertain an actual computational value of the detection variable at the second location;
c) comparing the actual computational value of the detection variable with the actual detection value of the detection variable to provide a result;
d) based on the result in c), correcting the mathematical model; and

e) using the corrected mathematical model to c

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Hauf Markus
• Rothenhoefer Gerald

Classifications

• G03F7/705

  Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions · CPC title

• G03F7/70891

  Temperature · CPC title

• G02B7/028

  with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation · CPC title

• G03F7/70308 Primary

  Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift · CPC title

• G02B7/008 Primary

  with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation · CPC title