Apparatus for transferring a substrate in a lithography system

Patent metadata

Field	Value
Publication number	US-9575418-B2
Application number	US-201514850997-A
Country	US
Kind code	B2
Filing date	Sep 11, 2015
Priority date	Apr 28, 2011
Publication date	Feb 21, 2017
Grant date	Feb 21, 2017

Abstract

An apparatus for transferring a target, such as a substrate or a substrate support structure onto which a substrate has been clamped, from a substrate transfer system to a vacuum chamber of a lithography system. The apparatus comprises a load lock chamber for transferring the target into and out of the vacuum chamber. The load lock chamber comprises a first wall with a first passage providing access between a robot space and the interior of the load lock chamber, a second wall with a second passage providing access between the interior of the load lock chamber and the vacuum chamber, and plurality of handling robots for transferring the targets comprising: a first handling robot movable within the robot space to access the substrate transfer system and the first passage; and a second handling robot movable within the load lock chamber to access the first passage and the second passage.

First claim

The invention claimed is:

1. An apparatus for transferring a target from a substrate transfer system to a vacuum chamber of a lithography system, the target comprising a substrate or a substrate support structure onto which a substrate has been clamped, the apparatus comprising:
a load lock chamber for transferring the target into and out of the vacuum chamber of the lithography system, the load lock chamber comprising a first wall having a first passage therein providing access between a robot space and the interior of the load lock chamber, and a second wall having a second passage therein providing access between the interior of the load lock chamber and the vacuum chamber of the lithography system; and
a plurality of handling robots for transferring the targets,

wherein the plurality of handling robots comprises:
a first handling robot movable within the robot space to access the substrate transfer system and the first passage of the load lock chamber; and
a second handling robot movable within the load lock chamber to access the first passage of the load lock chamber and the second passage of the load lock chamber for access to the vacuum chamber of the lithography system.

2. The apparatus of claim 1 , wherein the moveable body of the first handling robot is adapted for controllable vertical movement within the robot space to access the substrate transfer system and the first passage of the load lock chamber.

3. The apparatus of claim 2 , wherein the substrate transfer system is arranged to supply the target at a position above the position of the first passage of the load lock chamber.

4. The apparatus of claim 1 , wherein the moveable body of the second handling robot is adapted for controllable horizontal movement within the load lock chamber to access the first passage of the load lock chamber and the second passage of the vacuum chamber of the lithography system.

5. The apparatus of claim 4 , wherein the moveable body of the second handling robot is also adapted for controllable vertical movement within the load lock chamber.

6. The apparatus of claim 1 , further comprising a third handling robot movable within the load lock chamber to access the first passage of the load lock chamber and the second passage of the vacuum chamber of the lithography system.

7. The apparatus of claim 1 , wherein the first wall and the second wall of the load lock chamber are adjacent walls arranged at a substantially right angle.

8. The apparatus of claim 1 , wherein each of the handling robots comprises a moveable body provided with a plurality of extended portions adapted for carrying either an unclamped substrate or a substrate clamped to a support structure, the moveable body being controllably moveable in vertical and horizontal directions.

9. The apparatus of claim 1 , wherein the second handling robot is arranged to receive a processed target from the vacuum chamber via the second passage of the load lock chamber and transfer the processed target to the first passage of the load lock chamber.

10. The apparatus of claim 9 , wherein the target is a clamped substrate.

11. The apparatus of claim 1 , wherein the second handling robot is arranged to receive the clamped substrate, e.g. from the first handling robot, via the first passage while predominantly oriented along an angle bisection between the first wall and the second wall.

12. The apparatus of claim 11 , wherein the second handling robot comprises a body provided on a robot arm, wherein the body is provided with at least two fingers for carrying a substrate support structure onto which a substrate has been clamped, and wherein the second handling robot is arranged to receive the clamped substrate, e.g. from the first handling robot, via the first passage while the fingers of the body are predominantly oriented along an angle bisection between the first wall and the second wall.

13. The apparatus of claim 12 , wherein the fingers have an arched shape.

14. The apparatus of claim 12 , wherein the second handling robot comprises:
a base for said robot arm, movably arranged along a rail, wherein the rail is oriented in a substantially vertical direction; and
a section connected to the base and the body enabling the robot arm to translate and rotate the substrate support structures onto which the substrates have been clamped in a two-dimensional plane.

15. The apparatus of claim 14 , wherein the second handling robot comprises said arm articulated relative to said base, and said body articulated relative to said arm.

16. The apparatus of claim 15 , wherein the second handling robot comprises said base in a vertically moveable and otherwise fixed manner.

17. The apparatus of claim 14 , wherein the second handling robot comprises two bodies each movably arranged to the rail via the respective section and base.

18. The apparatus of claim 17 , wherein said two bodies are simultaneously vertically moveable.

19. The apparatus according to claim 1 , wherein the second handling robot is arranged to perform a sequence of:
receiving a clamped substrate via the first passage while the second passage is closed;
receiving a processed clamped substrate from the vacuum chamber via the second passage while the first passage is closed;
transferring the clamped substrate towards the vacuum chamber via the second passage while the first passage is closed; and
in any order: transferring the processed clamped substrate to the first passage and receiving a further clamped substrate via the first passage while the second passage is closed.

20. A lithography system comprising an apparatus for transferring a target from a substrate transfer system to a vacuum chamber of the lithography system, the target comprising a substrate or a substrate support structure onto which a substrate has been clamped, wherein the apparatus comprises:
a load lock chamber for transferring the target into and out of the vacuum chamber of the lithography system, the load lock chamber comprising a first wall having a first passage therein providing access between a robot space and the interior of the load lock chamber, and a second wall having a second passage therein providing access between the interior of the load lock chamber and the vacuum chamber of the lithography system; and
a plurality of handling robots for transferring the targets,

wherein the plurality of handling robots comprises:
a first handling robot movable within the robot space to access the substrate transfer system and the first passage of the load lock chamber; and
a second handling robot movable within the load lock chamber to access the first passage of the load lock chamber and the second passage of the load lock chamber for access to the vacuum chamber of the lithography system.

21. A method for transferring a target from a substrate transfer system to a vacuum chamber of a lithography system, the target comprising a substrate or a substrate support structure onto which a substrate has been clamped, the method comprising:
a load lock chamber transferring the target into and out of the vacuum chamber of the lithography system, wherein the load lock chamber comprises a first wall having a first passage therein providing access between a robot space and the interior of the load lock chamber, and a second wall having a second passage therein providing access between the interior of the load lock chamber and the vacuum chamber of the lithography system;
a plurality of handling robots transferring the targ

Assignees

• Mapper Lithography Ip Bv

Inventors

• Kuiper Vincent Sylvester
• Slot Erwin
• Van Kervinck Marcel Nicolaas Jacobus
• De Boer Guido
• De Jong Hendrik Jan

Classifications

• H10P72/3304

  characterised by movements or sequence of movements of transfer devices · CPC title

• H10P72/0474

  comprising at least one lithography chamber · CPC title

• H10P72/0458 Primary

  vertical arrangement · CPC title

• G03F7/70733 Primary

  Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask · CPC title

• G03F7/7075 Primary

  Handling workpieces outside exposure position, e.g. SMIF box · CPC title