Wavefront measurement method, shape measurement method, optical element manufacturing method, optical apparatus manufacturing method, program, and wavefront measurement apparatus

Patent metadata

Field	Value
Publication number	US-9574967-B2
Application number	US-201414446150-A
Country	US
Kind code	B2
Filing date	Jul 29, 2014
Priority date	Jul 31, 2013
Publication date	Feb 21, 2017
Grant date	Feb 21, 2017

Abstract

A wavefront measurement method includes the steps of causing object light to be incident on a Shack-Hartmann sensor, capturing a first spot image under image pickup conditions, calculating data of first spot positions that correspond to the first spot image, calculating second spot positions by simulating a second spot image on the basis of the image pickup condition and information of a travelling direction of diffracted light generated when the object light passes through the microlenses, and reducing detection errors of the spot positions by correcting the data of the first spot positions on the basis of data of the second spot positions including data of a detection error due to the diffracted light.

First claim

What is claimed is:

1. A wavefront measurement method comprising steps of:
causing object light to be incident on a Shack-Hartmann sensor, which includes an image sensor and a microlens array including a plurality of microlenses, and capturing a first spot image under image pickup conditions;
calculating, based on the first spot image, data of first spot positions that correspond to the first spot image;
simulating a second spot image based on the image pickup conditions and information of a travelling direction of diffracted light generated when the object light passes through the microlenses;
calculating second spot positions that correspond to the second spot image; and
correcting the data of the first spot positions based on data of the second spot positions including data of a detection error due to the diffracted light, and calculating data of a wavefront of the object light.

2. The wavefront measurement method according to claim 1 , wherein the image sensor is a charge coupled device (CCD) image sensor or a complimentary metal-oxide semiconductor (CMOS) image sensor.

3. The wavefront measurement method according to claim 1 , wherein the simulating step is performed based on a curvature of the wavefront of the object light.

4. The wavefront measurement method according to claim 1 , wherein the information of the travelling direction of the diffracted light is calculated based on the image pickup conditions and the data of the first spot positions.

5. The wavefront measurement method according to claim 1 ,
wherein the simulating step includes sub-steps of:
calculating data of a first electric field, which is an electric field of the object light immediately after the object light has passed through the microlenses,
calculating data of a second electric field, which is an electric field on a light receiving surface of the image sensor, from the data of the first electric field, and
calculating the second spot image from the data of the second electric field, and

wherein the data of the second electric field includes the information of the travelling direction of the diffracted light.

6. The wavefront measurement method according to claim 5 , wherein the data of the second electric field is calculated by an angular spectrum method or a finite difference time domain method.

7. The wavefront measurement method according to claim 4 , wherein the data of the first spot positions is corrected on an assumption that the first spot positions are intersections of light rays of the object light that pass through centers of corresponding microlenses and a light receiving surface of the image sensor, and on an assumption that differences between the first spot positions and correct spot positions are equal to differences between the second spot positions and the first spot positions.

8. The wavefront measurement method according to claim 7 , wherein, in the simulating step, an output of the image sensor is simulated based on relative displacements between positions of the intersections and a center of pixels of the image sensor.

9. The wavefront measurement method according to claim 1 , wherein the information of the travelling direction of the diffracted light is calculated based on the image pickup conditions and data of a design value of the wavefront of the object light.

10. The wavefront measurement method according to claim 9 , wherein the second spot image is simulated based on the data of the first spot positions and data of an electric field of light that has passed through the microlens array, the data of the electric field being calculated based on the data of the design value of the wavefront of the object light.

11. The wavefront measurement method according to claim 9 , wherein the data of the first spot positions is corrected by using the detection error due to the diffracted light, the detection error being calculated based on the data of the second spot positions, and the data of the wavefront of the object light is calculated.

12. A shape measurement method comprising a step of:
calculating a shape of an object based on a wavefront of reflected light generated when the object is irradiated with light, the wavefront being calculated by the wavefront measurement method according to claim 1 , wherein the object light is the reflected light.

13. An optical element manufacturing method comprising steps of:
processing an optical element; and
measuring a shape of the processed optical element by the shape measurement method according to claim 12 .

14. An optical apparatus manufacturing method comprising steps of:
manufacturing an optical apparatus; and
measuring a wavefront of light emitted from the optical apparatus by the wavefront measurement method according to claim 1 .

15. The wavefront measurement method according to claim 1 , wherein the second spot image is simulated by combining an electric field of light condensed by the microlenses and an electric field of diffracted light which is generated when the object light passes through the microlenses and which propagates in a direction different from a travelling direction of the electric field of the condensed light.

16. The wavefront measurement method according to claim 15 , wherein the information of the travelling direction of the diffracted light is calculated based on the image pickup conditions and the data of the first spot positions.

17. The wavefront measurement method according to claim 15 ,
wherein the simulating step includes sub-steps of:
calculating data of a first electric field, which is an electric field of the object light immediately after the object light has passed through the microlenses,
calculating data of a second electric field, which is an electric field on a light receiving surface of the image sensor, from the data of the first electric field, and
calculating the second spot image from the data of the second electric field, and

wherein the data of the second electric field includes the information of the travelling direction of the diffracted light.

18. The wavefront measurement method according to claim 17 , wherein the data of the second electric field is calculated by an angular spectrum method or a finite difference time domain method.

19. The wavefront measurement method according to claim 16 , wherein the data of the first spot positions is corrected on an assumption that the first spot positions are intersections of light rays of the object light that pass through centers of corresponding microlenses and a light receiving surface of the image sensor, and on an assumption that differences between the first spot positions and correct spot positions are equal to differences between the second spot positions and the first spot positions.

20. The wavefront measurement method according to claim 19 , wherein, in the simulating step, an output of the image sensor is simulated based on relative displacements between positions of the intersections and a center of pixels of the image sensor.

21. The wavefront measurement method according to claim 15 , wherein the information of the travelling direction of the diffracted light is calculated based on the image pickup conditions and data of a design value of the wavefront of the object light.

22. The wavefront measurement method according to claim 21 , wherein the second spot image is simulated based on the data of the first spot positions and data of an electric field of light that has passed through the microlens array, th

Assignees

• Canon Kk

Inventors

• Maeda Atsushi

Classifications

• G01M11/0207 Primary

  Details of measuring devices · CPC title

• G01M11/025

  by determining the shape of the object to be tested (measuring contours or curvatures by optical means G01B11/24) · CPC title

• G01M11/0271

  by using interferometric methods · CPC title

• G01J9/00 Primary

  Measuring optical phase difference (devices or arrangements for controlling the phase of light beams G02F1/01); Determining degree of coherence; Measuring optical wavelength (spectrometry G01J3/00) · CPC title

• G01M11/0257

  by analyzing the image formed by the object to be tested · CPC title