Methods and apparatus for removing contamination from lithographic tool
US-10509334-B2 · Dec 17, 2019 · US
by using interferometric methods
by using interferometric methods · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G01M11/0271 |
| Official title | {by using interferometric methods} |
| Display label | by using interferometric methods |
| Total patents | 192 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 14 |
| 2016 | 12 |
| 2017 | 9 |
| 2018 | 14 |
| 2019 | 22 |
| 2020 | 24 |
| 2021 | 19 |
| 2022 | 27 |
| 2023 | 18 |
| 2024 | 12 |
| 2025 | 18 |
| 2026 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Device and method for wavefront analysis
US-10386728-B2 · Aug 20, 2019 · US
Optical system phase acquisition method and optical system evaluation method
US-10365164-B2 · Jul 30, 2019 · US
System for characterizing the surface properties of one or both surfaces of a contact lens
US-2019219477-A1 · Jul 18, 2019 · US
Measuring method and measuring system for interferometrically measuring the imaging quality
US-2019212226-A1 · Jul 11, 2019 · US
Calibration method and system for a fast steering mirror
US-10330460-B2 · Jun 25, 2019 · US
Measuring device for interferometric determination of a shape of an optical surface
US-2019154427-A1 · May 23, 2019 · US
Apparatus having spatial light modulator and converting unit converting input value to control value to control spatial light modulator
US-2019147816-A1 · May 16, 2019 · US
Methods and apparatus for removing containmination from lithographic tool
US-2019101838-A1 · Apr 4, 2019 · US
Measuring optical element for aberration from gravity and holding
US-10209161-B2 · Feb 19, 2019 · US
Apparatus having spatial light modulator and converting unit converting input value to control value to control spatial light modulator
US-10192502-B2 · Jan 29, 2019 · US
Projection exposure apparatus and method for measuring a projection lens
US-2018373163-A1 · Dec 27, 2018 · US
Projection exposure apparatus comprising a measuring system for measuring an optical element
US-10162270-B2 · Dec 25, 2018 · US
Calibration method and system for a fast steering mirror
US-2018356204-A1 · Dec 13, 2018 · US
Measuring ophthalmic lens using a prism with phase shifting mirror and a fluid in reference arm
US-10145757-B2 · Dec 4, 2018 · US
Device and method for wavefront analysis
US-2018299782-A1 · Oct 18, 2018 · US
System and methods for measuring ophthalmic lens
US-2018252615-A1 · Sep 6, 2018 · US
Method for automated in-line determination of center thickness of an ophthalmic lens
US-10048164-B2 · Aug 14, 2018 · US
Apparatus for determining an optical property of an optical imaging system
US-10006807-B2 · Jun 26, 2018 · US
Determination of operability of a digital scanner with shearing interferometry
US-2018172437-A1 · Jun 21, 2018 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G01M11/0271?
- CPC G01M11/0271 is the Cooperative Patent Classification code for “by using interferometric methods.”
- How many patents are filed under CPC G01M11/0271 (by using interferometric methods)?
- Our database includes 192 publications tagged with this CPC code.
- Is patent activity under CPC G01M11/0271 growing?
- Publication counts under this code: 12 in 2024 vs 18 in 2025 (latest complete years).