Transistor and method of making

Patent metadata

Field	Value
Publication number	US-9570595-B2
Application number	US-201213704613-A
Country	US
Kind code	B2
Filing date	Dec 14, 2012
Priority date	Dec 14, 2012
Publication date	Feb 14, 2017
Grant date	Feb 14, 2017

Abstract

A SiGe HBT has an inverted heterojunction structure, where the emitter layer is formed prior to the base layer and the collector layer. The frequency performance of the SiGe HBT is significantly improved through a better thermal process budget for the base profile, essential for higher cut-off frequency (f T ) and a minimal collector-base area for a reduced parasitic capacitance, essential for higher maximum oscillation frequency (f max ). This inverted heterojunction structure can be fabricated by using ALE processes to form an emitter on a preformed epitaxial silicide, a base over the emitter and a collector over the base.

First claim

We claim:

1. A method of making an HBT for operating in the TeraHertz Gap, comprising:
epitaxially growing a single crystal metal silicide layer on a semiconductor substrate;
epitaxially growing a single crystal silicon emitter on the metal silicide layer;
epitaxially growing a base over the emitter; and
epitaxially growing a single crystal silicon collector on the base;
wherein the emitter is grown using an atomic layer epitaxy (ALE) process;
wherein photons from a laser source are used during the ALE process to help release hydrogen atoms from a substrate surface.

2. The method of claim 1 , wherein the metal silicide layer is NiSi 2 grown on Si(100) using a solid-state reaction (SSR) epitaxy process.

3. The method of claim 1 , wherein the SSR process comprises sputter-deposition of a Ni film that is equal to or less than about ˜2-nm thick followed by heat treatment.

4. The method of claim 1 , wherein the emitter is in situ doped with carbon during the ALE process.

Assignees

• Wu Dongping
• Fu Chaochao
• Zhang Wei
• Zhang Shi-Li
• Univ Fudan

Inventors

• Wu Dongping
• Fu Chaochao
• Zhang Wei
• Zhang Shi-Li

Classifications

• H10P14/3411

  Silicon, silicon germanium or germanium · CPC title

• H10P14/24

  using chemical vapour deposition [CVD] · CPC title

• H10P14/3458

  Monocrystalline · CPC title

• H10P14/3438

  Doping during depositing · CPC title

• H10P14/44

  Physical vapour deposition [PVD] · CPC title