Method of patterning a material layer

Patent metadata

Field	Value
Publication number	US-9570302-B1
Application number	US-201615040533-A
Country	US
Kind code	B1
Filing date	Feb 10, 2016
Priority date	Feb 10, 2016
Publication date	Feb 14, 2017
Grant date	Feb 14, 2017

Abstract

A method of fabricating a semiconductor device is disclosed. The method includes forming a radiation-removable-material (RRM) layer over a substrate and removing a first portion of the RRM layer in a first region of the substrate by exposing the first portion of the RRM layer to a radiation beam. A second portion of the RRM layer in a second region of the substrate remains after the removing of the first portion of the RRM layer in the first region. The method also includes forming a selective-forming-layer (SFL) over the second portion of the RRM layer in the second region of the substrate and forming a material layer over the first region of the substrate.

First claim

What is claimed is:

1. A method comprising:
forming a radiation-removable-material (RRM) layer over a substrate;
removing a first portion of the RRM layer in a first region of the substrate by exposing the first portion of the RRM layer to a radiation beam, wherein a second portion of the RRM layer in a second region of the substrate remains after the removing of the first portion of the RRM layer in the first region;
forming a selective-forming-layer (SFL) over the second portion of the RRM layer in the second region of the substrate; and
forming a material layer over the first region of the substrate.

2. The method of claim 1 , wherein removing the first portion of the RRM layer in the first region of the substrate by exposing the first portion of the RRM layer to the radiation beam includes exposing the first portion of the RRM layer by the radiation beam through a photomask, wherein the photomask blocks the radiation beam in the second region of the substrate.

3. The method of claim 1 , wherein the radiation beam is an extreme ultraviolet (EUV) beam.

4. The method of claim 1 , wherein forming the RRM layer over the substrate includes performing a hexamethyldisilizane (HMDS) treatment to modify a portion of the substrate.

5. The method of claim 4 , wherein the substrate is a dielectric substrate.

6. The method of claim 5 , wherein removing the first portion of the RRM layer in the first region of the substrate by exposing the first portion of the RRM layer to the radiation beam includes exposing the dielectric substrate to an extreme ultraviolet (EUV) beam in a hydrogen environment.

7. The method of claim 1 , wherein forming the SFL over the RRM layer in the second region includes forming self-assembled monolayers (SAMs).

8. The method of claim 7 , wherein forming the SAMs includes applying a solution of octadecylphosphonic acid (ODPA) to the substrate.

9. The method of claim 1 , wherein forming the material layer over the substrate in the first region includes selectively forming the material layer by either atomic layer deposition (ALD) or molecular layer deposition (MLD).

10. The method of claim 1 , wherein forming the material layer over first region of the substrate includes forming a metal oxide layer over the first region of the substrate.

11. The method of claim 1 , further comprising removing the SFL and RRM layer in the second region of the substrate after forming the material layer over the first region of the substrate.

12. A method comprising:
forming a radiation-removable-material (RRM) layer over a substrate;
exposing the RRM layer by an extreme ultraviolet (EUV) beam through a photomask to remove a first portion of the RRM layer in a first region of substrate, wherein a second portion of the RRM layer in a second region of the substrate remains after the removing of the first portion of the RRM layer in the first region;
forming self-assembled monolayers (SAMs) over the second portion of RRM layer in the second region; and
forming a material layer over the first region of the substrate.

13. The method of claim 12 , wherein the substrate is an oxide substrate, and
wherein forming the RRM layer over the substrate includes performing hexamethyldisilizane (HMDS) treatment to the oxide substrate.

14. The method of claim 13 , wherein exposing the substrate by the EUV beam through the photomask includes exposing the oxide substrate by the EUV beam in a hydrogen environment.

15. The method of claim 14 , wherein forming SAMs over the RRM layer in the second region includes applying a solution of octadecylphosphonic acid (ODPA) to the oxide substrate.

16. The method of claim 12 , wherein forming the material layer over the first region of the substrate includes forming a metal oxide layer over the first region of the substrate.

17. The method of claim 12 , further comprising removing the SAMs in the second region of the substrate after forming the material layer over the first region of the substrate.

18. A method comprising:
performing a hexamethyldisilizane (HMDS) treatment to an dielectric substrate to modify a surface of the dielectric substrate;
exposing the dielectric substrate to an extreme ultraviolet (EUV) beam through a photomask in a hydrogen environment to remove a first portion of the modified surface in a first region of the dielectric substrate, wherein a second portion of the modified surface in a second region of the dielectric substrate remains after the removing of the first portion of the modified surface in the first region;
forming a self-assembled monolayers (SAMs) over the second portion of the modified surface in the second region; and
forming a metal oxide layer over the first region of the dielectric substrate.

19. The method of claim 18 , wherein forming SAMs includes applying a solution of octadecylphosphonic acid (ODPA) to the dielectric substrate having the modified surface.

20. The method of claim 18 , further comprising removing the SAMs in the second region after forming the metal oxide layer over the first region of the dielectric substrate.

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Chang Shu-Hao
• Kau Kuo-Chang
• Huang Kevin
• Chen Jeng-Horng

Classifications

• H10P95/00

  Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

• H10P50/28

  of insulating materials · CPC title

• H10P14/683

  carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC · CPC title

• H10P14/61

  using masks · CPC title

• H10P14/6938 Primary

  the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides · CPC title