Acid mist suppression in copper electrowinning
US-12098474-B2 · Sep 24, 2024 · US
US9562300B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9562300-B2 |
| Application number | US-201514980562-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 28, 2015 |
| Priority date | Dec 30, 2014 |
| Publication date | Feb 7, 2017 |
| Grant date | Feb 7, 2017 |
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Sulfonamide based polymers are reaction products of sulfonamides and epoxides. The polymers may be used as levelers in copper electroplating baths, to provide good throwing power. Such reaction products may plate copper or copper alloys with good surface properties and good physical reliability.
Opening claim text (preview).
What is claimed is: 1. A method comprising: a) providing a substrate; b) providing a composition comprising one or more sources of copper ions, optionally one or more sources of tin ions, an electrolyte and a reaction product comprising: one or more sulfonamides or salts thereof, and one or more epoxides; c) contacting a substrate with the composition; d) applying a current to the substrate and the composition; and e) depositing a copper or copper/tin alloy on the substrate. 2. The method of claim 1 , wherein the substrate comprises a plurality of one or more of through-holes, trenches and vias.
Ethers with hydroxy compounds containing no oxirane rings · CPC title
containing more than 50% by weight of tin · CPC title
characterised by the electroplating method; means therefor, e.g. baths or apparatus · CPC title
to an acyclic carbon atom of a hydrocarbon radical substituted by singly-bound oxygen atoms · CPC title
by direct electroplating · CPC title
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