Sulfonamide based polymers for copper electroplating

US9562300B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9562300-B2
Application numberUS-201514980562-A
CountryUS
Kind codeB2
Filing dateDec 28, 2015
Priority dateDec 30, 2014
Publication dateFeb 7, 2017
Grant dateFeb 7, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Sulfonamide based polymers are reaction products of sulfonamides and epoxides. The polymers may be used as levelers in copper electroplating baths, to provide good throwing power. Such reaction products may plate copper or copper alloys with good surface properties and good physical reliability.

First claim

Opening claim text (preview).

What is claimed is: 1. A method comprising: a) providing a substrate; b) providing a composition comprising one or more sources of copper ions, optionally one or more sources of tin ions, an electrolyte and a reaction product comprising: one or more sulfonamides or salts thereof, and one or more epoxides; c) contacting a substrate with the composition; d) applying a current to the substrate and the composition; and e) depositing a copper or copper/tin alloy on the substrate. 2. The method of claim 1 , wherein the substrate comprises a plurality of one or more of through-holes, trenches and vias.

Assignees

Inventors

Classifications

  • Ethers with hydroxy compounds containing no oxirane rings · CPC title

  • containing more than 50% by weight of tin · CPC title

  • characterised by the electroplating method; means therefor, e.g. baths or apparatus · CPC title

  • to an acyclic carbon atom of a hydrocarbon radical substituted by singly-bound oxygen atoms · CPC title

  • by direct electroplating · CPC title

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Frequently asked questions

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What does patent US9562300B2 cover?
Sulfonamide based polymers are reaction products of sulfonamides and epoxides. The polymers may be used as levelers in copper electroplating baths, to provide good throwing power. Such reaction products may plate copper or copper alloys with good surface properties and good physical reliability.
Who is the assignee on this patent?
Rohm & Haas Elect Mat
What technology area does this patent fall under?
Primary CPC classification C25D3/38. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 07 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).