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Methods and compositions for removal of metal hardmasks
US9102901B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9102901-B2 |
| Application number | US-201313786834-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 6, 2013 |
| Priority date | Dec 20, 2012 |
| Publication date | Aug 11, 2015 |
| Grant date | Aug 11, 2015 |
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Abstract
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The invention provides a process for removing a film from a substrate, said process comprising applying a composition to the film, and wherein the composition comprises at least the following: a) water; and b) at least one compound selected from the following compounds (i-v): i) NR 4 HF 2 (Formula 1), wherein R═H, alkyl, substituted alkyl, ii) NR 4 F (Formula 2), wherein R═H, alkyl, substituted alkyl, iii) HF (hydrofluoric acid), iv) H 2 SiF 6 (hexafluorosilicic acid), or v) combinations thereof. The invention also provides a composition comprising at least the following: a) water; and b) at least one compound selected from the following compounds (i-v): i) NR 4 HF 2 (Formula 1), wherein R═H, alkyl, substituted alkyl, ii) NR 4 F (Formula 2), wherein R═H, alkyl, substituted alkyl, iii) HF (hydrofluoric acid), iv) H 2 SiF 6 (hexafluorosilicic acid), or v) combinations thereof.
First claim
Opening claim text (preview).
The invention claimed is: 1. A process for removing a film from a substrate, said process comprising applying a composition to the film, and wherein the composition comprises at least the following: a) water; and b) at least one compound selected from the following compounds (i-v): i) NR 4 HF 2 (Formula 1), wherein R═H, alkyl, substituted alkyl, ii) NR 4 F (Formula 2), wherein R═H, alkyl, substituted alkyl, iii) HF (hydrofluoric acid), iv) H 2 SiF 6 (hexafluorosilicic…
Assignees
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Classifications
Electricity · mapped topic
Electricity · mapped topic
- C11D3/046Primary
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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- What does patent US9102901B2 cover?
- The invention provides a process for removing a film from a substrate, said process comprising applying a composition to the film, and wherein the composition comprises at least the following: a) water; and b) at least one compound selected from the following compounds (i-v): i) NR 4 HF 2 (Formula 1), wherein R═H, alkyl, substituted alkyl, ii) N…
- Who is the assignee on this patent?
- Rohm & Haas Elect Mat
- What technology area does this patent fall under?
- Primary CPC classification C11D3/046. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Aug 11 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).