Repairing line structure and circuit repairing method using same

US9559054B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9559054-B2
Application numberUS-201314111798-A
CountryUS
Kind codeB2
Filing dateJun 30, 2013
Priority dateJun 27, 2013
Publication dateJan 31, 2017
Grant dateJan 31, 2017

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

The present invention discloses a repairing line structure for repairing a breakage at a crossing point of electric wires extending along different directions on a thin film transistor panel. The repairing line structure includes a repair line extending from a same side of the electric wire where the breakage is defined and connecting opposite ends of the breakage and an amorphous silicon protection pattern. The repairing line traverses the other electric wire crossing with the electric wire where the breakage is defined. The amorphous silicon protection pattern is located between the repairing line and the electric wire traversed by the repairing line.

First claim

Opening claim text (preview).

What is claimed is: 1. A repairing line structure for repairing a breakage at a crossing point of electric wires extending along different directions on a thin fin transistor panel, the thin film transistor panel comprising a plurality of gate lines extending along a first direction, a plurality of data lines extending along a second direction, a plurality of thin film transistors correspondingly located at crossing points of the gate lines and the data lines, and a plurality of pixel electrodes correspondingly connected to the thin film transistors, the repairing line structure comprising: a repairing line extending from a same side of the electric wire where the breakage is defined and connecting opposite ends of the breakage; and an amorphous silicon protection pattern; wherein the repairing line traverses first electric wire crossing the electric wire where the breakage is defined, and the amorphous silicon protection pattern is located between the repairing line and the first electric wire traversed by the repairing line, wherein a part of pixel electrode of a pixel overlapped with the repairing line is cut off from another part of pixel electrode of the pixel. 2. The repairing line structure of claim 1 , wherein the amorphous silicon protection pattern is extended to adjacent pixel electrodes that are overlapped by the repairing line. 3. The repairing line structure of claim 1 , wherein the amorphous silicon protection pattern only overlaps on the electric wire where the breakage is defined. 4. The repairing line structure of claim 1 , wherein the repairing line is made of a conductive metal deposited on the thin film transistor substrate by a laser chemical vapor deposition, two ends of the repairing line are fused to connect with the data line by a laser beam. 5. A repairing line structure for repairing a breakage at a crossing point of electric wires extending along different directions on a thin film transistor panel, the thin film transistor panel comprising a plurality of gate tines extending along a first direction, a plurality of data lines extending along a second direction, a plurality of thin film transistors correspondingly located at crossing points of the gate lines and the data lines, and a plurality of pixel electrodes correspondingly connected to the thin film transistors, the repairing line structure comprising: a repairing line extending from a same side of the electric wire where the breakage is defined and connecting opposite ends of the breakage; and an amorphous silicon protection pattern; wherein the repairing line traverses the other electric wire crossing the electric wire where the breakage is defined, and the amorphous silicon protection pattern is located between the repairing line and the electric wire traversed by the repairing line, wherein the amorphous silicon protection pattern is extended to adjacent pixel electrodes that are overlapped by the repairing line.

Assignees

Inventors

Classifications

  • by modifying the pattern of conductive parts · CPC title

  • Adapting interconnections, e.g. making engineering charges, repairing · CPC title

  • by using a laser, e.g. laser cutting or laser direct writing · CPC title

  • H10W20/49Primary

    Adaptable interconnections, e.g. fuses or antifuses · CPC title

  • Electricity · mapped topic

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9559054B2 cover?
The present invention discloses a repairing line structure for repairing a breakage at a crossing point of electric wires extending along different directions on a thin film transistor panel. The repairing line structure includes a repair line extending from a same side of the electric wire where the breakage is defined and connecting opposite ends of the breakage and an amorphous silicon prote…
Who is the assignee on this patent?
Shenzhen China Star Optoelect, Shenzehn China Star Optoelectronics Tech Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10W20/49. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 31 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).