Contact clean in high-aspect ratio structures

Patent metadata

Field	Value
Publication number	US-9558928-B2
Application number	US-201414577977-A
Country	US
Kind code	B2
Filing date	Dec 19, 2014
Priority date	Aug 29, 2014
Publication date	Jan 31, 2017
Grant date	Jan 31, 2017

Abstract

Method and apparatus for cleaning a substrate having a plurality of high-aspect ratio openings are disclosed. A substrate can be provided in a plasma processing chamber, where the substrate includes the plurality of high-aspect ratio openings, the plurality of high-aspect ratio openings are defined by vertical structures having alternating layers of oxide and nitride or alternating layers of oxide and polysilicon. The substrate can include a silicon oxide layer over a damaged or amorphous silicon layer in the high-aspect ratio openings. To remove the silicon oxide layer, a bias power can be applied in the plasma processing chamber at a low pressure, and a fluorine-based species can be used to etch the silicon oxide layer. To remove the underlying damaged or amorphous silicon layer, a source power and a bias power can be applied in the plasma processing chamber, and a hydrogen-based species can be used to etch the damaged or amorphous silicon layer.

First claim

What is claimed is:

1. A method of cleaning a substrate having a plurality of high-aspect ratio openings, the method comprising:
providing a substrate having a plurality of high-aspect ratio openings into a plasma processing chamber, each of the openings having a height to lateral dimension aspect ratio of greater than about 10:1;
flowing a first etchant including a fluorine-based species towards the substrate;
applying a first bias power to the plasma processing chamber to generate a plasma of the fluorine-based species to remove silicon oxide in the high-aspect ratio openings;
flowing a second etchant including a hydrogen-based species towards the substrate, wherein the second etchant consists only of hydrogen or includes hydrogen and nitrogen trifluoride, a concentration of the hydrogen being greater than a concentration of the nitrogen trifluoride; and
applying a source power and a second bias power to the plasma processing chamber to generate a plasma of the hydrogen-based species to remove silicon in the high-aspect ratio openings.

2. The method of claim 1 , wherein the first etchant consists only of nitrogen trifluoride.

3. The method of claim 1 , wherein the removal of the silicon oxide occurs without any source power being applied in the plasma processing chamber.

4. The method of claim 1 , wherein the substrate includes a plurality of vertical structures defining each of the high-aspect ratio openings, each of the vertical structures including alternating layers of oxide and nitride.

5. The method of claim 4 , wherein the alternating layers of oxide and nitride include alternating layers of silicon oxide and silicon nitride.

6. The method of claim 4 , wherein removal of the silicon in the high aspect ratio openings occurs at a selectivity greater than about 500:1 over each of the alternating layers of oxide and nitride.

7. The method of claim 1 , wherein a pressure in the plasma processing chamber is less than about 10 mTorr while flowing the first etchant towards the substrate and applying the first bias power.

8. The method of claim 1 , wherein a ratio between the source power and the second bias power to remove the silicon is about equal to or greater than about 2:1.

9. The method of claim 1 , wherein the silicon includes amorphous or damaged silicon.

10. The method of claim 1 , wherein the source power is applied to a remote plasma source in the plasma processing chamber, and wherein applying the source power includes exposing the hydrogen-based species to the remote plasma source to generate radicals of the hydrogen-based species.

11. The method of claim 1 , wherein applying the first bias power includes exposing the fluorine-based species to the first bias power to generate ions of the fluorine-based species, wherein the ions of the fluorine-based species remove the silicon oxide in a directional etch profile.

12. The method of claim 1 , wherein the plurality of high-aspect ratio openings are part of a vertical NAND structure.

13. A method of cleaning a substrate having a plurality of high-aspect ratio openings, the method comprising:
providing a substrate having a plurality of high-aspect ratio openings into a plasma processing chamber, each of the openings having a height to lateral dimension aspect ratio of greater than about 10:1;
flowing a first etchant including a fluorine-based species or a hydrogen-based species towards the substrate;
applying a first bias power to the plasma processing chamber to generate a plasma of the first etchant to remove silicon oxide in the high-aspect ratio openings, wherein the removal of the silicon oxide occurs without any source power being applied in the plasma processing chamber;
flowing a second etchant including a hydrogen-based species towards the substrate; and
applying a source power and a second bias power to the plasma processing chamber to generate a plasma of the second etchant to remove silicon in the high-aspect ratio openings.

14. The method of claim 13 , wherein the first etchant consists only of nitrogen trifluoride.

15. The method of claim 13 , wherein the second etchant consists only of hydrogen or includes hydrogen and nitrogen trifluoride, a concentration of the hydrogen being greater than a concentration of the nitrogen trifluoride.

16. The method of claim 13 , wherein the substrate includes a plurality of vertical structures defining each of the high-aspect ratio openings, each of the vertical structures including alternating layers of oxide and nitride.

17. The method of claim 16 , wherein the alternating layers of oxide and nitride include alternating layers of silicon oxide and silicon nitride.

18. The method of claim 16 , wherein removal of the silicon in the high aspect ratio openings occurs at a selectivity greater than about 500:1 over each of the alternating layers of oxide and nitride.

19. The method of claim 13 , wherein a ratio between the source power and the second bias power to remove the silicon is about equal to or greater than about 2:1.

20. The method of claim 13 , wherein a pressure in the plasma processing chamber is less than about 10 mTorr while flowing the first etchant towards the substrate and applying the first bias power.

Assignees

• Lam Res Corp

Inventors

• Thedjoisworo Bayu
• Zhu Helen
• Marquez Linda
• Park Joon

Classifications

• H10P70/234 Primary

  the processing being the formation of vias or contact holes · CPC title

• H01J37/3244

  Gas supply means · CPC title

• H01J37/32357

  Generation remote from the workpiece, e.g. down-stream · CPC title

• H01J37/32862

  In situ cleaning of vessels and/or internal parts · CPC title

• H10P50/267

  using plasmas · CPC title