Substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-9555437-B2
Application number	US-201313969995-A
Country	US
Kind code	B2
Filing date	Aug 19, 2013
Priority date	Aug 31, 2012
Publication date	Jan 31, 2017
Grant date	Jan 31, 2017

Abstract

A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, a liquid receiving part, and an upper nozzle. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down. While the chamber cover is in contact with the chamber body, a small sealed space is formed and some processings involving pressure reduction or pressurization are performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. On an outer side relative to the annular opening, positioned are a first cup part and a second cup part. A processing liquid spattering from a substrate is received by the first cup part or the second cup part. In the substrate processing apparatus, it is possible to perform various processings in the small chamber.

First claim

The invention claimed is:

1. A substrate processing apparatus for processing a substrate, comprising:
a chamber including an upper portion and a lower portion which forms therein a sealed internal space by bringing said upper portion into contact with said lower portion;
a chamber opening and closing mechanism for moving up and down said upper portion of said chamber relative to said lower portion of said chamber;
a substrate holding part disposed in said chamber, for holding a substrate horizontally;
a substrate rotating mechanism for rotating said substrate together with said substrate holding part about a central axis oriented in a vertical direction;
a processing liquid supply part for supplying a processing liquid onto an upper surface or a lower surface of said substrate;
a cup part positioned on an outer side in a radial direction relative to an annular opening formed around said substrate by moving up said upper portion to be apart from said lower portion of said chamber, for receiving said processing liquid spattering from said substrate being rotated and passing through said annular opening between said upper portion and said lower portion of said chamber;
a cup discharge path for discharging said processing liquid received by said cup part while said upper portion is apart from said lower portion and said annular opening is formed;
a chamber discharge path for discharging said processing liquid received by said chamber while said upper portion comes into contact with said lower portion and said chamber is sealed; and
a control part for controlling said chamber opening and closing mechanism to switch a state of said chamber between a state that said upper portion is apart from said lower portion of said chamber and a state that said upper portion comes into contact with said lower portion of said chamber and to thereby switch a discharge path of said processing liquid between said cup discharge path and said chamber discharge path.

2. The substrate processing apparatus according to claim 1 , further comprising:
a cup part up-and-down moving mechanism for moving said cup part up and down, to thereby move said cup part between a first position which is outward in said radial direction relative to said annular opening and a second position lower than said first position, wherein
said annular opening includes a position relative to said vertical direction in which said substrate is disposed.

3. The substrate processing apparatus according to claim 2 , further comprising:
another cup part positioned on an outer side in said radial direction relative to said chamber,
wherein said cup up-and-down moving mechanism moves said cup part up and down, to thereby switch between a state in which said cup part receives said processing liquid from said substrate and another state in which said another cup part receives said processing liquid from said substrate.

4. The substrate processing apparatus according to claim 1 , wherein
said processing liquid supply part includes a nozzle moving from the outside of said chamber to above said substrate while said upper portion of said chamber is apart from said lower portion of said chamber.

5. The substrate processing apparatus according to claim 1 , wherein an upper portion of said cup part is close to or in contact with said upper portion of said chamber while said cup part receives said processing liquid spattering from said substrate.

6. The substrate processing apparatus according to claim 1 , wherein
said processing liquid supply part selectively supplies deionized water or a processing liquid onto said substrate,
said chamber receives said processing liquid or deionized water spattering from said substrate while the inside of said chamber is sealed, and
said cup part receives said processing liquid spattering from said substrate while said annular opening is formed.

7. The substrate processing apparatus according to claim 1 , further comprising:
a pressure reducing part for reducing pressure in said chamber.

8. The substrate processing apparatus according to claim 1 , further comprising:
a pressurizing part for increasing pressure in said chamber.

9. The substrate processing apparatus according to claim 1 , wherein said upper portion and said lower portion of said chamber are not rotated.

10. A substrate processing apparatus for processing a substrate, comprising:
a chamber which forms therein an internal space which is sealed;
a chamber opening and closing mechanism for moving up and down a chamber movable part including an upper portion or a lower portion of said chamber relative to the other portion of said chamber;
a substrate holding part disposed in said chamber, for holding a substrate horizontally;
a substrate rotating mechanism for rotating said substrate together with said substrate holding part about a central axis oriented in a vertical direction;
a processing liquid supply part for supplying a processing liquid onto an upper surface or a lower surface of said substrate; and
a cup part positioned on an outer side in a radial direction relative to an annular opening formed around said substrate by a movement of said chamber movable part, for receiving said processing liquid spattering from said substrate being rotated, wherein
said chamber movable part includes said lower portion of said chamber, and
said chamber comprises:
a chamber fixed part positioned on an upper side relative to said chamber movable part; and
a chamber cover positioned on an upper side relative to said chamber fixed part,
said substrate processing apparatus further comprising:
a cover up-and-down moving mechanism for moving said chamber cover up and down; and
a partition plate extending outward from said chamber fixed part above said cup part.

Assignees

• Dainippon Screen Mfg
• Screen Holdings Co Ltd

Inventors

• Nakai Hitoshi
• Ohashi Yasuhiko

Classifications

• H10P95/00

  Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

• H10P72/0458

  vertical arrangement · CPC title

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/7608

  characterised by a plurality of separate clamping members, e.g. clamping fingers · CPC title

• H10P72/0424 Primary

  using mainly spraying means, e.g. nozzles · CPC title