Electroless plating solution with at least two borane containing reducing agents

US9551074B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9551074-B2
Application numberUS-201414297352-A
CountryUS
Kind codeB2
Filing dateJun 5, 2014
Priority dateJun 5, 2014
Publication dateJan 24, 2017
Grant dateJan 24, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A solution for providing electroless deposition of a metal layer on a substrate is provided. A solvent is provided. A metal precursor is provided to the solvent. A first borane containing reducing agent is provided to the solvent. A second borane containing reducing agent is provided to the solvent, wherein the first borane containing reducing agent has a deposition rate of at least five times a deposition rate of the second borane containing reducing agent, and wherein the solution is free of nonborane reducing agents.

First claim

Opening claim text (preview).

What is claimed is: 1. A solution for providing electroless deposition of a metal layer on a substrate, comprising: a solvent; a metal precursor; a first borane containing reducing agent; and a second borane containing reducing agent, wherein the first borane containing reducing agent has a deposition rate of at least two times a deposition rate of the second borane containing reducing agent, and wherein the solution is free of nonborane reducing agents. 2. The solution, as recited in claim 1 , wherein the metal precursor comprises at least one of a cobalt precursor, a nickel precursor, a copper precursor, an iron precursor or a palladium precursor. 3. The solution, as recited in claim 2 , wherein the metal precursor comprises a mixture of a cobalt precursor and a molybdenum precursor. 4. The solution, as recited in claim 3 , wherein the solvent is at last one of dimethyl sulfoxide (DMSO), ethylene glycol, ionic liquids, or water. 5. The solution, as recited in claim 4 , wherein the solution further comprises at least one of a complexing agent, a surfactant, or a pH adjustment agent. 6. The solution, as recited in claim 5 , wherein the first borane containing reducing agent is at least one of tert-butylamine borane, ammonia borane, dimethylsulfide borane, or dimethylamine borane (DMAB) and the second borane containing reducing agent is morpholine borane. 7. The solution, as recited in claim 5 , wherein the first borane containing reducing agent comprises borane dimethylamine and the second borane containing reducing agent comprises morpholine borane. 8. The solution, as recited in claim 2 , wherein the first borane containing reducing agent comprises borane dimethylamine and the second borane containing reducing agent comprises morpholine borane. 9. The solution, as recited in claim 1 , wherein the first borane containing reducing agent comprises borane dimethylamine and the second borane containing reducing agent comprises morpholine borane. 10. A solution for providing electroless deposition of a metal layer on a substrate, comprising: a solvent; a metal precursor; borane dimethylamine; and morpholine borane. 11. The solution, as recited in claim 10 , wherein the metal precursor comprises at least one of a cobalt precursor, a nickel precursor, a copper precursor, an iron precursor or a palladium precursor. 12. The solution, as recited in claim 11 , wherein the metal precursor comprises a mixture of a cobalt precursor and a molybdenum precursor. 13. The solution, as recited in claim 12 , wherein the solvent is at last one of dimethyl sulfoxide (DMSO), ethylene glycol, ionic liquids, or water. 14. The solution, as recited in claim 1 , wherein the first borane containing reducing agent is at least one of tert-butylamine borane or dimethylsulfide borane and the second borane containing reducing agent is morpholine borane.

Assignees

Inventors

Classifications

  • H10P14/46Primary

    using a liquid · CPC title

  • using reducing agents for coating with metallic material not provided for in a single one of groups C23C18/32 - C23C18/50 · CPC title

  • with alloys based on iron, cobalt or nickel · CPC title

  • using reducing agents · CPC title

  • using reducing agents · CPC title

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What does patent US9551074B2 cover?
A solution for providing electroless deposition of a metal layer on a substrate is provided. A solvent is provided. A metal precursor is provided to the solvent. A first borane containing reducing agent is provided to the solvent. A second borane containing reducing agent is provided to the solvent, wherein the first borane containing reducing agent has a deposition rate of at least five times …
Who is the assignee on this patent?
Lam Res Corp
What technology area does this patent fall under?
Primary CPC classification H10P14/46. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 24 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).