Apparatus for and method of supplying target material

Patent metadata

Field	Value
Publication number	US-9544983-B2
Application number	US-201414533813-A
Country	US
Kind code	B2
Filing date	Nov 5, 2014
Priority date	Nov 5, 2014
Publication date	Jan 10, 2017
Grant date	Jan 10, 2017

Abstract

An EUV light source target material handling system is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating.

First claim

What is claimed is:

1. Apparatus for supplying target material to a system for generating EUV radiation by creating a plasma from molten target material at a plasma site, the apparatus comprising:
a target material repository comprising
a chamber for receiving target material in solid form, and
an induction heater in electromagnetic communication with an interior of the chamber and arranged to heat target material in the chamber by electromagnetic induction and convert target material in the chamber in solid form to target material in liquid form; and

a target material dispenser releasably connected to the target material repository and arranged to receive target material in liquid form from the target material repository and to dispense the target material in liquid form to the plasma site.

2. Apparatus as claimed in claim 1 wherein the chamber is an interior of an electrically insulating housing and the induction heater comprises a coil wound around at least part of the electrically insulating housing.

3. Apparatus as claimed in claim 2 wherein the electrically insulating housing comprises a ceramic material.

4. Apparatus as claimed in claim 2 wherein the coil comprises litz wire.

5. Apparatus as claimed in claim 2 further comprising an insertion port in the electrically insulating housing, the insertion port being dimensioned to be able to permit insertion of bar-shaped target material in solid form into the chamber.

6. Apparatus as claimed in claim 2 further comprising an insertion port in the electrically insulating housing, the insertion port being dimensioned to be able to permit insertion of a wire comprising target material in solid form into the chamber.

7. Apparatus as claimed in claim 2 further comprising an inlet port in the electrically insulating housing for supplying a buffer gas to the chamber.

8. Apparatus as claimed in claim 2 further comprising a port in the electrically insulating housing for applying a partial vacuum to the chamber.

9. Apparatus for supplying target material to a system for generating EUV radiation by creating a plasma from molten target material at a plasma site, the apparatus comprising:
a target material repository comprising
a ceramic housing comprising a chamber for receiving target material in solid form through an insertion port in the ceramic housing,
a coil in electromagnetic communication with the chamber and arranged to heat target material in the chamber by electromagnetic induction and convert target material in solid form in the chamber to target material in liquid form; and
an outlet port in the ceramic housing for permitting melted target material to flow from the chamber,

the ceramic housing also including an inlet port to permit introduction of a buffer gas into the chamber; and
a coupler for releasably coupling the target material repository to a target material dispenser.

10. Apparatus for supplying target material to a system for generating EUV radiation by creating a plasma from molten target material at a plasma site, the apparatus comprising:
a target material loader including a target material repository adapted to receive bars of target material in solid form, the target material repository comprising:
a chamber for receiving the bars of target material in solid form;
an induction heater in electromagnetic communication with the chamber and arranged to heat target material in the chamber by electromagnetic induction and convert target material in solid form in the chamber to target material in liquid form;

the target material loader being adapted to be handheld;
a target material dispenser arranged to dispense the target material in liquid form to the plasma site; and
a coupler for releasably coupling the target material loader to the target material dispenser for loading the target material with target material in liquid form.

11. Apparatus for supplying target material to a system for generating EUV radiation by creating a plasma from molten target material at a plasma site, the apparatus comprising:
a target material loader including a target material repository adapted to receive a wire comprising target material in solid form, the target material repository comprising
a chamber for receiving the wire,
an induction heater in electromagnetic communication with an interior of the chamber and arranged to heat the wire in the chamber by electromagnetic induction and convert target material in the wire in the chamber to target material in liquid form; and

a coupler for releasably coupling the target material repository to a target material dispenser.

12. Apparatus as claimed in claim 11 wherein the chamber comprises a ceramic material.

13. Apparatus as claimed in claim 11 wherein the chamber comprises a glass material.

14. Apparatus as claimed in claim 11 further comprising:
a valve disposed between the chamber and the target material dispenser for controlling a flow of target material in liquid form between the chamber and the target material dispenser.

15. Apparatus as claimed in claim 14 wherein the valve is a ball valve.

16. Apparatus as claimed in claim 11 further comprising:
a spool for holding a quantity of the wire;
a wire transport system for feeding the wire from the spool to the chamber.

17. Apparatus as claimed in claim 11 further comprising a gas supply system for supplying gas to the interior of the chamber.

18. Apparatus as claimed in claim 17 wherein the gas is a forming gas.

19. A method of supplying target material to a system for generating EUV radiation by creating a plasma from a molten target material at a plasma site, the method comprising:
adding the target material in solid form to a target material repository;
inductively heating the target material in solid form in the target material repository to heat the target material in the target material repository chamber by electromagnetic induction and convert the target material in solid form in the target material repository to target material in liquid form;
releasably coupling the target material repository to a target material dispenser to supply the target material in liquid form to the target material dispenser; and
disconnecting the target material depository from the target material dispenser when supplying the target material in liquid form to the target material dispenser is not required.

20. A method as claimed in claim 19 comprising an additional step carried out during the adding step of adding a gas to the target material repository while adding target material in solid form to the target material repository.

Assignees

• Asml Netherlands Bv

Inventors

• Rajyaguru Chirag
• Algots John M
• Ishikawa Tetsuya
• Baumgart Peter

Classifications

• G03F7/70033

  by plasma extreme ultraviolet [EUV] sources · CPC title

• H05G2/0092

  Housing of the apparatus for producing X-rays; Environment inside the housing · CPC title

• H05G2/003

  the plasma being generated from a material in a liquid or gas state · CPC title

• H05G2/002 Primary

  Supply of the plasma generating material · CPC title

• H05G2/008

  involving an energy-carrying beam in the process of plasma generation · CPC title