Polyether compound, method for preparing same and photoresist composition

Patent metadata

Field	Value
Publication number	US-9541833-B2
Application number	US-201314366382-A
Country	US
Kind code	B2
Filing date	Nov 25, 2013
Priority date	Aug 20, 2013
Publication date	Jan 10, 2017
Grant date	Jan 10, 2017

Abstract

A polyether compound which is as shown in Formula (I), wherein R 1 is a polyether backbone of the polyether polyol; R 2 is hydrogen or C 1 ˜C 5 alkyl; n is 3, 4 or 5. Furthermore, a photoresist composition comprising the polyether compound is disclosed. This photoresist composition is used to make the colored layer in a colored film substrate, in which the polymer film layer thus obtained has a small edge slope angle and is not prone to light leakage.

First claim

The invention claimed is:

1. A photoresist composition comprising a polymerizable monomer which comprises a polyether compound which is as shown in Formula (I),

wherein R 1 is a polyether backbone of the polyether polyol; R 2 is C 3 ˜C 5 alkyl; n is 3, 4 or 5,
wherein the polymerizable monomer comprises 10%˜25% by weight of polyether compound.

2. The photoresist composition according to claim 1 , wherein the photoresist composition comprises by weight the following raw materials:
polymerizable monomer: 15˜25 fractions;
alkaline soluble resin: 5˜25 fractions;
pigment dispersion: 30˜50 fractions;
photoinitiator: 1˜10 fractions; and
solvent: 15˜40 fractions.

3. The photoresist composition according to claim 1 , wherein the photoresist composition further comprises 0.0095˜0.445 fraction of adjuvant.

4. The photoresist composition according to claim 3 , wherein the adjuvant is one or more of a leveling agent, an anti-foam, a surfactant, a slipping agent, a silane coupling agent, or a light stablizer.

5. The photoresist composition according to claim 2 , wherein the polymerizable monomer further comprises one or more of dipentaerythritol pentaacrylate, trihydroxymethylpropane triacrylate, pentaerythritol tetraacrylate or aromatic urethane acrylate.

6. The photoresist composition according to claim 2 , wherein the alkaline soluble resin is alkaline soluble acrylate resin.

7. The photoresist composition according to claim 2 , wherein the photoinitiator is one or more of acyl phosphosphine oxide, ketone oxime ester, benzophenone, benzoin, anthraquinone, aryl ketone or iron arene photoinitiator.

8. The photoresist composition according to claim 2 , wherein the solvent is one or more of propylene glycol monomethyl ether acetate, propylene glycol diacetate, ethyl 3-ethoxy-3-iminopropionate, 2-heptane, 3-heptane, cyclopentanone or cyclohexanone.

Assignees

• Boe Technology Group Co Ltd

Inventors

• Wang Xuelan

Classifications

• H10P76/20

  of masks comprising organic materials · CPC title

• C07C15/54

  containing a group with formula[IMAGE cpc-sch-C07C-0956.gif] · CPC title

• C07C15/50

  polycyclic non-condensed · CPC title

• G03F7/0007

  Filters, e.g. additive colour filters; Components for display devices · CPC title

• G03F7/004

  Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title